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公开(公告)号:US12002534B2
公开(公告)日:2024-06-04
申请号:US17842256
申请日:2022-06-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Han Lin , Chenchen Jacob Wang , Yi-Ching Liu , Han-Jong Chia , Sai-Hooi Yeong , Yu-Ming Lin , Yih Wang
CPC classification number: G11C5/063 , H01L29/24 , H01L29/78391 , H01L29/7869 , H10B41/27 , H10B51/00 , H10B51/10 , H10B51/20
Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.
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公开(公告)号:US20210398568A1
公开(公告)日:2021-12-23
申请号:US17015679
申请日:2020-09-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Han Lin , Chenchen Jacob Wang , Yi-Ching Liu , Han-Jong Chia , Sai-Hooi Yeong , Yu-Ming Lin , Yih Wang
IPC: G11C5/06 , H01L27/11587 , H01L29/24 , H01L27/11597 , H01L29/78
Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.
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公开(公告)号:US11042148B2
公开(公告)日:2021-06-22
申请号:US15992207
申请日:2018-05-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Lin-Kai Huang , Wei-Chi Su , Yi-Ching Liu , Cheng-Hsuan Liu
IPC: G05B19/418 , H01L21/67 , H01L21/66
Abstract: In the disclosure, a scheduled route of a lot may be rescheduled to another fabrication tool performing the same fabrication processes as to expand the production line and throughput. The controlling method includes at least the following steps. The lot is scheduled with a predetermined route having a plurality of fabrication tools configured to process the lot with a plurality of fabrication processes in a sequence. The lot is monitored as the lot is being processed by the fabrication tools in each of the fabrication processes, and inspection data is generated for each fabrication process. The lot is rescheduled to another fabrication tool outside of the predetermined route for one of the fabrication processes according to a release rule and the inspection data.
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公开(公告)号:US20190155260A1
公开(公告)日:2019-05-23
申请号:US15992207
申请日:2018-05-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Lin-Kai Huang , Wei-Chi Su , Yi-Ching Liu , Cheng-Hsuan Liu
IPC: G05B19/418 , H01L21/66 , H01L21/67
Abstract: In the disclosure, a scheduled route of a lot may be rescheduled to another fabrication tool performing the same fabrication processes as to expand the production line and throughput. The controlling method includes at least the following steps. The lot is scheduled with a predetermined route having a plurality of fabrication tools configured to process the lot with a plurality of fabrication processes in a sequence. The lot is monitored as the lot is being processed by the fabrication tools in each of the fabrication processes, and inspection data is generated for each fabrication process. The lot is rescheduled to another fabrication tool outside of the predetermined route for one of the fabrication processes according to a release rule and the inspection data.
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公开(公告)号:US11955201B2
公开(公告)日:2024-04-09
申请号:US17873692
申请日:2022-07-26
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Meng-Sheng Chang , Chia-En Huang , Yi-Ching Liu , Yih Wang
CPC classification number: G11C7/1051 , G11C7/1006 , G11C7/12 , G11C7/18 , G11C8/08 , G11C8/14
Abstract: A memory device includes a plurality of arrays coupled in parallel with each other. A first array of the plurality of arrays includes a first switch and a plurality of first memory cells that are arranged in a first column, a second switch and a plurality of second memory cells that are arranged in a second column, and at least one data line coupled to the plurality of first memory cells and the plurality of second memory cells. The second switch is configured to output a data signal from the at least one data line to a sense amplifier.
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公开(公告)号:US20240274160A1
公开(公告)日:2024-08-15
申请号:US18644516
申请日:2024-04-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Han Lin , Chenchen Jacob Wang , Yi-Ching Liu , Han-Jong Chia , Sai-Hooi Yeong , Yu-Ming Lin , Yih Wang
CPC classification number: G11C5/063 , H01L29/24 , H01L29/78391 , H01L29/7869 , H10B41/27 , H10B51/00 , H10B51/10 , H10B51/20
Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.
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公开(公告)号:US20220310132A1
公开(公告)日:2022-09-29
申请号:US17842256
申请日:2022-06-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Meng-Han Lin , Chenchen Jacob Wang , Yi-Ching Liu , Han-Jong Chia , Sai-Hooi Yeong , Yu-Ming Lin , Yih Wang
IPC: G11C5/06 , H01L27/11587 , H01L29/78 , H01L27/11597 , H01L29/24 , H01L27/11585 , H01L27/11556 , H01L29/786
Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.
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公开(公告)号:US11423960B2
公开(公告)日:2022-08-23
申请号:US17085398
申请日:2020-10-30
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor: Meng-Sheng Chang , Chia-En Huang , Yi-Ching Liu , Yih Wang
Abstract: A memory device is disclosed, including a first switch and multiple first memory cells that are arranged in a first column, a second switch and multiple second memory cells that are arranged in a second column, a first data line and a second data line. The first data line is coupled to the first memory cells and the second memory cells. The second data line is coupled connected to the first memory cells and the second memory cells. The first switch transmits a data signal in the first data line in response to a control signal. The second switch outputs the data signal received from the second data line in response to the control signal.
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