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公开(公告)号:US11929340B2
公开(公告)日:2024-03-12
申请号:US17394213
申请日:2021-08-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Yu Yeh , Chun-Hua Chang , Fong-Yuan Chang , Jyh Chwen Frank Lee
CPC classification number: H01L24/20 , H01L24/19 , H01L21/568 , H01L24/13 , H01L2224/13024 , H01L2224/19 , H01L2224/221
Abstract: A structure includes a redistribution structure, which includes a bottom layer and a plurality of upper layers over the bottom layer. The redistribution structure also includes a power-ground macro extending from a topmost layer in the plurality of upper layers to a bottommost layer in the plurality of upper layers, and a metal pad in the bottom layer and overlapped by the power-ground macro. The metal pad is electrically disconnected from the power-ground macro.
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公开(公告)号:US20240178177A1
公开(公告)日:2024-05-30
申请号:US18428934
申请日:2024-01-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Yu Yeh , Chun-Hua Chang , Fong-Yuan Chang , Jyh Chwen Frank Lee
CPC classification number: H01L24/20 , H01L24/19 , H01L21/568 , H01L24/13 , H01L2224/13024 , H01L2224/19 , H01L2224/221
Abstract: A structure includes a redistribution structure, which includes a bottom layer and a plurality of upper layers over the bottom layer. The redistribution structure also includes a power-ground macro extending from a topmost layer in the plurality of upper layers to a bottommost layer in the plurality of upper layers, and a metal pad in the bottom layer and overlapped by the power-ground macro. The metal pad is electrically disconnected from the power-ground macro.
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公开(公告)号:US20210035884A1
公开(公告)日:2021-02-04
申请号:US16524172
申请日:2019-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Yu Yeh , Cing-He Chen , Kuo-Chiang Ting , Weiming Chris Chen , Chia-Hao Hsu
IPC: H01L23/373 , H01L21/56 , H01L23/31 , H01L23/367 , H01L23/00
Abstract: A semiconductor package includes a redistribution structure, at least one semiconductor device and a plurality of heat dissipation films. The at least one semiconductor device is mounted on the redistribution structure. The plurality of heat dissipation films are disposed on the at least one semiconductor device in a side by side manner and jointly cover an upper surface of the at least one semiconductor device. A manufacturing method of the semiconductor package is also provided.
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公开(公告)号:US11728238B2
公开(公告)日:2023-08-15
申请号:US16524172
申请日:2019-07-29
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Yu Yeh , Cing-He Chen , Kuo-Chiang Ting , Weiming Chris Chen , Chia-Hao Hsu
IPC: H01L23/373 , H01L21/56 , H01L23/31 , H01L23/00 , H01L23/367
CPC classification number: H01L23/3735 , H01L21/565 , H01L23/3107 , H01L23/367 , H01L24/09 , H01L2224/02372 , H01L2924/3511
Abstract: A semiconductor package includes a redistribution structure, at least one semiconductor device and a plurality of heat dissipation films. The at least one semiconductor device is mounted on the redistribution structure. The plurality of heat dissipation films are disposed on the at least one semiconductor device in a side by side manner and jointly cover an upper surface of the at least one semiconductor device. A manufacturing method of the semiconductor package is also provided.
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公开(公告)号:US11532585B2
公开(公告)日:2022-12-20
申请号:US17121353
申请日:2020-12-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Kuo-Chiang Ting , Chi-Hsi Wu , Shang-Yun Hou , Tu-Hao Yu , Chia-Hao Hsu , Ting-Yu Yeh
IPC: H01L23/00 , H01L21/56 , H01L21/683 , H01L21/48 , H01L23/498 , H01L23/538 , H01L25/18 , H01L25/00 , H01L23/31
Abstract: A method includes bonding a first device die and a second device die to an interconnect die. The interconnect die includes a first portion over and bonded to the first device die, and a second portion over and bonded to the second device die. The interconnect die electrically connects the first device die to the second device die. The method further includes encapsulating the interconnect die in an encapsulating material, and forming a plurality of redistribution lines over the interconnect die.
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公开(公告)号:US20210098408A1
公开(公告)日:2021-04-01
申请号:US17121353
申请日:2020-12-14
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Kuo-Chiang Ting , Chi-Hsi Wu , Shang-Yun Hou , Tu-Hao Yu , Chia-Hao Hsu , Ting-Yu Yeh
IPC: H01L23/00 , H01L21/56 , H01L21/683 , H01L21/48 , H01L23/498 , H01L23/538 , H01L25/18 , H01L25/00
Abstract: A method includes bonding a first device die and a second device die to an interconnect die. The interconnect die includes a first portion over and bonded to the first device die, and a second portion over and bonded to the second device die. The interconnect die electrically connects the first device die to the second device die. The method further includes encapsulating the interconnect die in an encapsulating material, and forming a plurality of redistribution lines over the interconnect die.
