Vacuum bearing structure and a method of supporting a movable member
    1.
    发明授权
    Vacuum bearing structure and a method of supporting a movable member 失效
    真空轴承结构和支撑活动件的方法

    公开(公告)号:US06515288B1

    公开(公告)日:2003-02-04

    申请号:US09527029

    申请日:2000-03-16

    IPC分类号: G01F2300

    摘要: A vacuum bearing structure comprises a combination of a planar gas bearing with a differentially-pumped vacuum seal. The bearing surface and the vacuum seal surfaces are formed of a porous material divided into a first outer region through which bearing gas can percolate to provide support and an inner second region providing the vacuum seal. An exhaust groove separates the two regions so that bearing gas can flow to atmosphere. The resulting structure can operate at a lower fly height to reduce loading on the differentially-pumped vacuum seal. The structure is particularly useful for motion feedthroughs into vacuum processes such as ion implantation.

    摘要翻译: 真空承载结构包括平面气体轴承与差动抽真空密封件的组合。 轴承表面和真空密封表面由被分成第一外部区域的多孔材料形成,轴承气体可以通过该第一外部区域渗透以提供支撑,以及提供真空密封的内部第二区域。 排气槽分离两个区域,使得轴承气体可以流到大气中。 所得到的结构可以在较低的飞行高度下操作以减少差动泵真空密封件上的负载。 该结构对于诸如离子注入的真空过程中的运动馈通特别有用。

    Method of scanning a substrate in an ion implanter
    2.
    发明申请
    Method of scanning a substrate in an ion implanter 有权
    在离子注入机中扫描基板的方法

    公开(公告)号:US20080169434A1

    公开(公告)日:2008-07-17

    申请号:US11652645

    申请日:2007-01-12

    IPC分类号: G21K5/10

    摘要: This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between the substrate and the ion beam such that the ion beam passes over all of the substrate and rotating the substrate substantially about its centre while causing the relative motion. Rotating the substrate while causing the relative motion between the substrate and the ion beam has several advantages including avoiding problematic angular effects, increasing uniformity, increasing throughput and allowing a greater range of ion beam profiles to be tolerated.

    摘要翻译: 本发明涉及一种通过离子注入机中的离子束扫描基底以提供基底的均匀计量的方法。 该方法包括引起衬底和离子束之间的相对运动,使得离子束通过所有衬底并且基本上围绕其中心旋转衬底,同时引起相对运动。 旋转衬底同时导致衬底和离子束之间的相对运动具有几个优点,包括避免有问题的角度影响,增加均匀性,增加生产量并允许允许更大范围的离子束分布。

    Ion extraction assembly
    3.
    发明授权
    Ion extraction assembly 有权
    离子提取组件

    公开(公告)号:US06501078B1

    公开(公告)日:2002-12-31

    申请号:US09527031

    申请日:2000-03-16

    IPC分类号: H01J3715

    摘要: An ion electrode extraction assembly comprising an ion source 20 and at least one electrode 50 having a gap through which a beam of extracted ions passes in use. An electrode manipulator assembly 55 is provided to move the electrode so as to vary the width of the gap transversely to the ion beam, move the electrode transversely to the ion beam, and move the electrode in the direction of the ion beam. The three degrees of movement being carried out independently of one another.

    摘要翻译: 一种离子电极提取组件,其包括离子源20和至少一个具有间隙的电极50,所提取的离子束在使用中通过该间隙通过。 提供电极操纵器组件55以移动电极,以便横向于离子束改变间隙的宽度,将电极横向于离子束移动,并且沿着离子束的方向移动电极。 三个运动方式彼此独立地进行。

    Apparatus for reducing distortion in fluid bearing surfaces
    4.
    发明授权
    Apparatus for reducing distortion in fluid bearing surfaces 有权
    减少流体轴承表面变形的装置

    公开(公告)号:US06271530B1

    公开(公告)日:2001-08-07

    申请号:US09293954

    申请日:1999-04-19

    IPC分类号: H01J3720

    摘要: A fluid bearing and seal for an ion implanter is disclosed. The fluid bearing has a stator attached to a base and a moving member provided over the stator so that a fluid bearing can be formed between the opposing surfaces of the stator and the moving member. Either the base or the stator has a locating member extending normal to the bearing surface and the other one of either the base or the stator has a recess shaped to receive the locating member. A fluid seal enables the member to slide in the recess in the normal direction to seal off an enclosed volume between the member and the other one of either the stator or the base. A plurality of fixtures are distributed at points in a plane parallel to the bearing surface to fix the locating member and the other one of either the stator or the base together at these points to form the enclosed volume. The number of the fixtures is the minimum necessary so that the bearing surface of the stator remains undistorted. A fluid controller controls the supply of a fluid to the enclosed volume to maintain the planar bearing surface undistorted under the loading of the moving member.

