公开(公告)号：US5502244A

公开(公告)日：1996-03-26

申请号：US405014

申请日：1995-03-16

申请人： Takashi Okawa ,  Toshinari Aoki ,  Hiroshi Matsunaga ,  Hideo Igarashi

发明人： Takashi Okawa ,  Toshinari Aoki ,  Hiroshi Matsunaga ,  Hideo Igarashi

IPC分类号： B01J31/02 ,  C07B61/00 ,  C07C263/04 ,  C07C265/14 ,  C07C263/00

CPC分类号： C07C263/04 ,  C07C2101/14

摘要： Provided is a process for producing isocyanates from carbamic acid esters which comprises thermally decomposing carbamic acid esters in the presence of a catalyst containing at least one compound selected from the group consisting of organic sulfonic acids and alkaline metal salts of organic sulfonic acids. Thereby, a high thermal decomposition rate can be provided and isocyanate can be obtained in a high yield.

摘要翻译： 提供了一种由氨基甲酸酯制备异氰酸酯的方法，其包括在含有至少一种选自有机磺酸和有机磺酸的碱金属盐的化合物的催化剂存在下热分解氨基甲酸酯。 因此，可以提供高的热分解速率，并且可以以高产率获得异氰酸酯。

公开(公告)号：US09375640B2

公开(公告)日：2016-06-28

申请号：US13271510

申请日：2011-10-12

申请人： Hiroshi Matsunaga

发明人： Hiroshi Matsunaga

IPC分类号： A63F13/00 ,  A63F13/20

CPC分类号： A63F13/428 ,  A63F13/06 ,  A63F13/2145 ,  A63F13/218 ,  A63F13/26 ,  A63F13/5252 ,  A63F2300/1056 ,  A63F2300/1068 ,  A63F2300/1075 ,  A63F2300/301 ,  A63F2300/403 ,  A63F2300/6045 ,  A63F2300/6669

摘要： A load applied to a first input device is sequentially detected, and a first display image to be displayed on a portable display device is sequentially generated based on load data. The portable display device obtains image data representing the first display image, and sequentially displays the first display image represented by the obtained image data. In this exemplary embodiment, when a user performs an operation based on his/her action and thereby a process based on the user's action is performed, the user is allowed to view the result of the process in a favorable situation.

摘要翻译： 顺序地检测施加到第一输入装置的负载，并且基于负载数据顺序地生成要显示在便携式显示装置上的第一显示图像。 便携式显示装置获取表示第一显示图像的图像数据，并顺序地显示由所获得的图像数据表示的第一显示图像。 在该示例性实施例中，当用户基于他/她的动作执行操作，从而执行基于用户动作的处理时，允许用户在有利的情况下查看处理结果。

公开(公告)号：US08420529B2

公开(公告)日：2013-04-16

申请号：US13119539

申请日：2009-09-02

申请人： Kenji Yamada ,  Kenji Shimada ,  Hiroshi Matsunaga

发明人： Kenji Yamada ,  Kenji Shimada ,  Hiroshi Matsunaga

IPC分类号： H01L21/28

CPC分类号： H01L21/321 ,  H01L21/02063 ,  H01L21/02074

摘要： A copper wiring material surface protective liquid for production of a semiconductor device is provided, containing an oxyalkylene adduct of an acetylenediol containing an acetylenediol having an oxyalkylene having 2 or 3 carbon atoms added thereto. A method for producing a semiconductor circuit device is provided, containing: forming an insulating film and/or a diffusion preventing film on a silicon substrate; then forming a copper film by a sputtering method; then forming a copper wiring containing 80% by mass or more of copper thereon by a plating method; and flattening the wiring by a chemical mechanical polishing (CMP) method, thereby providing a semiconductor substrate containing a copper wiring, the semiconductor substrate having an exposed surface of a copper wiring material being treated by making in contact with the copper wiring material surface protective liquid.

