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公开(公告)号：US20070139629A1
公开(公告)日：2007-06-21
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Sengers , Nicolaas Johannes Van Asten , Wilhelmus Box , Tjarko Van Empel , Leon Levasier , Erik Loopstra , Marcel Hubertus Muitjens , Luberthus Ouwehand , Leon Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/42
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。
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公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。
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公开(公告)号：US20060087631A1
公开(公告)日：2006-04-27
申请号：US10972292
申请日：2004-10-25
申请人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Hertog , David Van Der Plas
发明人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Hertog , David Van Der Plas
IPC分类号： G03B27/42
CPC分类号： G03F7/70933
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.
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公开(公告)号：US07148951B2
公开(公告)日：2006-12-12
申请号：US10972292
申请日：2004-10-25
申请人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
发明人： Nicolas Lallemant , Marcel Beckers , Stephan Koelink , Rob Jansen , Wladimir Fransiscus Gerardus Maria Hertog , David Theodorus Willy Van Der Plas
CPC分类号： G03F7/70933
摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.
摘要翻译： 光刻设备包括用于提供辐射束的辐射系统和用于支撑图案形成装置的第一支撑件。 图案形成装置用于对辐射束进行图案化。 该装置包括用于支撑基板的第二支撑件，用于将图案化的光束投影到基板的目标部分上的投影系统，以及干涉计测量系统，用于提供沿着轴延伸的细长体积的气体延伸的干涉测量光束 投影系统。 该装置还包括用于在体积中提供经调节的气流的气体调节结构。 气体调节结构包括设置在结构的出口处的多个气体导向叶片，用于将气体流引导到体积。 气体导向叶片被连续地成形并且定向为远离体积的轴线发散。
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公开(公告)号：US20060066826A1
公开(公告)日：2006-03-30
申请号：US10948749
申请日：2004-09-24
申请人： Carlo Maria Luijten , Sjoerd Lambertus Donders , Nicolaas Kemper , Martinus Antonius Leenders , Erik Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Maria Luijten , Sjoerd Lambertus Donders , Nicolaas Kemper , Martinus Antonius Leenders , Erik Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
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公开(公告)号：US07808614B2
公开(公告)日：2010-10-05
申请号：US12340362
申请日：2008-12-19
申请人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人： Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrickus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
摘要翻译： 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。
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公开(公告)号：US20080273182A1
公开(公告)日：2008-11-06
申请号：US12216669
申请日：2008-07-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译： 在阻挡构件上设置突起，所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统，以促进液体的弯液面粘附在突起和投影系统之间。
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公开(公告)号：US20080212051A1
公开(公告)日：2008-09-04
申请号：US12081168
申请日：2008-04-11
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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公开(公告)号：US07411658B2
公开(公告)日：2008-08-12
申请号：US11244390
申请日：2005-10-06
CPC分类号： G03F7/70341
摘要： A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
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公开(公告)号：US20070081140A1
公开(公告)日：2007-04-12
申请号：US11244390
申请日：2005-10-06
IPC分类号： G03B27/58
CPC分类号： G03F7/70341
摘要： A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
摘要翻译： 在阻挡构件上设置突起，所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统，以促进液体的弯液面粘附在突起和投影系统之间。
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