    摘要翻译: 公开了用于离子注入机的流体轴承和密封件。 流体轴承具有附接到基座的定子和设置在定子上方的移动构件,使得可以在定子和移动构件的相对表面之间形成流体轴承。 基座或定子都具有垂直于支承表面延伸的定位构件,底座或定子中的另一个具有成形为容纳定位构件的凹部。 流体密封使得构件能够在凹部中在正常方向上滑动以密封构件和定子或基座中的另一个之间的封闭容积。 多个夹具分布在平行于支承表面的平面上的点处,以将定位构件和定子或底座中的另一个固定在这些点上以形成封闭的容积。 固定装置的数量是必需的最小值,使定子的支承面保持不变。 流体控制器控制向封闭容积供应流体,以在移动构件的载荷下使平面支承表面保持不变。

    Method of scanning a substrate in an ion implanter
    5.
    发明授权
    Method of scanning a substrate in an ion implanter 有权
    在离子注入机中扫描基板的方法

    公开(公告)号:US07582883B2

    公开(公告)日:2009-09-01

    申请号:US11652645

    申请日:2007-01-12

    IPC分类号: G21K5/10

    摘要: This invention relates to a method of scanning a substrate through an ion beam in an ion implanter to provide uniform dosing of the substrate. The method comprises causing relative motion between the substrate and the ion beam such that the ion beam passes over all of the substrate and rotating the substrate substantially about its centre while causing the relative motion. Rotating the substrate while causing the relative motion between the substrate and the ion beam has several advantages including avoiding problematic angular effects, increasing uniformity, increasing throughput and allowing a greater range of ion beam profiles to be tolerated.

    摘要翻译: 本发明涉及一种通过离子注入机中的离子束扫描基底以提供基底的均匀计量的方法。 该方法包括引起衬底和离子束之间的相对运动,使得离子束通过所有衬底并且基本上围绕其中心旋转衬底,同时引起相对运动。 旋转衬底同时导致衬底和离子束之间的相对运动具有几个优点,包括避免有问题的角度影响,增加均匀性,增加生产量并允许允许更大范围的离子束分布。

    Fluid bearing vacuum seal assembly
    6.
    发明授权
    Fluid bearing vacuum seal assembly 有权
    流体轴承真空密封组件

    公开(公告)号:US06274875B1

    公开(公告)日:2001-08-14

    申请号:US09293941

    申请日:1999-04-19

    IPC分类号: H01J3720

    摘要: A fluid bearing vacuum seal assembly comprises an annular stator with first and second opposed surfaces, at least part of the first surface defining a first bearing surface. The stator also defines an aperture having a wall extending between the first and second surfaces. The assembly also comprises a rotor with first and second opposed surfaces, the second surface defining in part a second bearing surface which is supported relative to the first bearing surface in use so that the rotor is rotatable relative to the stator. A cylindrical wall projects axially from the second surface of the rotor through the aperture in the stator. An annular flange projects radially outwardly from the cylindrical wall adjacent to the second surface of the stator. At least one annular differential pumping channel is defined in each of the first and second surfaces of the stator and the wall which connects the first and second surfaces. This configuration allows the differential pumping channels to be spaced apart to a greater extent, improving the performance of the vacuum seal and allowing a better vacuum to be achieved.

    摘要翻译: 流体轴承真空密封组件包括具有第一和第二相对表面的环形定子,所述第一表面的至少一部分限定第一支承表面。 定子还限定了具有在第一和第二表面之间延伸的壁的孔。 组件还包括具有第一和第二相对表面的转子,第二表面部分地限定第二支承表面,该第二支承表面在使用中相对于第一支承表面支撑,使得转子可相对于定子旋转。 圆柱形壁从转子的第二表面通过定子中的孔轴向突出。 环形凸缘从与定子的第二表面相邻的圆柱形壁径向向外突出。 至少一个环形差动泵送通道限定在定子和连接第一和第二表面的壁的第一和第二表面中的每一个中。 这种构造允许差分泵送通道在更大程度上间隔开,从而改善了真空密封件的性能并且实现了更好的真空。