摘要翻译： 提供一种用于制造半导体器件的铜布线材料表面保护液，其含有含有具有2或3个碳原子的氧化烯的乙炔二醇的乙炔二醇的氧化烯加成物。 提供一种制造半导体电路器件的方法，包括：在硅衬底上形成绝缘膜和/或防扩散膜; 然后通过溅射法形成铜膜; 然后通过电镀法形成含有80质量％以上的铜的铜布线; 并通过化学机械抛光（CMP）方法使布线变平，从而提供含有铜布线的半导体基板，该半导体基板具有通过与铜布线材料表面保护液体接触来处理铜布线材料的暴露表面 。

公开(公告)号：US07977292B2

公开(公告)日：2011-07-12

申请号：US12530766

申请日：2008-03-06

申请人： Hiroshi Matsunaga ,  Masaru Ohto ,  Hideo Kashiwagi ,  Hiroshi Yoshida

发明人： Hiroshi Matsunaga ,  Masaru Ohto ,  Hideo Kashiwagi ,  Hiroshi Yoshida

IPC分类号： C11D7/18

CPC分类号： H01L21/31133 ,  C11D3/3947 ,  C11D7/06 ,  C11D7/36 ,  C11D11/0047 ,  G03F7/423 ,  G03F7/425 ,  H01L21/02063

摘要： A cleaning composition of a semiconductor device for laminating an organosiloxane-based thin film and a photoresist layer in this order on a substrate having a low dielectric interlayer insulation film and a copper wiring or a copper alloy wiring, then applying selective exposure and development treatments to the subject photoresist layer to form a photoresist pattern, subsequently applying a dry etching treatment to the organosiloxane-based thin film and the low dielectric interlayer insulation film while using this resist pattern as a mask and then removing the organosiloxane-based thin film, a residue generated by the dry etching treatment, a modified photoresist having been modified by the dry etching treatment and an unmodified photoresist layer located in a lower layer than the modified photoresist, the cleaning composition containing from 15 to 20% by mass of hydrogen peroxide, from 0.0001 to 0.003% by mass of an amino polymethylene phosphonic acid, from 0.02 to 0.5% by mass of potassium hydroxide and water and having a pH of from 7.5 to 8.5, is provided. Also, a method for manufacturing a semiconductor device using the subject cleaning composition is provided.

摘要翻译： 一种用于在具有低介电层间绝缘膜和铜布线或铜合金布线的基板上依次层叠有机硅氧烷类薄膜和光致抗蚀剂层的半导体装置的清洗组合物，然后对其进行选择性曝光和显影处理 该主体光致抗蚀剂层形成光致抗蚀剂图案，随后在使用该抗蚀剂图案作为掩模的同时对有机硅氧烷类薄膜和低介电层间绝缘膜进行干蚀刻处理，然后除去有机硅氧烷类薄膜，残留物 通过干蚀刻处理产生的改性光致抗蚀剂，通过干蚀刻处理改性的改性光致抗蚀剂和位于比改性光致抗蚀剂低的层中的未改性光致抗蚀剂层，清洗组合物含有15〜20质量％的过氧化氢，0.0001 至0.003质量％的氨基聚亚甲基膦酸，为0.02〜0.5质量％ 氢氧化钾和水，pH为7.5至8.5。 另外，提供了使用该被检体组合物的半导体装置的制造方法。

公开(公告)号：US20100197136A1

公开(公告)日：2010-08-05

申请号：US12668695

申请日：2008-07-03

申请人： Kenji Shimada ,  Hiroshi Matsunaga ,  Kojiro Abe ,  Kenji Yamada

发明人： Kenji Shimada ,  Hiroshi Matsunaga ,  Kojiro Abe ,  Kenji Yamada

IPC分类号： H01L21/768 ,  C11D3/28 ,  G03F7/20 ,  H01L21/306

CPC分类号： C23G1/103 ,  C11D3/0073 ,  C11D3/28 ,  C11D3/33 ,  C11D7/10 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3245 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  C23G1/06 ,  H01L21/02063 ,  H01L21/02068

摘要： A composition for cleaning and corrosion inhibition which is used in a step of manufacturing a semiconductor device or a display device having a copper-containing metallic wiring is provided, wherein the corrosion inhibitor component is any one of pyrazole, a pyrazole derivative such as 3,5-dimethylpyrazole, a triazole derivative such as 1,2,4-triazole, an aminocarboxylic acid such as iminodiacetic acid or ethylenediaminedipropionic acid hydrochloride, or a disulfide compound such as diisopropyl disulfide or diethyl disulfide; and the cleaning agent component is any one of ammonium fluoride, tetramethylammonium fluoride, ammonium acetate, acetic acid, glyoxylic acid, oxalic acid, ascorbic acid, 1,2-diaminopropane or dimethylacetamide. Also, a method for manufacturing a semiconductor device or the like using the composition for cleaning and corrosion inhibition is provided.