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公开(公告)号:US20240258261A1
公开(公告)日:2024-08-01
申请号:US18629641
申请日:2024-04-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Kuo-Chiang Ting , Chi-Hsi Wu , Shang-Yun Hou , Tu-Hao Yu , Chia-Hao Hsu , Ting-Yu Yeh
IPC: H01L23/00 , H01L21/48 , H01L21/56 , H01L21/683 , H01L23/31 , H01L23/498 , H01L23/538 , H01L25/00 , H01L25/18
CPC classification number: H01L24/24 , H01L21/4853 , H01L21/4857 , H01L21/561 , H01L21/6835 , H01L23/49816 , H01L23/5383 , H01L23/5385 , H01L23/5386 , H01L23/5389 , H01L24/08 , H01L24/19 , H01L24/25 , H01L24/32 , H01L24/73 , H01L25/18 , H01L25/50 , H01L21/563 , H01L23/3128 , H01L2221/68345 , H01L2221/68359 , H01L2224/08145 , H01L2224/08235 , H01L2224/08265 , H01L2224/24011 , H01L2224/24137 , H01L2224/24146 , H01L2224/25171 , H01L2224/32227 , H01L2224/73267 , H01L2224/83001
Abstract: A method includes bonding a first device die and a second device die to an interconnect die. The interconnect die includes a first portion over and bonded to the first device die, and a second portion over and bonded to the second device die. The interconnect die electrically connects the first device die to the second device die. The method further includes encapsulating the interconnect die in an encapsulating material, and forming a plurality of redistribution lines over the interconnect die.
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公开(公告)号:US11978714B2
公开(公告)日:2024-05-07
申请号:US18068064
申请日:2022-12-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Kuo-Chiang Ting , Chi-Hsi Wu , Shang-Yun Hou , Tu-Hao Yu , Chia-Hao Hsu , Ting-Yu Yeh
IPC: H01L23/00 , H01L21/48 , H01L21/56 , H01L21/683 , H01L23/31 , H01L23/498 , H01L23/538 , H01L25/00 , H01L25/18
CPC classification number: H01L24/24 , H01L21/4853 , H01L21/4857 , H01L21/561 , H01L21/6835 , H01L23/49816 , H01L23/5383 , H01L23/5385 , H01L23/5386 , H01L23/5389 , H01L24/08 , H01L24/19 , H01L24/25 , H01L24/32 , H01L24/73 , H01L25/18 , H01L25/50 , H01L21/563 , H01L23/3128 , H01L2221/68345 , H01L2221/68359 , H01L2224/08145 , H01L2224/08235 , H01L2224/08265 , H01L2224/24011 , H01L2224/24137 , H01L2224/24146 , H01L2224/25171 , H01L2224/32227 , H01L2224/73267 , H01L2224/83001
Abstract: A method includes bonding a first device die and a second device die to an interconnect die. The interconnect die includes a first portion over and bonded to the first device die, and a second portion over and bonded to the second device die. The interconnect die electrically connects the first device die to the second device die. The method further includes encapsulating the interconnect die in an encapsulating material, and forming a plurality of redistribution lines over the interconnect die.
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公开(公告)号:US20230124804A1
公开(公告)日:2023-04-20
申请号:US18068064
申请日:2022-12-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Kuo-Chiang Ting , Chi-Hsi Wu , Shang-Yun Hou , Tu-Hao Yu , Chia-Hao Hsu , Ting-Yu Yeh
IPC: H01L23/00 , H01L21/56 , H01L21/683 , H01L21/48 , H01L23/498 , H01L23/538 , H01L25/18 , H01L25/00
Abstract: A method includes bonding a first device die and a second device die to an interconnect die. The interconnect die includes a first portion over and bonded to the first device die, and a second portion over and bonded to the second device die. The interconnect die electrically connects the first device die to the second device die. The method further includes encapsulating the interconnect die in an encapsulating material, and forming a plurality of redistribution lines over the interconnect die.
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公开(公告)号:US20220230981A1
公开(公告)日:2022-07-21
申请号:US17394213
申请日:2021-08-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Ting-Yu Yeh , Chun-Hua Chang , Fong-Yuan Chang , Jyh Chwen Frank Lee
IPC: H01L23/00
Abstract: A structure includes a redistribution structure, which includes a bottom layer and a plurality of upper layers over the bottom layer. The redistribution structure also includes a power-ground macro extending from a topmost layer in the plurality of upper layers to a bottommost layer in the plurality of upper layers, and a metal pad in the bottom layer and overlapped by the power-ground macro. The metal pad is electrically disconnected from the power-ground macro.
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