公开(公告)号：US20210080830A1

公开(公告)日：2021-03-18

申请号：US17016643

申请日：2020-09-10

Applicant: Tokyo Electron Limited

Inventor： Yuichiro KUNUGIMOTO ,  Takafumi HAYAMA ,  Hidehiro SUZUKI

IPC: G03F7/16

Abstract: There is provided a liquid processing apparatus comprising: a stage on which a substrate is placed; a nozzle configured to supply a processing liquid to the substrate placed on the stage and perform a processing on the substrate; a capturing part configured to capture an image of the nozzle so as to acquire image data; and a detector configured to detect a liquid level based on a plurality of the image data acquired by the capturing part at different timings within a period in which a supply of the processing liquid from the nozzle is not performed, wherein the liquid level is formed by the processing liquid or a liquid other than the processing liquid in a processing liquid flow path provided inside the nozzle.

公开(公告)号：US20220400232A1

公开(公告)日：2022-12-15

申请号：US17776800

申请日：2020-11-04

Applicant: Tokyo Electron Limited

Inventor： Yuichiro KUNUGIMOTO ,  Keishi HAMADA ,  Takafumi HAYAMA ,  Motoi OKADA ,  Shoki HAMAGUCHI

IPC: H04N7/18 ,  H04N5/232 ,  G06T7/00 ,  H04N5/91 ,  G03F7/16

Abstract: A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.

公开(公告)号：US20250112066A1

公开(公告)日：2025-04-03

申请号：US18899015

申请日：2024-09-27

Applicant: Tokyo Electron Limited

Inventor： Shinichi MIZUSHINO ,  Shunsuke INTO ,  Yuichiro KUNUGIMOTO ,  Akihiro TOYOZAWA ,  Daisuke ISHIMARU ,  Yuki MATSUTAKE ,  Shigeyuki IIDA ,  Takafumi HAYAMA

IPC: H01L21/67 ,  G02F1/29 ,  G03B13/34 ,  G03F7/16 ,  H01L21/66 ,  H04N23/56 ,  H04N23/60

Abstract: A liquid processing apparatus includes multiple stages on each of which a substrate is to be placed; multiple nozzles shared by the multiple stages, and each for supplying a processing liquid to the substrate; a camera shared by the multiple nozzles, and for monitoring states of the multiple nozzles; and an imaging condition changing program module for causing circuitry to change an imaging condition of the camera according to a monitoring condition.

公开(公告)号：US20240272554A1

公开(公告)日：2024-08-15

申请号：US18415499

申请日：2024-01-17

Applicant: Tokyo Electron Limited

Inventor： Yuichiro KUNUGIMOTO ,  Takafumi HAYAMA ,  Hidehiro SUZUKI

IPC: G03F7/16 ,  B05B15/50 ,  H01L21/67

CPC classification number: G03F7/162 ,  B05B15/50 ,  H01L21/6715 ,  H01L21/67253

Abstract: There is provided a liquid processing apparatus comprising: a stage on which a substrate is placed; a nozzle configured to supply a processing liquid to the substrate placed on the stage and perform a processing on the substrate; a capturing part configured to capture an image of the nozzle so as to acquire image data; and a detector configured to detect a liquid level based on a plurality of the image data acquired by the capturing part at different timings within a period in which a supply of the processing liquid from the nozzle is not performed, wherein the liquid level is formed by the processing liquid or a liquid other than the processing liquid in a processing liquid flow path provided inside the nozzle.

公开(公告)号：US20180239257A1

公开(公告)日：2018-08-23

申请号：US15897477

申请日：2018-02-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Toyohisa TSURUDA ,  Yuichiro KUNUGIMOTO ,  Takafumi HAYAMA ,  Keishi HAMADA

IPC: G03F7/20 ,  H01L21/67 ,  G06F17/30 ,  G03F7/30

CPC classification number: G03F7/705 ,  G03F7/3021 ,  G06F17/30979 ,  H01L21/67023 ,  H01L21/67051

Abstract: A method for evaluating a process recipe used in a liquid processing apparatus that performs a liquid processing by supplying a processing liquid from a nozzle to a substrate while rotating a holding part horizontally holding the substrate about a vertical axis, includes: storing the process recipe in a first storage part, which includes time-series data of a first combination of parameter values including a position of the nozzle and a rotation speed of the substrate; reading the process recipe from the first storage part; reading a pre-prepared risk data from a second storage part, which is determined by associating a second combination of parameter values with a risk information corresponding to a liquid splash risk; and displaying an assisting data for the first combination of parameter values in the process recipe, based on the process recipe and the pre-prepared risk data read from the first and second storage parts.