摘要翻译： 提供了用于制造半导体器件或具有含铜金属布线的显示器件的步骤中用于清洁和腐蚀抑制的组合物，其中所述腐蚀抑制剂成分是吡唑，吡唑衍生物如3， 咪唑衍生物如1,2,4-三唑，氨基羧酸如亚氨基二乙酸或乙二胺二丙酸盐酸盐，或二硫化物化合物如二异丙基二硫化物或二乙基二硫醚; 清洗剂成分为氟化铵，四甲基氟化铵，乙酸铵，乙酸，乙醛酸，草酸，抗坏血酸，1,2-二氨基丙烷或二甲基乙酰胺中的任一种。 另外，提供了使用该清洗抑制组合物制造半导体装置等的方法。

公开(公告)号：US20100051066A1

公开(公告)日：2010-03-04

申请号：US12158077

申请日：2006-12-14

申请人： Eiko Kuwabara ,  Hideo Kashiwagi ,  Hiroshi Matsunaga ,  Masaru Ohto

发明人： Eiko Kuwabara ,  Hideo Kashiwagi ,  Hiroshi Matsunaga ,  Masaru Ohto

IPC分类号： C23G1/02 ,  C11D7/32

CPC分类号： H05K3/26 ,  C11D3/3947 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/423 ,  G03F7/425 ,  H05K3/0041 ,  H05K3/388 ,  H05K2203/0796 ,  H05K2203/124

摘要： A composition for removing a residue from a wiring board containing an oxidizing agent and an azole compound and having a pH of from 1 to 7 and a cleaning method of a wiring board for removing a residue after dry etching by using this composition are provided. By using the composition for removing a residue of the present invention, in manufacturing a wiring board, residues remaining after dry etching which are derived from a resist or metals can be effectively removed without corroding titanium or titanium alloys with high corrosiveness. In particular, a semiconductor device using a wiring board containing titanium or titanium alloys can be efficiently manufactured.

摘要翻译： 提供一种用于从含有氧化剂和唑类化合物并且pH为1至7的布线板除去残余物的组合物，以及通过使用该组合物在干法蚀刻之后除去残留物的布线板的清洁方法。 通过使用除去本发明的残渣的组合物，在制造布线板时，可以有效地除去从抗蚀剂或金属衍生的干蚀刻后剩余的残留物，而不会腐蚀具有高腐蚀性的钛或钛合金。 特别地，可以有效地制造使用含有钛或钛合金的布线板的半导体装置。

公开(公告)号：US20090159823A1

公开(公告)日：2009-06-25

申请号：US12334326

申请日：2008-12-12

申请人： Hiroshi Matsunaga ,  Atsushi Saito

发明人： Hiroshi Matsunaga ,  Atsushi Saito

IPC分类号： F16K31/02

CPC分类号： F16K11/07 ,  F16K31/082

摘要： A mechanical valve has a main body having a cylinder hole formed therein, a movable element that is inserted into the cylinder hole and that moves forwardly and rearwardly, and a drive section that drives the movable element. A plurality of openings through which air passes are formed in an internal peripheral surface of the cylinder hole, and the openings are opened and closed as a result of forward and rearward movements of the movable element. A movable magnet is fastened to each of both ends of the movable element. Electromagnets opposing the respective movable magnets are provided in a drive section. The movable element is actuated by utilization of magnetic force of the electromagnets.

