Multi-tip optical coupling devices

    公开(公告)号:US11860421B2

    公开(公告)日:2024-01-02

    申请号:US17097270

    申请日:2020-11-13

    IPC分类号: G02B6/30 G02B6/26

    CPC分类号: G02B6/305 G02B6/262 G02B6/30

    摘要: An optical system with different optical coupling device configurations and a method of fabricating the same are disclosed. An optical system includes a substrate, a waveguide disposed on the substrate, an optical fiber optically coupled to the waveguide, and an optical coupling device disposed between the optical fiber and the waveguide. The optical coupling device configured to optically couple the optical fiber to the waveguide. The optical coupling device includes a dielectric layer disposed on the substrate, a semiconductor tapered structure disposed in a first horizontal plane within the dielectric layer, and a multi-tip dielectric structure disposed in a second horizontal plane within the dielectric layer. The first and second horizontal planes are different from each other.

    Germanium Photodetector Embedded in a Multi-Mode Interferometer

    公开(公告)号:US20220326443A1

    公开(公告)日:2022-10-13

    申请号:US17808813

    申请日:2022-06-24

    IPC分类号: G02B6/293 G02B6/122

    摘要: A method includes etching a silicon layer to form a silicon slab and an upper silicon region over the silicon slab, and implanting the silicon slab and the upper silicon region to form a p-type region, an n-type region, and an intrinsic region between the p-type region and the n-type region. The method further includes etching the p-type region, the n-type region, and the intrinsic region to form a trench. The remaining portions of the upper silicon region form a Multi-Mode Interferometer (MMI) region. An epitaxy process is performed to grow a germanium region in the trench. Electrical connections are made to connect to the p-type region and the n-type region.

    PHOTONIC SEMICONDUCTOR DEVICE AND METHOD

    公开(公告)号:US20210271020A1

    公开(公告)日:2021-09-02

    申请号:US16803153

    申请日:2020-02-27

    摘要: A structure includes an optical interposer attached to a package substrate, wherein the optical interposer includes a silicon waveguide, a first photonic component optically coupled to the silicon waveguide, a second photonic component optically coupled to the silicon waveguide, and an interconnect structure extending over the silicon waveguide, over the first photonic component, and over the second photonic component, wherein the interconnect structure is electrically connected to the first photonic component and to the second photonic component, a first semiconductor device attached to the interconnect structure, wherein the first semiconductor device is electrically connected to the first photonic component through the interconnect structure, and a second semiconductor device attached to the interconnect structure, wherein the second semiconductor device is electrically connected to the second photonic component through the interconnect structure.

    Semiconductor device and method for manufacturing the same

    公开(公告)号:US10930554B2

    公开(公告)日:2021-02-23

    申请号:US16440825

    申请日:2019-06-13

    摘要: A semiconductor device includes first, second, and third metallization layers, on top of one another, that are disposed above a substrate, wherein each of the first, second, and third metallization layer includes a respective metallization structure formed in a respective dielectric layer, wherein the second metallization layer is disposed between the first and third metallization layers; and a via tower structure that extends from the first metallization layer to the third metallization layer so as to electrically couple at least part of the respective metallization structures of the first and third metallization layers.