摘要:
A thin film transistors (TFTs) substrate is structured to maintain as constant across the area of the substrate a kickback voltage due to Miller capacitance between the drain and gate of each TFT even in the presence of manufacturing induced misalignments between the drain electrodes and corresponding gate lines. Each thin film transistor includes a gate electrode, an active layer formed on the gate electrode so as to overlap the gate electrode, first and second source electrodes respectively connected to first and second data lines each of which crosses the gate line while being insulated from the gate line, and an elongated drain electrode located between the first and second source electrodes and disposed over the gate electrode so as to a crossing length of the drain electrode is larger than an underlying width of the gate electrode such that misalignment induced shifts of the position of the gate electrode relative to the drain electrode does not substantially change overlap area between the two.
摘要:
A liquid crystal display device includes a first substrate where a pixel thin film transistor is formed, a second substrate which is positioned opposite to the first substrate and a liquid crystal layer interposed between the first substrate and the second substrate. A light source is positioned beneath the first substrate, and joins the first substrate with the second substrate, the first substrate comprising: a first insulating substrate which has a display area where the pixel thin film transistor is formed and a non-display area which surrounds the display area; a gate line in the display area and the gate line being electrically connected to the pixel thin film transistor. A gate driving portion is formed in the non-display area to drive the gate line and comprises a driving thin film transistor; and a light blocking member which covers the gate driving part.
摘要:
An LCD includes a thin film display device having a plastic insulating substrate in which lifting of the edge of the thin film is avoided which includes a display region and a non-display region; a gate line assembly formed on the plastic insulating substrate with the use of a shadow mask disposed over the plastic insulating substrate; a gate insulating layer formed on the gate line assembly in the display region; a data line formed on the gate insulating layer and a data pad formed in the non-display region and spaced away from the gate insulating layer; and a passivation layer formed on the data line.
摘要:
A method of fabricating a thin film transistor substrate includes forming a gate wiring on an insulating substrate and forming a gate insulating layer on the gate wiring; performing a first hydrogen plasma treatment with respect to the gate insulating layer; forming a first active layer with a first thickness at a first deposition rate on the gate insulating layer; performing a second hydrogen plasma treatment with respect to the first active layer; and forming a second active layer with a second thickness greater than the first thickness at a second deposition rate greater than the first deposition rate, on the first active layer.
摘要:
Provided are a thin film transistor (TFT) substrate and a method for manufacturing the same. The method comprises forming on a substrate a conductive layer, an impurity-doped silicon layer, and an intermediate layer, wherein the intermediate layer comprises intrinsic silicon; patterning the intermediate layer, the impurity-doped silicon layer, and the conductive layer to form a data line, a source electrode, a drain electrode, ohmic contact portions, and intermediate portions, wherein an ohmic contact portion and an intermediate portion are on the source electrode, and an ohmic contact portion and an intermediate portion are on the drain electrode; forming an intrinsic silicon layer on the substrate; and patterning the intrinsic silicon layer to form a semiconductor layer forming channel portion between the source electrode and the drain electrode, and a contact portion on the intermediate portion.
摘要:
A liquid crystal display device including a first substrate including a pixel electrode, a second substrate facing the first substrate and including a common electrode, and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes a storage capacitive line. The liquid crystal display device further includes a domain forming member that is formed over a first region corresponding to the storage capacitive line and a second region adjacent to the first region. The domain forming member is formed with irregular parts including a first irregular part having an enlarged width, a second irregular part having a reduced width, and an external irregular part, which is closest to the first region of the irregular parts formed in the second region and has an enlarged width.
摘要:
A thin film transistor (TFT) substrate comprises: a plastic insulation substrate; a first silicon nitride layer with a first refractive index, formed one surface of the plastic insulation substrate; and a TFT comprising a second silicon nitride layer formed with a second refractive index smaller than the first refractive index on the first silicon nitride layer. Thus, the present invention provides a TFT substrate wherein there is reduced a problem in that thin films are lifted from a plastic insulation substrate.
摘要:
A display device includes an insulating substrate, a switching TFT formed on the substrate that receives a data voltage and that includes a first semiconductor layer, a driving TFT formed on the substrate that includes a control terminal connected to an output terminal of the switching TFT and a second semiconductor layer including polysilicon and a halogen material, an insulating layer formed on the switching TFT and the driving TFT, a first electrode formed on the insulating layer and electrically connected to an output terminal of the driving TFT, an organic light emitting layer formed on the first electrode, and a second electrode formed on the organic light emitting layer.
摘要:
A thin film transistor (TFT) substrate comprises: a plastic insulation substrate; a first silicon nitride layer with a first refractive index, formed one surface of the plastic insulation substrate; and a TFT comprising a second silicon nitride layer formed with a second refractive index smaller than the first refractive index on the first silicon nitride layer. Thus, the present invention provides a TFT substrate wherein there is reduced a problem in that thin films are lifted from a plastic insulation substrate.