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    Method and apparatus for dynamically monitoring controller tuning parameters
    4.
    发明授权
    Method and apparatus for dynamically monitoring controller tuning parameters 有权
    动态监控控制器调谐参数的方法和装置

    公开(公告)号：US06961636B1

    公开(公告)日：2005-11-01

    申请号：US10126172

    申请日：2002-04-19

    申请人： Robert J. Chong ,  Alexander J. Pasadyn ,  Thomas J. Sonderman

    发明人： Robert J. Chong ,  Alexander J. Pasadyn ,  Thomas J. Sonderman

    IPC分类号： G05B13/02 ,  G05B19/418 ,  G06F19/00

    CPC分类号： G05B19/41875 ,  G05B13/025 ,  G05B2219/32187 ,  Y02P90/20 ,  Y02P90/22

    摘要： A method includes processing a plurality of workpieces in accordance with an operating recipe. Metrology data associated with the processing is collected. A control model including at least one tuning parameter having a default value is provided. A plurality of perturbations is introduced to shift the tuning parameter from its default value. Control actions are generated based on the metrology data and the perturbations to the tuning parameter in the control model to modify the operating recipe. An error signal associated with each of the perturbations is generated. The default value of the tuning parameter is modified based on the error signals.

    摘要翻译： 一种方法包括根据操作配方处理多个工件。 收集与处理相关的计量数据。 提供了包括具有默认值的至少一个调谐参数的控制模型。 引入多个扰动以从其默认值移位调谐参数。 基于测量数据和控制模型中的调谐参数的扰动来生成控制动作，以修改操作配方。 产生与每个扰动相关联的误差信号。 调整参数的默认值根据错误信号进行修改。

    Identifying a cause of a fault based on a process controller output
    5.
    发明授权
    Identifying a cause of a fault based on a process controller output 失效
    根据过程控制器输出识别出故障的原因

    公开(公告)号：US06778873B1

    公开(公告)日：2004-08-17

    申请号：US10210640

    申请日：2002-07-31

    申请人： Jin Wang ,  Elfido Coss, Jr. ,  Brian K. Cusson ,  Alexander J. Pasadyn ,  Michael L. Miller ,  Naomi M. Jenkins ,  Christopher A. Bode

    发明人： Jin Wang ,  Elfido Coss, Jr. ,  Brian K. Cusson ,  Alexander J. Pasadyn ,  Michael L. Miller ,  Naomi M. Jenkins ,  Christopher A. Bode

    IPC分类号： G06F1900

    CPC分类号： G05B19/4184 ,  G05B23/0281 ,  G05B2219/31357 ,  G05B2219/31363 ,  G05B2219/32201 ,  Y02P90/14 ,  Y02P90/22

    摘要： A method and apparatus is provided for identifying a cause of a fault based on controller output. The method comprises processing at least one workpiece under a direction of the controller and detecting a fault associated with the processing of the at least one workpiece. The method further includes determining a plurality of possible causes of the detected fault, identifying a more likely possible cause out of the plurality of possible causes, providing fault information associated with the identified more likely possible cause to the controller. The method further includes providing fault information associated with the identified more likely possible cause to the controller. The method further comprises adjusting the processing of one or more workpieces to be processed next based on the fault information provided to the controller. The method further includes generating prediction data associated with processing of the next workpieces, and comparing the prediction data to processing data associated with the processing of the next workpieces to identify a possible cause of the fault.

    摘要翻译： 提供了一种基于控制器输出来识别故障原因的方法和装置。 该方法包括在控制器的方向上处理至少一个工件，并检测与至少一个工件的处理相关的故障。 该方法还包括确定检测到的故障的多个可能的原因，从多个可能的原因中识别更可能的可能原因，将与所识别的更可能的可能原因相关联的故障信息提供给控制器。 该方法还包括向控制器提供与所识别的更可能的可能原因相关联的故障信息。 该方法还包括基于提供给控制器的故障信息来调整接下来要处理的一个或多个待处理工件的处理。 该方法还包括生成与下一个工件的处理相关联的预测数据，以及将预测数据与与下一个工件的处理相关联的处理数据进行比较，以识别故障的可能原因。

    Method and apparatus for utilizing integrated metrology data as feed-forward data
    7.
    发明授权
    Method and apparatus for utilizing integrated metrology data as feed-forward data 有权
    利用综合计量数据作为前馈数据的方法和装置

    公开(公告)号：US06708075B2

    公开(公告)日：2004-03-16

    申请号：US09992447

    申请日：2001-11-16

    申请人： Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Christopher A. Bode

    发明人： Thomas J. Sonderman ,  Alexander J. Pasadyn ,  Christopher A. Bode

    IPC分类号： G06F1900

    CPC分类号： H01L22/20 ,  H01L22/12 ,  H01L22/26

    摘要： A method and an apparatus for performing feed-forward correction during semiconductor wafer manufacturing. A first process on a semiconductor wafer is performed. Integrated metrology data related to the first process of the semiconductor wafer is acquired. An integrated metrology feed-forward process is performed based upon the integrated metrology data, the integrated metrology feed-forward process comprising identifying at least one error on the semiconductor wafer based upon the integrated metrology data related to the first process of the semiconductor wafer and performing an adjustment process to a second process to be performed on the wafer to compensate for the error. The second process on the semiconductor wafer is performed based upon the adjustment process.

