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1.发明授权Positive resist composition, method of forming resist pattern using the same, and polymeric compound 有权正型抗蚀剂组合物，使用其形成抗蚀剂图案的方法和聚合物公开(公告)号：US08268529B2
公开(公告)日：2012-09-18
申请号：US12687430
申请日：2010-01-14
CPC分类号： C08F220/26 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).
摘要翻译： 一种正性抗蚀剂组合物，其包含在碱的作用下在碱性显影液中的溶解度变化的碱成分（A）和暴露于有机溶剂（S）时产生酸的酸产生剂成分（B），所述碱 含有由侧链上具有含有磺酰基的环状基团的丙烯酸酯衍生的结构单元（a0）的高分子化合物（A1）的组分（A），来源于丙烯酸酯的结构单元（a1） 酸解离，溶解抑制基团和由通式（a5-1）表示的结构单元（a5）（Y1表示脂族烃基; Z表示一价有机基团; a表示1〜3的整数，b表示 0〜2的整数，条件是a + b = 1〜3）。
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2.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND POLYMERIC COMPOUND 有权正极性组合物，使用其的耐热图案的形成方法和聚合物公开(公告)号：US20100196821A1
公开(公告)日：2010-08-05
申请号：US12687430
申请日：2010-01-14
IPC分类号： G03F7/20 , G03F7/004 , C08F220/26 , C08F228/06
CPC分类号： C08F220/26 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure dissolved in an organic solvent (S), the base component (A) containing a polymeric compound (A1) including a structural unit (a0) derived from an acrylate ester having a cyclic group containing a sulfonyl group on the side chain thereof, a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group and a structural unit (a5) represented by general formula (a5-1) (Y1 represents an aliphatic hydrocarbon group; Z represents a monovalent organic group; a represents an integer of 1 to 3, and b represents an integer of 0 to 2, provided that a+b=1 to 3).
摘要翻译： 一种正性抗蚀剂组合物，其包含在碱的作用下在碱性显影液中的溶解度变化的碱成分（A）和暴露于有机溶剂（S）时产生酸的酸产生剂成分（B），所述碱 含有由侧链上具有含有磺酰基的环状基团的丙烯酸酯衍生的结构单元（a0）的高分子化合物（A1）的组分（A），来源于丙烯酸酯的结构单元（a1） 酸解离，溶解抑制基团和由通式（a5-1）表示的结构单元（a5）（Y1表示脂族烃基; Z表示一价有机基团; a表示1〜3的整数，b表示 0〜2的整数，条件是a + b = 1〜3）。
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3.发明授权Positive resist composition, method of forming resist pattern, and polymeric compound 有权正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物公开(公告)号：US08541529B2
公开(公告)日：2013-09-24
申请号：US13454399
申请日：2012-04-24
CPC分类号： G03F7/2041 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。
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4.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权正极性组合物，形成耐火模式的方法和聚合物公开(公告)号：US20120202151A1
公开(公告)日：2012-08-09
申请号：US13454399
申请日：2012-04-24
CPC分类号： G03F7/2041 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。
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5.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权正极性组合物，形成耐火模式的方法和聚合物公开(公告)号：US20100233625A1
公开(公告)日：2010-09-16
申请号：US12721240
申请日：2010-03-10
CPC分类号： G03F7/2041 , C08F212/08 , C08F212/14 , C08F212/32 , C08F220/24 , C08F220/28 , C08F220/30 , C08F2220/1891 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.
