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公开(公告)号：US20050102821A1
公开(公告)日：2005-05-19
申请号：US11013743
申请日：2004-12-17
申请人： Takeo Kagami , Kunihiro Ueda , Kentaro Nagai , Shunji Saruki
发明人： Takeo Kagami , Kunihiro Ueda , Kentaro Nagai , Shunji Saruki
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3106 , G11B5/3116 , G11B5/3903 , G11B5/40 , G11B5/488 , G11B2005/3996 , Y10T29/49032 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method of manufacturing a magnetic head manufactures a magnetic head having a base, and a laminate stacked on the base and including a magneto-resistive device. The method mechanically polishes a surface of a structure including the base and the laminate close to a magnetic recording medium, wherein the surface of the structure includes an end face of the laminate including an end face of the magneto-resistive device and a surface of the base. Next, the method selectively etches a first region on the surface of the structure close to the magnetic recording medium, wherein the first region includes the surface of the base but does not include the end face of the magneto-resistive device. Subsequently, the method entirely etches the surface of the structure close to the magnetic recording medium.
摘要翻译： 制造磁头的方法制造具有底座的磁头和堆叠在基座上并包括磁阻装置的层叠体。 该方法将包括基底和层压板的结构的表面机械抛光到靠近磁记录介质的位置，其中该结构的表面包括层压体的端面，该端面包括该磁阻装置的端面和 基础。 接下来，该方法选择性地蚀刻靠近磁记录介质的结构表面上的第一区域，其中第一区域包括基底的表面，但不包括磁阻装置的端面。 随后，该方法完全蚀刻靠近磁记录介质的结构表面。
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公开(公告)号：US07207100B2
公开(公告)日：2007-04-24
申请号：US11013743
申请日：2004-12-17
申请人： Takeo Kagami , Kunihiro Ueda , Kentaro Nagai , Shunji Saruki
发明人： Takeo Kagami , Kunihiro Ueda , Kentaro Nagai , Shunji Saruki
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3106 , G11B5/3116 , G11B5/3903 , G11B5/40 , G11B5/488 , G11B2005/3996 , Y10T29/49032 , Y10T29/49041 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method of manufacturing a magnetic head manufactures a magnetic head having a base, and a laminate stacked on the base and including a magneto-resistive device. The method mechanically polishes a surface of a structure including the base and the laminate close to a magnetic recording medium, wherein the surface of the structure includes an end face of the laminate including an end face of the magneto-resistive device and a surface of the base. Next, the method selectively etches a first region on the surface of the structure close to the magnetic recording medium, wherein the first region includes the surface of the base but does not include the end face of the magneto-resistive device. Subsequently, the method entirely etches the surface of the structure close to the magnetic recording medium.
摘要翻译： 制造磁头的方法制造具有底座的磁头和堆叠在基座上并包括磁阻装置的层叠体。 该方法将包括基底和层压板的结构的表面机械抛光到靠近磁记录介质的位置，其中该结构的表面包括层压体的端面，该端面包括该磁阻装置的端面和 基础。 接下来，该方法选择性地蚀刻靠近磁记录介质的结构表面上的第一区域，其中第一区域包括基底的表面，但不包括磁阻装置的端面。 随后，该方法完全蚀刻靠近磁记录介质的结构表面。
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公开(公告)号：US07269889B2
公开(公告)日：2007-09-18
申请号：US10237744
申请日：2002-09-10
申请人： Kunihiro Ueda , Kentaro Nagai , Hiroki Nakazawa
发明人： Kunihiro Ueda , Kentaro Nagai , Hiroki Nakazawa
CPC分类号： G11B5/3103 , G11B5/255 , G11B5/3106 , G11B5/3967 , Y10T29/49041 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： As a protective film of an element and a slider in a magnetic head, a film is provided which is excellent in adhesiveness to a film forming surface and which shows sufficient corrosion-resistance property with a thinner thickness. To provided this film, according to the present invention, a DLC film as a protective film is formed onto an element portion end surface and a surface of a slider of a magnetic head core. A film deposition step is conducted plural times to obtain the DLC film with a predetermined thickness when the DLC film is formed using an electric discharge.
