HEAT DISSIPATION SHEET AND METHOD FOR PRODUCING SAME

    公开(公告)号:US20220396065A1

    公开(公告)日:2022-12-15

    申请号:US17774718

    申请日:2020-11-06

    Applicant: TEIJIN LIMITED

    Abstract: An object of the present invention is to provide a heat dissipation sheet having high thermal conductivity in the thickness direction. The present invention provides a heat dissipation sheet having a structure in which at least two thermally conductive insulation layers are laminated, wherein the lamination direction of the thermally conductive insulation layers is substantially perpendicular to the thickness direction of the heat dissipation sheet, and wherein for the entire cross-section perpendicular to the in-plane direction of the heat dissipation sheet, the thermally conductive insulation layer contains 75 to 97% by area of insulating particles, 3 to 25% by area of a binder resin, and 10% by area or less of voids.

    INSULATION SHEET
    3.
    发明申请

    公开(公告)号:US20220165457A1

    公开(公告)日:2022-05-26

    申请号:US17440893

    申请日:2019-12-26

    Applicant: TEIJIN LIMITED

    Abstract: An object of the present invention is to provide an insulation sheet having high thermal conductivity in the in-plane direction.
    The present invention provides an insulation sheet comprising insulating particles and a binder resin, wherein, for the entire cross-section of the sheet perpendicular to the in-plane direction, the insulation sheet contains 75 to 97% by area of the insulating particles, 3 to 25% by area of the binder resin, and 10% by area or less of the voids.

    SEMICONDUCTOR LAMINATE, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    5.
    发明申请
    SEMICONDUCTOR LAMINATE, SEMICONDUCTOR DEVICE, METHOD FOR PRODUCING SEMICONDUCTOR LAMINATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
    半导体层压体,半导体器件,生产半导体层压体的方法和制造半导体器件的方法

    公开(公告)号:US20130298989A1

    公开(公告)日:2013-11-14

    申请号:US13846605

    申请日:2013-03-18

    Applicant: TEIJIN LIMITED

    Abstract: Provided is a method for manufacturing a semiconductor device. Also provided are: a semiconductor device which can be obtained by the method; and a dispersion that can be used in the method. A method for manufacturing a semiconductor device (500a) of the present invention comprises the steps (a)-(c) described below. (a) A dispersion which contains doped particles is applied to a specific part of a layer or a base. (b) An unsintered dopant implanted layer is obtained by drying the applied dispersion. (c) The specific part of the layer or the base is doped with a p-type or n-type dopant by irradiating the unsintered dopant implanted layer with light, and the unsintered dopant implanted layer is sintered, thereby obtaining a dopant implanted layer that is integrated with the layer or the base.

    Abstract translation: 提供一种半导体器件的制造方法。 还提供了:可以通过该方法获得的半导体器件; 以及可用于该方法的分散体。 本发明的半导体装置(500a)的制造方法包括下述步骤(a) - (c)。 (a)将包含掺杂颗粒的分散体施加到层或基底的特定部分。 (b)通过干燥所施加的分散体获得未烧结的掺杂剂注入层。 (c)通过用光照射未烧结的掺杂剂注入层,将层或基底的特定部分掺杂p型或n型掺杂剂,并烧结未烧结的掺杂剂注入层,从而获得掺杂剂注入层, 与层或基底集成。

    POLYMER MEMBER/INORGANIC BASE COMPOSITE, PRODUCTION METHOD THEREFOR, AND POLYMER MEMBER THEREFOR

    公开(公告)号:US20220176684A1

    公开(公告)日:2022-06-09

    申请号:US17435893

    申请日:2020-03-06

    Applicant: TEIJIN LIMITED

    Abstract: A composite of polymer member and inorganic substrate, a method of manufacturing the same, and a polymer member therefor are provided. A method for manufacturing a composite 210, 220 of polymer member and inorganic substrate includes: providing a composite 110, 120 of thermally modified polymer layer and inorganic substrate in which one or more thermally modified polymer layers 20, 21, 22 are adhered onto an inorganic substrate 10, and bonding a polymer member 30, 31, 32 to the inorganic substrate via the one or more thermally modified polymer layers 20, 21, 22.

    SEMICONDUCTOR LAMINATE, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF
    8.
    发明申请
    SEMICONDUCTOR LAMINATE, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF 审中-公开
    半导体层压体,半导体器件及其制造方法

    公开(公告)号:US20160300717A1

    公开(公告)日:2016-10-13

    申请号:US15097672

    申请日:2016-04-13

    Applicant: TEIJIN LIMITED

    Abstract: Provided is a method for manufacturing a semiconductor device. Also provided are: a semiconductor device which can be obtained by the method; and a dispersion that can be used in the method. A method for manufacturing a semiconductor device (500a) of the present invention includes the steps (a)-(c) described below. (a) A dispersion which contains doped particles is applied to a specific part of a layer or a base. (b) An unsintered dopant implanted layer is obtained by drying the applied dispersion. (c) The specific part of the layer or the base is doped with a p-type or n-type dopant by irradiating the unsintered dopant implanted layer with light, and the unsintered dopant implanted layer is sintered, thereby obtaining a dopant implanted layer that is integrated with the layer or the base.

    Abstract translation: 提供一种半导体器件的制造方法。 还提供了:可以通过该方法获得的半导体器件; 以及可用于该方法的分散体。 本发明的半导体装置(500a)的制造方法包括下述步骤(a) - (c)。 (a)将包含掺杂颗粒的分散体施加到层或基底的特定部分。 (b)通过干燥所施加的分散体获得未烧结的掺杂剂注入层。 (c)通过用光照射未烧结的掺杂剂注入层,将层或基底的特定部分掺杂p型或n型掺杂剂,并烧结未烧结的掺杂剂注入层,从而获得掺杂剂注入层, 与层或基底集成。

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