摘要翻译： 机械阀具有形成在其中的气缸孔的主体，插入到气缸孔中并且向前和向后移动的可动元件和驱动可动元件的驱动部。 空气通过的多个开口形成在气缸孔的内周表面中，并且由于可动元件的向前和向后运动，开口被打开和关闭。 可移动磁体被固定到可动元件的两端中的每一端。 与各可动磁铁相对的电磁铁设置在驱动部中。 通过利用电磁铁的磁力来致动可动元件。

公开(公告)号：US20060216185A1

公开(公告)日：2006-09-28

申请号：US11387344

申请日：2006-03-23

申请人： Toru Aya ,  Toshiharu Yasu ,  Hiroshi Matsunaga

发明人： Toru Aya ,  Toshiharu Yasu ,  Hiroshi Matsunaga

IPC分类号： F01C1/02 ,  F03C2/00

CPC分类号： F04C28/065 ,  F04C18/3564 ,  F04C23/008 ,  F04C29/028

摘要： A hermetic rotary compressor operates two cylinders simultaneously in the regular operation; however it halts operating one of the cylinders when it selects an operation with a half capacity. A vane room of the halted cylinder is air-tightly sealed with respect to lubricant atmosphere in a hermetic case. An oil-supplying groove is provided to a vane groove of the halted cylinder, and lubricant is supplied to the oil-supplying groove in order to lubricate the vane.

摘要翻译： 密封式旋转压缩机在正常运行中同时操作两个气缸; 然而，当它选择具有半容量的操作时，它停止操作一个气缸。 停止的气缸的叶片室在密封的壳体中相对于润滑剂气氛气密密封。 向停止的气缸的叶片槽设置供油槽，向供油槽供给润滑剂以润滑叶片。

公开(公告)号：US20060121985A1

公开(公告)日：2006-06-08

申请号：US11266373

申请日：2005-11-04

申请人： Keigo Nakanishi ,  Hiroshi Matsunaga ,  Shinichi Ikematsu

发明人： Keigo Nakanishi ,  Hiroshi Matsunaga ,  Shinichi Ikematsu

IPC分类号： A63F9/24

CPC分类号： A63F13/426 ,  A63F13/10 ,  A63F13/2145 ,  A63F13/26 ,  A63F13/92 ,  A63F13/95 ,  A63F2300/1075 ,  A63F2300/204 ,  A63F2300/301 ,  A63F2300/6045

摘要： Reference coordinates in a coordinate system and designated coordinates in the coordinate system based on coordinate information outputted by a pointing device are set. A distance and direction between the reference coordinates and the designated coordinates are calculated. When the distance has a value smaller than a predetermined threshold value, the distance is converted into a game parameter using a first conversion function is determined. On the other hand, when the distance has a value greater than the predetermined threshold value, the distance is converted into a game parameter using a second conversion function for converting the distance into a value greater than a value into which the distance is converted using the first conversion function. The game is processed using the direction and the game parameter.

摘要翻译： 基于由坐标系输出的坐标信息，坐标系中的参考坐标和坐标系中的指定坐标被设定。 计算参考坐标与指定坐标之间的距离和方向。 当距离具有小于预定阈值的值时，使用第一转换函数确定距离被转换为游戏参数。 另一方面，当距离具有大于预定阈值的值时，使用第二转换功能将距离转换为游戏参数，用于将距离转换为大于使用 第一个转换功能。 游戏使用方向和游戏参数进行处理。

公开(公告)号：US20060040838A1

公开(公告)日：2006-02-23

申请号：US11202145

申请日：2005-08-12

申请人： Kenji Shimada ,  Kojiro Abe ,  Masaru Ohto ,  Hiroshi Matsunaga

发明人： Kenji Shimada ,  Kojiro Abe ,  Masaru Ohto ,  Hiroshi Matsunaga

IPC分类号： C11D7/32 ,  C23G1/00

CPC分类号： H01L21/02063 ,  C11D3/042 ,  C11D3/044 ,  C11D3/046 ,  C11D7/06 ,  C11D7/08 ,  C11D7/10 ,  C11D11/0047 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/32134 ,  H01L21/32138

摘要： A cleaning liquid is provided, which comprises an aqueous solution containing nitric acid, sulfuric acid, a fluorine compound, and a basic compound. The concentration of water in the cleaning liquid is 80% by weight or more, and the pH value of the cleaning liquid is from 1 to less than 3. The cleaning liquid is effective for removing etching residues formed in a dry etching process from semiconductor devices and display devices without oxidizing and corroding their metal wirings, particularly, copper wirings and the materials of insulating films.