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公开(公告)号：US20190163051A1
公开(公告)日：2019-05-30
申请号：US16045816
申请日：2018-07-26
发明人： Shih-Ming CHANG , Minfeng CHEN , Min-An YANG , Shao-Chi WEI
IPC分类号： G03F1/58 , H01L21/027 , G03F7/20 , G03F1/24
摘要： A method for forming a photomask is provided. The method includes forming a light blocking layer over a transparent substrate. The method includes forming a mask layer over the light blocking layer. The mask layer covers a first portion of the light blocking layer, and the first portion is over a second portion of the transparent substrate. The method includes removing the light blocking layer, which is not covered by the mask layer. The method includes removing the mask layer. The first portion of the light blocking layer is removed during removing the mask layer. The method includes removing the second portion of the transparent substrate to form a first recess in the transparent substrate. The method includes forming a first light blocking structure in the first recess.
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2.发明申请公开(公告)号：US20180161828A1
公开(公告)日：2018-06-14
申请号：US15490075
申请日：2017-04-18
发明人： Min-An YANG , Hao-Ming CHANG , Shao-Chi WEI , Kuo-Chin LIN , Sheng-Chang HSU , Li-Chih LU , Cheng-Ming LIN
IPC分类号： B08B3/08 , H01L21/02 , H01L21/027 , H01L21/66 , H01L21/67 , B08B3/10 , H04N5/33 , G01J5/10 , G01J5/00
CPC分类号： G01J5/0037 , G01J5/10 , G01J2005/0077 , G01J2005/0081 , G03F7/3021 , H01L21/02052 , H01L21/67051 , H01L21/67253 , H01L21/67288
摘要： A method for processing a substrate is provided. The method includes supplying a first flow of a chemical solution into a processing chamber, configured to process the substrate, via a first dispensing nozzle. The method further includes producing a first thermal image of the first flow of the chemical solution. The method also includes performing an image analysis on the first thermal image. In addition, the method includes moving the substrate into the processing chamber when the result of the analysis of the first thermal image is within the allowable deviation from the baseline.
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