公开(公告)号：US20250112066A1

公开(公告)日：2025-04-03

申请号：US18899015

申请日：2024-09-27

Applicant: Tokyo Electron Limited

Inventor： Shinichi MIZUSHINO ,  Shunsuke INTO ,  Yuichiro KUNUGIMOTO ,  Akihiro TOYOZAWA ,  Daisuke ISHIMARU ,  Yuki MATSUTAKE ,  Shigeyuki IIDA ,  Takafumi HAYAMA

IPC: H01L21/67 ,  G02F1/29 ,  G03B13/34 ,  G03F7/16 ,  H01L21/66 ,  H04N23/56 ,  H04N23/60

Abstract: A liquid processing apparatus includes multiple stages on each of which a substrate is to be placed; multiple nozzles shared by the multiple stages, and each for supplying a processing liquid to the substrate; a camera shared by the multiple nozzles, and for monitoring states of the multiple nozzles; and an imaging condition changing program module for causing circuitry to change an imaging condition of the camera according to a monitoring condition.

公开(公告)号：US20230253219A1

公开(公告)日：2023-08-10

申请号：US18105993

申请日：2023-02-06

Applicant: Tokyo Electron Limited

Inventor： Yuichiro KUNUGIMOTO ,  Hideki KAJIWARA ,  Kazuhiro MATSUURA ,  Shinichi MIZUSHINO ,  Hokuto SHIGEMOTO ,  Akihiro TOYOZAWA ,  Yuji SAKAI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/68

CPC classification number: H01L21/6715 ,  H01L21/68764 ,  H01L21/681

Abstract: A substrate processing apparatus includes: a rotary holder configured to hold and rotate a substrate; a cup arranged so as to surround the substrate held by the rotary holder; a coating liquid nozzle configured to inject a coating liquid onto the substrate; a removal liquid nozzle configured to inject, onto the substrate, a removal liquid for removing a film from a peripheral portion of the substrate; a nozzle tracking camera attached to a nozzle arm that holds the coating liquid nozzle so as to track the coating liquid nozzle and configured to capture an image of the coating liquid nozzle; and a processing space camera configured to capture an image of a processing space above the rotary holder.

公开(公告)号：US20230347369A1

公开(公告)日：2023-11-02

申请号：US18218457

申请日：2023-07-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideki KAJIWARA ,  Yuya YONEMITSU ,  Shinichiro YAMANAKA ,  Shinichi MIZUSHINO ,  Naruaki IIDA ,  Kohei KAWAKAMI ,  Tohru AZUMA

IPC: B05B12/04 ,  B05B7/00

CPC classification number: B05B12/04 ,  B05B7/00

Abstract: An apparatus includes substrate holders each configured to hold a substrate, a first nozzle provided for each substrate holder and for discharging a first processing liquid to the substrate at a first position, a second nozzle provided to be shared by the substrate holders and for discharging a second processing liquid to the substrate at a second position, a third nozzle provided for each substrate holder and for discharging a third processing liquid to the substrate at a third position while the first and second processing liquids are not supplied to the substrate, first to third standby parts for respectively allowing the first to third nozzles to wait outside a substrate holding region, a turning mechanism for turning the first nozzle between the first standby part and the first position, and a linear motion mechanism for linearly moving the third nozzle between the third standby part and the third position.

公开(公告)号：US20160271640A1

公开(公告)日：2016-09-22

申请号：US15065435

申请日：2016-03-09

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hiroshi TOMITA ,  Shinichi MIZUSHINO

IPC: B05C11/02 ,  B05D1/02

CPC classification number: B05D1/02 ,  B05D1/005 ,  G03F7/162 ,  G03F7/168 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67253

Abstract: A method for adjusting a chemical liquid supply device of supplying a chemical liquid through a nozzle for removing a coating film on a peripheral portion of a substrate having the coating film formed on a surface thereof and horizontally held by a holding table is provided. The method includes discharging the chemical liquid from the nozzle, performing, by an image pickup part, continuous image pickup on a region including a leading end of the nozzle and a region in which the chemical liquid discharged from the leading end forms a liquid stream in the air, acquiring area change data representing a temporal change in area of the chemical liquid in an image pickup region based on an image pickup result obtained by the image pickup part, and adjusting a supply control device installed in a chemical liquid supply path connected to the nozzle based on the area change data.

Abstract translation: 本发明提供了一种调整药液供给装置的方法，所述化学液体供给装置通过用于除去由其表面上形成有所述涂膜并且由保持台水平保持的所述涂膜的基板的周边部分上的涂膜除去涂膜而形成的药液。 该方法包括从喷嘴排出化学液体，通过图像拾取部件对包括喷嘴的前端的区域进行连续的图像拾取，以及从前端排出的化学液体形成液体流的区域 空气，获取区域改变数据，其基于由图像拾取部分获得的图像拾取结果，表示图像拾取区域中的化学液体的面积的时间变化，并且调整安装在连接到图像拾取部分的药液供应路径中的供应控制装置 喷嘴基于面积变化数据。