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1.发明授权Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process 有权含氟环状结构的硅化合物和有机硅树脂，使用其的抗蚀剂组合物和图案化工艺公开(公告)号：US07638256B2
公开(公告)日：2009-12-29
申请号：US11480944
申请日：2006-07-06
CPC分类号： C08G77/24 , C07D307/20 , C07D319/06 , G03F7/0045 , G03F7/0046 , G03F7/0757 , Y10S430/106 , Y10S430/108
摘要： Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus suited for use in resist compositions for the bilayer process.
摘要翻译： 提供具有氟化半缩醛结构的硅化合物。 具有相同结构的硅氧烷树脂具有适当的酸度，以通过使图案由于膨胀膨胀而最小化形成更细的图案，显示出改进的抗转移到有机膜图案中的蚀刻性，因此适用于抗蚀剂组合物 用于双层工艺。
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2.发明申请Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process 有权含氟环状结构的硅化合物和有机硅树脂，使用其的抗蚀剂组合物和图案化工艺公开(公告)号：US20070009832A1
公开(公告)日：2007-01-11
申请号：US11480944
申请日：2006-07-06
IPC分类号： G03C1/00
CPC分类号： C08G77/24 , C07D307/20 , C07D319/06 , G03F7/0045 , G03F7/0046 , G03F7/0757 , Y10S430/106 , Y10S430/108
摘要： Silicon compounds having fluorinated hemiacetal structure are provided. Silicone resins having the same structure have an appropriate acidity to enable formation of a finer pattern by minimizing the pattern collapse by swelling, exhibit improved resistance to the etching used in the pattern transfer to an organic film, and are thus suited for use in resist compositions for the bilayer process.
摘要翻译： 提供具有氟化半缩醛结构的硅化合物。 具有相同结构的硅氧烷树脂具有适当的酸度，以通过使图案由于膨胀膨胀而最小化形成更细的图案，显示出改进的抗转移到有机膜图案中的蚀刻性，因此适用于抗蚀剂组合物 用于双层工艺。
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3.发明授权Ester compounds having alicyclic and oxirane structures and method for preparing the same 有权具有脂环和环氧乙烷结构的酯化合物及其制备方法公开(公告)号：US06500971B2
公开(公告)日：2002-12-31
申请号：US09873193
申请日：2001-06-05
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07D30316
CPC分类号： C08G65/22 , C07D303/48 , G03F7/0395
摘要： An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译： 提供式（1）的酯化合物.R1是H或甲基，R2是叔C4-20烷基，k = 0或1.包含作为基础树脂的抗蚀剂组合物由酯化合物产生的聚合物敏感 高能量辐射，具有优异的灵敏度，分辨率，耐蚀刻性和基板粘合性，适用于使用电子束或深紫外线的微图案。
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公开(公告)号：US06492090B2
公开(公告)日：2002-12-10
申请号：US09842113
申请日：2001-04-26
申请人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
发明人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , C08F2220/1866 , C08F232/04 , C08F234/04 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译： 提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基， 与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。
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公开(公告)号：US06448420B1
公开(公告)日：2002-09-10
申请号：US09572975
申请日：2000-05-18
申请人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： C07J900
CPC分类号： C07C69/753 , C07C69/013 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.
摘要翻译： 使用具有外型2-烷基双环[2.2.1]庚-2-基酯作为酸可分解部位的新型酯化合物作为溶解调节剂，以配制具有高灵敏度，分辨率，耐蚀刻性和 储存稳定性。
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公开(公告)号：US06312867B1
公开(公告)日：2001-11-06
申请号：US09431139
申请日：1999-11-01
申请人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/56 , C07C69/013 , C07C69/533 , C07C69/54 , C07C69/593 , C07C69/60 , C07C2602/42 , C07C2603/68 , C07C2603/86 , C08F20/18 , G03F7/0045 , G03F7/039 , Y02P20/55
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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7.发明授权公开(公告)号：US06596463B2
公开(公告)日：2003-07-22
申请号：US09837219
申请日：2001-04-19
申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07C6974
CPC分类号： C08F220/18 , C07C69/013 , C07C69/54 , C07C69/753 , C08F222/06 , C08F232/08 , G03F7/0045 , G03F7/039
摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, k is 0 or 1, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom and which may contain a hetero atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译： 提供下式（1）的酯化合物：R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是C1-C15烷基，k是0或1，Z是二价C 2 -C 20烃 与碳原子形成单环或桥环的基团，其可以含有杂原子，m为0或1，n为0,1,2或3,2m + n = 2或3.一种抗蚀剂组合物，其包含 作为基础树脂，由酯化合物产生的聚合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于使用电子束或深UV的微图案。
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8.发明授权公开(公告)号：US06586157B2
公开(公告)日：2003-07-01
申请号：US09837378
申请日：2001-04-19
申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： C08F220/18 , C07C69/013 , C07C69/54 , C07C69/753 , C08F222/06 , C08F232/08 , G03F7/0045 , G03F7/039
摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译： 提供下式（1）的酯化合物：R 1是H，甲基或CH 2 CO 2 R 3，R 2是H，甲基或CO 2 R 3，R 3是C 1 -C 15烷基，Z是形成单环的二价C 2 -C 20烃基 或与碳原子的桥环，m为0或1，n为0,1,2或3，2m + n = 2或3.含有由酯化合物得到的聚合物作为基础树脂的抗蚀剂组合物是敏感的 对高能辐射，具有优异的灵敏度和分辨率，适用于使用电子束或深紫外线的微图案。
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公开(公告)号：US06413695B1
公开(公告)日：2002-07-02
申请号：US09572973
申请日：2000-05-18
申请人： Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/753 , C07C69/013 , C07C69/608 , C07C69/732 , C07C69/76 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A resist composition comprising an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester compound as a dissolution regulator has a high sensitivity, resolution, etching resistance and storage stability and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译： 包含作为溶解调节剂的外型2-烷基双环[2.2.1]庚-2-基酯化合物的抗蚀剂组合物具有高灵敏度，分辨率，耐蚀刻性和储存稳定性，并且适用于电子束或深层的微图案， 紫外线。
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10.发明授权公开(公告)号：US06403822B2
公开(公告)日：2002-06-11
申请号：US09842005
申请日：2001-04-26
申请人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Tsunehiro Nishi , Jun Hatakeyama
发明人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： C07C6974
CPC分类号： G03F7/0397 , C07C69/732 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/68 , C07C2603/74 , C07C2603/86 , G03F7/0395
摘要： Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.
摘要翻译： 式（1）的酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1为H或C1-6烷基，R2为酸不稳定基团，k为0或1，和 m为0〜5的整数。
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