摘要翻译： 一种正极抗蚀剂组合物，其包含在酸性作用下在碱显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸发生剂组分（B），所述碱成分（A）包含聚合物 含有具有芳香族基团的结构单元（a0）的化合物（A1），下述通式（a5-1）所示的结构单元（a5）和含有酸解离性，溶解抑制性的结构单元（a1） 组。 式（a5-1）中，R 1表示氢原子，碳原子数1〜5的烷基或碳原子数1〜5的卤代烷基，R 2表示二价连接基，R 3表示含有 -SO2-在其环骨架内。
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6.发明授权Positive resist composition, method of forming resist pattern, and polymeric compound 有权正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物公开(公告)号：US08182976B2
公开(公告)日：2012-05-22
申请号：US12461688
申请日：2009-08-20
CPC分类号： G03F7/0397 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述树脂成分（A）包含至少一种结构 单元（a0）选自由通式（a0-1）表示的结构单元[R2表示二价连接基团，R 3表示在其环骨架中含有-SO 2的环状基团]和结构单元 （a2）和含有含内酯的环状基团的丙烯酸酯衍生的聚合化合物（A1）和在其结构内含有酸解离性，溶解抑制基团的高分子化合物（A1）。
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7.发明授权Positive resist composition, method of forming resist pattern, and polymeric compound 有权正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物公开(公告)号：US08192915B2
公开(公告)日：2012-06-05
申请号：US12461687
申请日：2009-08-20
CPC分类号： G03F7/2041 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/0397
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），其含有由通式（a0-1）表示的结构单元（a0）（R2表示二价连接基团，R3表示在其环骨架中含有-SO2-的环状基团）和结构单元（a1）得自 来自含有酸解离的溶解抑制基团的丙烯酸酯。
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8.发明申请POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND 有权正极性组合物，形成耐火模式的方法和聚合物公开(公告)号：US20100209848A1
公开(公告)日：2010-08-19
申请号：US12694037
申请日：2010-01-26
CPC分类号： C08F220/10 , C08F28/06 , G03F7/0397 , Y10S430/111
摘要： A polymeric compound (A1) includes a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) represented by general formula (a0-2), and a structural unit (a1-0-1) represented by general formula (a1-0-1), wherein relative to the combined total of all the structural units, the proportion of the structural unit (a0-1) is from 10 to 40 mol %, the proportion of the structural unit (a0-2) is from 5 to 20 mol %, and the proportion of the structural unit (a1-0-1) is from 10 to 55 mol %. [In the formulas, each of R1 and R independently represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms, R2, A and B each represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof, and R4 and X1 each represents an acid-dissociable, dissolution-inhibiting group.]
摘要翻译： 高分子化合物（A1）包括由通式（a0-1）表示的结构单元（a0-1），由通式（a0-2）表示的结构单元（a0-2）和结构单元（a1- 0-1），其中相对于所有结构单元的组合总和，结构单元（a0-1）的比例为10〜40摩尔％，比例为 结构单元（a0-2）为5〜20摩尔％，结构单元（a1-0-1）的比例为10〜55摩尔％。 [式中，R 1，R 2各自独立地表示氢原子，1〜5个碳原子的烷基或1〜5个碳原子的卤代烷基，R2，A，B各自表示二价连接基团， R3表示在其环骨架中含有-SO2-的环状基团，R4和X1各自表示酸解离的溶解抑制基团。
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9.发明申请Positive resist composition, method of forming resist pattern, and polymeric compound 有权正型抗蚀剂组合物，形成抗蚀剂图案的方法和聚合物公开(公告)号：US20100062364A1
公开(公告)日：2010-03-11
申请号：US12461688
申请日：2009-08-20
CPC分类号： G03F7/0397 , C08F28/06 , C08F220/28 , C08F228/06 , G03F7/0045 , G03F7/2041
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including at least one structural unit (a0) selected from the group consisting of a structural unit represented by general formula (a0-1) [R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof] and a structural unit (a2) derived from an acrylate ester containing a lactone-containing cyclic group, and the polymeric compound (A1) containing an acid dissociable, dissolution inhibiting group within the structure thereof.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述树脂成分（A）包含至少一种结构 单元（a0）选自由通式（a0-1）表示的结构单元[R2表示二价连接基团，R 3表示在其环骨架中含有-SO 2的环状基团]和结构单元 （a2）和含有含内酯的环状基团的丙烯酸酯衍生的聚合化合物（A1）和在其结构内含有酸解离性，溶解抑制基团的高分子化合物（A1）。
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公开(公告)号：US20120329969A1
公开(公告)日：2012-12-27
申请号：US13539558
申请日：2012-07-02
申请人： Tasuku MATSUMIYA , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
发明人： Tasuku MATSUMIYA , Daiju Shiono , Tomoyuki Hirano , Takahiro Dazai , Kotaro Endo
IPC分类号： C08F228/06
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111
摘要： A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.
摘要翻译： 一种正性抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出增加的溶解度的碱成分（A）和暴露时产生酸的酸产生剂组分（B），所述碱成分（A）包含高分子化合物 A1），由通式（a0-1）表示的结构单元（a0），由含有酸解离性，溶解抑制基团的丙烯酸酯衍生的结构单元（a1）和来自丙烯酸酯的结构单元（a3） 含有由通式（a3-1）表示的含羟基的脂族烃基的酯和基于构成聚合化合物（A1）的所有结构单元的总和的结构单元（a3）的量在该范围内 为1〜30摩尔％。
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