    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
    7.
    发明授权
    Multi-directional scanning of movable member and ion beam monitoring arrangement therefor 有权
    可移动构件的多方向扫描和离子束监测装置

    公开(公告)号:US06956223B2

    公开(公告)日:2005-10-18

    申请号:US10119290

    申请日:2002-04-10

    摘要: Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

    摘要翻译: 公开了半导体处理装置,其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向(所谓的X-Y扫描)上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A,90B往复运动。臂60相对于滑块100被支撑,使用支撑的空气轴承,以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件,但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60,以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处,以允许在植入之前执行光束轮廓,其中衬底支撑件反向或水平并且离开光束线。

    Movable ion source assembly
    8.
    发明授权
    Movable ion source assembly 失效
    可移动离子源组件

    公开(公告)号:US06331713B1

    公开(公告)日:2001-12-18

    申请号:US09413035

    申请日:1999-10-06

    IPC分类号: G21F502

    摘要: An ion source assembly 10 is disclosed, the assembly comprising a source sub assembly having an ion source 20, an extraction electrode 40 and an electrically insulating high voltage bushing 60 to support the extraction electrode 40 relative to the ion source 20. The ion source assembly further includes a chamber 70 having an exit aperture to allow egress of ions to an ion implanter. The chamber 70 encloses one or more further electrodes 80,90. The source sub assembly is mounted to the chamber 70 via a hinge 150. This allows ready access to the inner walls of the chamber 70, which in turn allows easier maintenance and cleaning of the further electrodes 80,90 as well as the inner walls of the chamber 70. Preferably, a liner 160 is employed on the inner walls of the chamber 70.

    摘要翻译: 公开了一种离子源组件10,该组件包括源子组件,其具有离子源20,提取电极40和电绝缘高压衬套60,以相对于离子源20支撑引出电极40.离子源组件 还包括具有出口孔的室70,以允许离子离开离子注入机。 腔室70包围一个或多个另外的电极80,90。 源子组件通过铰链150安装到腔室70.这允许容易地进入腔室70的内壁,这反过来允许更多的维护和清洁另外的电极80,90以及内壁 腔室70优选地,在腔室70的内壁上使用衬套160。

    Method and apparatus for controlling a workpiece in a vacuum chamber

    公开(公告)号:US5898179A

    公开(公告)日:1999-04-27

    申请号:US926650

    申请日:1997-09-10

    摘要: An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differentially pumped vacuum seals and integral air bearing support allow for multiple independent motions to be transmitted to the workpiece supported by the workpiece holder. The workpiece holder motions provided are (1) rotation about the X axis, (2) translation back and forth along the Y direction of an X-Y plane on the surface of the workpiece holder, and (3) rotation of the workpiece in the X-Y plane about its Z axis. Concentric seals, oval for the translation motion and circular for the rotational motion, are differentially pumped through common ports to provide successively decreasing pressure and gas flow in order to reduce the gas load into the vacuum vessel to a negligible rate.

    Apparatus and method for reducing heating of a workpiece in ion implantation
    10.
    发明授权
    Apparatus and method for reducing heating of a workpiece in ion implantation 有权
    用于减少离子注入中工件加热的装置和方法

    公开(公告)号:US06268609B1

    公开(公告)日:2001-07-31

    申请号:US09293938

    申请日:1999-04-19

    IPC分类号: H01J37317

    CPC分类号: H01J37/3171

    摘要: An apparatus and method for reducing heating of a workpiece during ion implantation. The method comprises generating an ion beam for implantation of ions into a workpiece is, the workpiece having a surface defining a plane; scanning the ion beam relative to the surface of the workpiece in a first direction in the plane; repeatedly reciprocating the workpiece in a second direction transverse to the first direction to traverse to and from through the scanned ion beam; and rotating the workpiece 180 degrees about a central axis of the workpiece between each successive traverse of the wafer through the scanned ion beam, so that the wafer always presents the same leading edge to the beam on each traverse.

    摘要翻译: 一种用于在离子注入期间减少工件加热的装置和方法。 所述方法包括产生用于将离子注入工件的离子束,所述工件具有限定平面的表面; 在所述平面中沿着第一方向相对于所述工件的表面扫描所述离子束; 在横向于第一方向的第二方向上重复地使工件往复运动,以横穿扫描的离子束; 并且通过扫描的离子束在晶片的每个连续横越之间使工件围绕工件的中心轴线旋转180度,使得晶片在每个横越上总是呈现与波束相同的前缘。