摘要翻译： 作为磁头中的元件和滑块的保护膜，提供了与成膜表面的粘附性优异并且具有较薄厚度的足够的耐腐蚀性的膜。 为了提供这种膜，根据本发明，作为保护膜的DLC膜形成在磁头芯的元件部分端表面和滑块的表面上。 当使用放电形成DLC膜时，进行多次成膜步骤以获得具有预定厚度的DLC膜。
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4.发明授权Method of fabricating magnetic head slider including partial removal step of protecting film 有权制造磁头滑块的方法，包括保护薄膜的部分去除步骤公开(公告)号：US08420159B2
公开(公告)日：2013-04-16
申请号：US12588911
申请日：2009-11-02
申请人： Kunihiro Ueda , Hong Xin Fang , Dong Wong
发明人： Kunihiro Ueda , Hong Xin Fang , Dong Wong
IPC分类号： G11B20/00
CPC分类号： G11B5/102 , G11B5/3106 , G11B5/3173 , G11B5/40 , G11B5/6082
摘要： The method of fabricating a magnetic head slider includes steps of: forming a first protective film on an air bearing surface of a magnetic head slider on which either a recording element or a reproduction element is formed or on which both a recording element and a reproduction element are formed; removing a portion of the first protective film to reduce the thickness of the first protective film and forming a second protective film over the first protective film that has been reduced in thickness; and forming an uneven portion for controlling the flying characteristics of the magnetic head slider on the air bearing surface of the magnetic head slider; wherein the formation of the uneven portion is carried out after the first protective film has been formed and before the second protective film is formed, or after the second protective film has been formed.
摘要翻译： 制造磁头滑动器的方法包括以下步骤：在其上形成有记录元件或再现元件的磁头滑动器的空气支承表面上形成第一保护膜，或者在记录元件和再现元件 形成; 去除所述第一保护膜的一部分以减小所述第一保护膜的厚度并在已经减小厚度的所述第一保护膜上形成第二保护膜; 并且形成用于控制磁头滑块的空气轴承表面上的磁头滑块的飞行特性的不平坦部分; 在形成第一保护膜之后，在形成第二保护膜之前，或在形成第二保护膜之后，进行不平坦部的形成。
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公开(公告)号：US08310788B2
公开(公告)日：2012-11-13
申请号：US12232091
申请日：2008-09-10
申请人： Kunihiro Ueda , Hong Xin Fang , Dong Wang , Yoshiyuki Konishi , Satoko Ueno , Shigenobu Okada
发明人： Kunihiro Ueda , Hong Xin Fang , Dong Wang , Yoshiyuki Konishi , Satoko Ueno , Shigenobu Okada
IPC分类号： G11B5/39
CPC分类号： G11B5/3106 , C23C16/0272 , C23C16/26 , G11B5/3173 , G11B5/40 , G11B5/6082
摘要： To provide a high-quality protection target by forming a protective film that is thin and excellent in corrosion resistance. Provided is a protective film forming method for forming a protective film at least on a surface of a protection target. The method comprises: a base film forming step for forming a base film on the surface of the protection target; and a DLC film forming step for forming a diamond-like carbon film on the base film. The base film forming step forms the base film on the surface of the protection target for a plurality of times by repeating a process of depositing the base film in a prescribed thickness and eliminating a part of or a whole part of the base film. Further, the method comprises, before the DLC film forming step, an insulating layer forming step for forming an insulating layer on the surface of the base film on which the diamond-like carbon film is to be formed.
