公开(公告)号：US20250157801A1

公开(公告)日：2025-05-15

申请号：US18505810

申请日：2023-11-09

Applicant: Tokyo Electron Limited

Inventor： Francisco Machuca ,  Joel Ng ,  Mihail Mihaylov ,  Xinkang Tian

IPC: H01J37/32

Abstract: An optical emission spectroscopy (OES) detection device includes an optical collector configured to be optically coupled to a plasma in a plasma processing apparatus, an adjustable wavelength filter optically coupled to the optical collector, and a photodetector optically coupled to the adjustable wavelength filter. The optical collector receives an optical signal from the plasma. The adjustable wavelength filter is configured to automatically adjust a passband of the adjustable wavelength filter to include a selected wavelength in response to receiving a wavelength selection signal, and allow a filtered portion of the optical signal to pass through while excluding a remaining portion of the optical signal. The filtered portion includes the selected wavelength. The photodetector is configured to generate an OES measurement in response to detecting the filtered portion of the optical signal with a response time that is less than one millisecond.

公开(公告)号：US20240339309A1

公开(公告)日：2024-10-10

申请号：US18298259

申请日：2023-04-10

Applicant: Tokyo Electron Limited

Inventor： Sergey Voronin ,  Francisco Machuca ,  Blaze Messer ,  Yan Chen ,  Ying Zhu ,  Mihail Mihaylov ,  Joel Ng ,  Ashawaraya Shalini ,  Da Song ,  Akiteru Ko

IPC: H01J37/32 ,  H01J37/18

CPC classification number: H01J37/32972 ,  H01J37/18 ,  H01J37/32357 ,  H01J37/32963 ,  H01J2237/3343

Abstract: A processing system that includes: a processing chamber configured to hold a substrate to be processed; a first vacuum pump; a second vacuum pump disposed downstream from the first vacuum pump; an exhaust gas line connecting the process chamber and the first vacuum pump, and the first vacuum pump and the second vacuum pump; a plasma power supply including a first RF power source configured to generate a plasma from a portion of an exhaust gas between the first and second vacuum pumps; and an optical emission spectroscopy (OES) measurement assembly including an OES detector configured to measure OES signals from the plasma.

公开(公告)号：US20250060324A1

公开(公告)日：2025-02-20

申请号：US18620332

申请日：2024-03-28

Applicant: Tokyo Electron Limited

Inventor： Francisco Machuca ,  Vi Vuong ,  Andrej Mitrovic ,  Xinkang Tian ,  Holger Tuitje

IPC: G01N23/2206 ,  G01N21/95 ,  G01N23/201 ,  G01N23/223

Abstract: A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband optical beam within an optical field of view (FOV), illuminating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV, and concurrently acquiring X-ray metrology information, e.g., one or more X-ray images utilizing various modalities, such as absorption, phase contrast difference, darkfield, small angle X-ray scattering (SAXS) and/or fluorescence, from the X-ray FOV and a plurality of optical images of the optical FOV, each of the optical images corresponding to respective selected wavelengths of the broadband optical beam from each of ultraviolet, visible, and infrared wavelengths, for example including deep ultraviolet, near infrared, or short-wavelength infrared wavelengths. The DUT may be one or more substrates, e.g., stacked, and include electronic devices such as three-dimensional integrated devices.