    摘要翻译： 一种用于在半导体晶片制造期间执行前馈校正的方法和装置。 执行半导体晶片上的第一工序。 获得与半导体晶片的第一工艺有关的集成度量数据。 基于综合度量学数据进行综合计量学前馈过程，所述综合度量学前馈过程包括基于与半导体晶片的第一工艺相关的集成测量数据识别半导体晶片上的至少一个误差并执行 对在晶片上执行的补偿误差的第二处理的调整处理。 基于调整处理进行半导体晶片上的第二工序。

    Method for prioritizing production lots based on grade estimates and output requirements
    8.
    发明授权
    Method for prioritizing production lots based on grade estimates and output requirements 有权
    根据年龄估计和产出要求确定生产批次的方法

    公开(公告)号：US06699727B1

    公开(公告)日：2004-03-02

    申请号：US09821675

    申请日：2001-03-29

    申请人： Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Christopher A. Bode ,  Alexander J. Pasadyn ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    发明人： Anthony J. Toprac ,  Joyce S. Oey Hewett ,  Christopher A. Bode ,  Alexander J. Pasadyn ,  Anastasia Oshelski Peterson ,  Thomas J. Sonderman ,  Michael L. Miller

    IPC分类号： G01R3126

    CPC分类号： H01L22/20 ,  G05B19/418 ,  G05B2219/32194 ,  G05B2219/32263 ,  Y02P90/02 ,  Y02P90/18 ,  Y02P90/20 ,  Y02P90/22

    摘要： A method for prioritizing production flow includes processing a plurality of manufactured items in a process flow; measuring characteristics of a plurality of manufactured items in the process flow; estimating performance grades for the plurality of manufactured items based on the measured characteristics; grouping the manufactured items with like estimated performance grades; assigning priorities to groups of manufactured items with like estimated performance grades; and directing the plurality of manufactured items through the process flow based on the assigned priorities. A manufacturing system includes a plurality of processing tools adapted to process a plurality of manufactured items in a process flow, a metrology tool, and a process control server. The metrology tool is adapted to measure characteristics of a plurality of manufactured items in the process flow. The process control server is adapted to estimate performance grades for the plurality of manufactured items based on the measured characteristics, group the manufactured items with like estimated performance grades, assign priorities to groups of manufactured items with like estimated performance grades, and direct the plurality of manufactured items through the process flow based on the assigned priorities.

    摘要翻译： 一种用于确定生产流程优先级的方法包括在处理流程中处理多个制造的物品; 测量处理流程中的多个制成品的特性; 基于所测量的特性来估计所述多个制造物品的性能等级; 对具有相似估计性能等级的制成品进行分组; 将优先事项分配给具有类似估计绩效等级的制成品组; 以及基于所分配的优先级，通过所述处理流程来引导所述多个制造的物品。 制造系统包括多个处理工具，其适用于处理流程中的多个制造物品，计量工具和过程控制服务器。 计量工具适于测量处理流程中的多个制造物品的特性。 过程控制服务器适于基于测量的特性来估计多个制造物品的性能等级，将具有相似估计性能等级的制造物品分组，将具有相似估计性能等级的制造商品组的优先级分配给多个 基于分配的优先级，通过流程流程制造出的物品。

    Process control using analysis of an upstream process
    10.
    发明授权
    Process control using analysis of an upstream process 有权
    使用上游流程分析的流程控制

    公开(公告)号：US08615314B1

    公开(公告)日：2013-12-24

    申请号：US10932989

    申请日：2004-09-02

    申请人： Thomas J. Sonderman ,  Christopher A. Bode ,  Alexander J. Pasadyn

    发明人： Thomas J. Sonderman ,  Christopher A. Bode ,  Alexander J. Pasadyn

    IPC分类号： G05B13/02

    CPC分类号： G05B19/41875 ,  G05B2219/32182 ,  G05B2219/45031 ,  Y02P90/22

    摘要： A method, apparatus and a system, for performing a process control using analysis of an upstream process is provided. The method comprises performing a first process on a workpiece and performing a qualitative analysis upon the workpiece relating to the first process, the qualitative analysis comprises analyzing at least one metrology measurement relating to the first process and a workpiece feature to evaluate a characteristic of the workpiece. The method further comprises selecting a process control parameter for performing a second process upon the workpiece based upon the qualitative analysis.

    摘要翻译： 提供了一种使用上游处理的分析进行处理控制的方法，装置和系统。 该方法包括对工件执行第一过程并对与第一过程相关的工件执行定性分析，定性分析包括分析与第一过程有关的至少一个度量测量和工件特征以评估工件的特性 。 该方法还包括基于定性分析来选择用于对工件执行第二处理的过程控制参数。