摘要翻译： 通过形成薄且耐腐蚀性优异的保护膜来提供高质量的保护目标。 提供了至少在保护对象的表面上形成保护膜的保护膜形成方法。 该方法包括：在保护目标表面上形成基膜的基膜形成步骤; 以及在基膜上形成类金刚石碳膜的DLC膜形成工序。 基底膜形成步骤通过重复以预定厚度沉积基膜的过程，并且去除基膜的一部分或全部而在保护对象的表面上形成基膜多次。 此外，该方法包括在DLC膜形成步骤之前，在要形成类金刚石碳膜的基膜的表面上形成绝缘层的绝缘层形成步骤。
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6.发明授权Methods for forming micro-texture on an air bearing surface of a magnetic read/write slider and a magnetic read/write slider with micro-texture 有权在磁读/写滑块的空气轴承表面上形成微纹理的方法和具有微纹理的磁读/写滑块公开(公告)号：US07965471B2
公开(公告)日：2011-06-21
申请号：US11218710
申请日：2005-09-06
申请人： Kunihiro Ueda , HongTao Ma , Hong Xin Fang , Xiao Feng Qiao , Heng Qiao , Yong Zhu
发明人： Kunihiro Ueda , HongTao Ma , Hong Xin Fang , Xiao Feng Qiao , Heng Qiao , Yong Zhu
CPC分类号： G11B5/1871 , G11B5/3163 , G11B5/6005 , Y10T29/49032 , Y10T29/49041
摘要： A method for forming micro-texture on an air bearing surface of a magnetic read/write slider, includes: positioning sliders arranged in arrays on a tray, each slider having a pole tip facing upward; loading the tray into a processing chamber, which is then evacuated to a preset pressure; and introducing a processing gas containing oxygen into the processing chamber; exposing the sliders to etch the surface of the slider so as to form a clear two-step structure thereon.
摘要翻译： 一种用于在磁读/写滑块的空气轴承表面上形成微纹理的方法，包括：将排列成阵列的滑块定位在托盘上，每个滑块具有朝上的极尖; 将托盘装载到处理室中，然后将其抽真空至预设压力; 并将含有氧气的处理气体引入所述处理室中; 暴露滑块以蚀刻滑块的表面，以便在其上形成清晰的两步结构。
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7.发明申请Method and apparatus for forming surface shape, method and apparatus for forming flying surface shape of magnetic head 审中-公开用于形成表面形状的方法和装置，用于形成磁头的飞行表面形状的方法和装置公开(公告)号：US20060157200A1
公开(公告)日：2006-07-20
申请号：US11326480
申请日：2006-01-06
申请人： Yoshiaki Ito , Takeshi Nakada , Kunihiro Ueda
发明人： Yoshiaki Ito , Takeshi Nakada , Kunihiro Ueda
CPC分类号： G11B5/6005 , C23F4/00 , G11B5/6082
摘要： To form a surface shape of an etching object in a short time at low cost, and to make the surface shape to be formed highly accurate. An apparatus for forming a surface shape includes a resist forming device for forming a resist of a predetermined shape on a predetermined surface of the etching object, and an etching device for performing etching to the predetermined surface of the etching object on which the resist is formed. The resist forming device includes a resist discharging device for forming a resist of a predetermined shape by discharging a resist material to the predetermined surface of the etching object.
摘要翻译： 为了在短时间内以低成本形成蚀刻对象的表面形状，并且使得形成表面形状高度准确。 用于形成表面形状的装置包括：在蚀刻对象的预定表面上形成预定形状的抗蚀剂的抗蚀剂形成装置;以及用于对形成有抗蚀剂的蚀刻对象的预定表面进行蚀刻的蚀刻装置 。 抗蚀剂形成装置包括抗蚀剂排出装置，用于通过将抗蚀剂材料排出到蚀刻对象的预定表面来形成预定形状的抗蚀剂。
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8.发明授权Method for forming film by plasma polymerization and apparatus for forming film by plasma polymerization 有权通过等离子体聚合形成膜的方法和通过等离子体聚合形成膜的装置
公开(公告)号：US5972435A
公开(公告)日：1999-10-26
申请号：US125744
申请日：1998-08-24
CPC分类号： B05D1/62 , C23C14/12 , C23C14/562
摘要： The present invention manifests a highly excellent effect of allowing the plasma polymerization film to be formed stably for a long time while very rarely suffering occurrence of abnormal discharge during the formation of the plasma polymerization film and promoting the improvement of the yield of products because it adopts as the electrode for implementing plasma polymerization that of the electrodes which is located on the side confronting a surface on which the plasma polymerization film is formed, coats this electrode with a polymer material at a covering ratio in the range of 50-100%, and effects the formation of the plasma polymerization film on an elongate substrate under the operating pressure in the range of 10.sup.-3 -1 Torr. Further, the properties of the plasma polymerization film also become highly excellent.
