公开(公告)号：US20250112066A1

公开(公告)日：2025-04-03

申请号：US18899015

申请日：2024-09-27

Applicant: Tokyo Electron Limited

Inventor： Shinichi MIZUSHINO ,  Shunsuke INTO ,  Yuichiro KUNUGIMOTO ,  Akihiro TOYOZAWA ,  Daisuke ISHIMARU ,  Yuki MATSUTAKE ,  Shigeyuki IIDA ,  Takafumi HAYAMA

IPC: H01L21/67 ,  G02F1/29 ,  G03B13/34 ,  G03F7/16 ,  H01L21/66 ,  H04N23/56 ,  H04N23/60

Abstract: A liquid processing apparatus includes multiple stages on each of which a substrate is to be placed; multiple nozzles shared by the multiple stages, and each for supplying a processing liquid to the substrate; a camera shared by the multiple nozzles, and for monitoring states of the multiple nozzles; and an imaging condition changing program module for causing circuitry to change an imaging condition of the camera according to a monitoring condition.

公开(公告)号：US20230253219A1

公开(公告)日：2023-08-10

申请号：US18105993

申请日：2023-02-06

Applicant: Tokyo Electron Limited

Inventor： Yuichiro KUNUGIMOTO ,  Hideki KAJIWARA ,  Kazuhiro MATSUURA ,  Shinichi MIZUSHINO ,  Hokuto SHIGEMOTO ,  Akihiro TOYOZAWA ,  Yuji SAKAI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/68

CPC classification number: H01L21/6715 ,  H01L21/68764 ,  H01L21/681

Abstract: A substrate processing apparatus includes: a rotary holder configured to hold and rotate a substrate; a cup arranged so as to surround the substrate held by the rotary holder; a coating liquid nozzle configured to inject a coating liquid onto the substrate; a removal liquid nozzle configured to inject, onto the substrate, a removal liquid for removing a film from a peripheral portion of the substrate; a nozzle tracking camera attached to a nozzle arm that holds the coating liquid nozzle so as to track the coating liquid nozzle and configured to capture an image of the coating liquid nozzle; and a processing space camera configured to capture an image of a processing space above the rotary holder.