摘要翻译： PCT No.PCT / JP97 / 04866 Sec。 371日期：1998年8月24日 102（e）日期1998年8月24日PCT 1997年12月26日PCT公布。 公开号WO98 / 29578 日期1998年7月9日本发明表现出非常优异的使等离子体聚合膜长时间稳定形成，并且在形成等离子体聚合膜期间极少发生异常放电并促进产率提高的效果 的产品，因为其采用用于实现等离子体聚合的电极，该电极位于与形成等离子体聚合膜的表面相对的一侧，用聚合物材料以覆盖率覆盖在50的范围内 -100％，并且在10-3-1乇范围内的操作压力下，在细长衬底上形成等离子体聚合膜。 此外，等离子体聚合膜的性质也变得非常优异。
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9.发明授权Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant 失效具有特定等离子体聚合氢的碳膜和润滑剂的磁记录介质
公开(公告)号：US5677051A
公开(公告)日：1997-10-14
申请号：US651902
申请日：1996-05-21
CPC分类号： G11B5/8408 , G11B5/72 , Y10S427/106 , Y10S428/90 , Y10T428/265 , Y10T428/30 , Y10T428/31544 , Y10T428/31678
摘要： A magnetic recording medium possessing excellent electromagnetic characteristics, corrosion resistance, durability, abrasion resistance and lubricity, has an undercoat layer, a ferromagnetic metal layer, a protective layer and a lubricating layer formed in this order on a non-magnetic substrate, or has an undercoat layer, a ferromagnetic metal layer, an intercepting layer, a protective layer and a lubricating layer formed in this order on a non-magnetic substrate, wherein the protective layer is a plasma-polymerized hydrogen-containing carbon film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, the film thickness of the protective layer or the total film thickness of the protective layer and the intercepting layer is 30 to 150 .ANG., the undercoat layer, as well as the intercepting layer, is a film formed of silicon oxide represented by SiOx (x=1.8-1.95), and the lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; and a method for producing the recording medium.
摘要翻译： 具有优异的电磁特性，耐腐蚀性，耐久性，耐磨性和润滑性的磁记录介质具有在非磁性基板上依次形成的底涂层，强磁性金属层，保护层和润滑层，或具有 底涂层，强磁性金属层，截留层，保护层和润滑层，其依次形成在非磁性基板上，其中保护层是折射率为1.90的等离子体聚合的含氢碳膜 以上，接触角小于80度，保护层的膜厚或保护层和截留层的总膜厚为30〜150安培，底涂层以及截留层为 由SiOx（x = 1.8-1.95）表示的由氧化硅形成的膜，并且润滑层由选自p 全氟聚醚，非极性全氟聚醚，全氟羧酸，磷腈，全氟烷基化物和全氟丙烯酸酯化合物; 以及记录介质的制造方法。
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公开(公告)号：US4988573A
公开(公告)日：1991-01-29
申请号：US379344
申请日：1989-07-13
IPC分类号： C23C16/30 , G11B23/087
CPC分类号： G11B23/08785 , C23C16/30 , G11B23/08757 , Y10T428/3154 , Y10T428/31544 , Y10T428/31663 , Y10T428/31699
摘要： A plasma-polymerized film covers a surface of a medium related member which constructs or is disposed in a casing in which a tape or disk-shaped recording medium is receiving for travel or rotating motion. The film contains C, F and at least one element of Si, B, P and N. The total content of F and at least one element of Si, B, P, and N ranges from 5 to 40 atom % of the film, and the atomic ratio of (Si+B+P+N)/F ranges from 2/10 to 5/1.
摘要翻译： 等离子体聚合膜覆盖介质相关部件的表面，其构造或设置在其中带或盘状记录介质被接收用于行进或旋转运动的壳体中。 该膜含有C，F和Si，B，P和N中的至少一种元素.F和Si，B，P和N中的至少一种元素的总含量为5至40原子％ （Si + B + P + N）/ F的原子比为2/10〜5/1。
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