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    Liquid treatment apparatus and liquid treatment method
    1.
    发明授权
    Liquid treatment apparatus and liquid treatment method 有权
    液体处理装置及液体处理方法

    公开(公告)号：US09245737B2

    公开(公告)日：2016-01-26

    申请号：US14234493

    申请日：2012-10-11

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Kazuhiro Aiura ,  Norihiro Itoh

    IPC: H01L21/461 ,  H01L21/02 ,  H01L21/67 ,  H01L21/306

    CPC classification number: H01L21/02076 ,  H01L21/30604 ,  H01L21/67051 ,  H01L21/67075 ,  H01L21/6708 ,  H01L21/6719

    Abstract: The liquid treatment apparatus according to the present invention includes a substrate holder configured to horizontally hold a substrate, and a top plate configured to be rotatable and to cover the substrate held by the substrate holder from above so as to define a treatment space. In the treatment space, a chemical liquid is supplied by a chemical liquid nozzle onto the substrate, and an atmosphere replacement gas is supplied by a replacement nozzle into the treatment space. The replacement nozzle is supported by a replacement nozzle support arm configured to be horizontally moved between an advanced position at which the replacement nozzle support arm is advanced into the treatment space and a retracted position at which the replacement nozzle support arm is retracted outside from the treatment space. The replacement nozzle is configured to discharge, above the substrate, the atmosphere replacement gas upward.

    Abstract translation: 根据本发明的液体处理装置包括：基板保持器，其被构造成水平地保持基板;以及顶板，其构造成可旋转并且从上方覆盖由基板保持器保持的基板，以限定处理空间。 在处理空间中，化学液体喷嘴将化学液体供给到基板上，通过置换喷嘴将气体置换气体供给到处理空间。 替换喷嘴由替换喷嘴支撑臂支撑，所述替换喷嘴支撑臂构造成在更换喷嘴支撑臂前进到处理空间的前进位置和替换喷嘴支撑臂从处理之外缩回的缩回位置之间水平移动 空间。 更换喷嘴被配置为在基板上方向上排放大气置换气体。

    Substrate processing apparatus and substrate processing method
    2.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US08865483B2

    公开(公告)日：2014-10-21

    申请号：US13956705

    申请日：2013-08-01

    Applicant: Tokyo Electron Limited

    Inventor： Kazuhiro Aiura ,  Norihiro Itoh ,  Yusuke Hashimoto ,  Takashi Nagai

    IPC: H01L21/66 ,  C09J1/00 ,  H01L21/67 ,  H01L21/687

    CPC classification number: H01L22/30 ,  H01L21/67259 ,  H01L21/68728 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: Provided is a substrate processing apparatus in which flexibility of disposing a device configured to determine a holding state of a substrate and the flexibility of timing of determining the holding state are enhanced. The substrate processing apparatus includes a light projector configured to radiate detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member and a light receiver configured to receive the detection light radiated from the light projector. A light path of the detection light from the light projector toward the light receiver passes a substrate surrounding member installed around the substrate held by the substrate holding member. The detection light penetrates the substrate surrounding member and has a wavelength which does not penetrate the substrate.

    Abstract translation: 提供了一种基板处理装置，其中设置配置成确定基板的保持状态的装置和确定保持状态的定时的灵活性的灵活性。 基板处理装置包括：投光器，被配置为当基板被基板保持部件保持时朝向可存在基板的区域发射检测光;以及光接收器，被配置为接收从投影仪辐射的检测光。 来自投光器的检测光的光路通过安装在由基板保持部件保持的基板周围的基板周围。 检测光穿透基板周围元件并具有不穿透基板的波长。

    Liquid processing apparatus and liquid processing method
    5.
    发明授权
    Liquid processing apparatus and liquid processing method 有权
    液体处理装置和液体处理方法

    公开(公告)号：US09105671B2

    公开(公告)日：2015-08-11

    申请号：US14241574

    申请日：2012-10-23

    Applicant: TOKYO ELECTRON LIMITED

    Inventor： Norihiro Itoh ,  Kazuhiro Aiura

    IPC: H01L21/67 ,  H01L21/02 ,  B08B3/04 ,  B05D1/02 ,  B05C9/06 ,  B05C11/10 ,  B05B3/18 ,  B05B15/12 ,  B61H5/00 ,  F16D66/02 ,  G01B11/30 ,  G01B21/20 ,  B60B17/00 ,  F16D65/12 ,  F16D65/02

    CPC classification number: H01L21/67051 ,  B05B3/18 ,  B05B15/80 ,  B05C9/06 ,  B05C11/1039 ,  B05C11/1044 ,  B05D1/02 ,  B08B3/04 ,  B60B17/00 ,  B60B17/0068 ,  B60B2900/325 ,  B61H5/00 ,  G01B11/306 ,  G01B21/20 ,  H01L21/02057 ,  H01L21/6715

    Abstract: A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end thereof above the substrate and to receive the first or second processing liquid that has been supplied to the substrate, a first tubular outer cup including an upper opening and disposed around the liquid receiving cup, vertically movable between a lifted position to which the first tubular outer cup is lifted so that its upper end is positioned above the liquid receiving cup, and a lowered position lower than the lifted position, and a second tubular outer cup disposed externally to the first tubular outer cup. The tubular outer cup is selected according to the kind of processing liquid.

    Abstract translation: 液体处理装置包括：基板保持部，其将基板保持在水平位置并旋转基板;第一和第二处理液体供给喷嘴，分别设置成将第一和第二处理液供给到基板;适当地设置的液体接收杯 将其上端定位在基板上方并且接收已经供应到基板的第一或第二处理液体，第一管状外杯，其包括上开口并设置在液体接收杯周围，可在提升位置 第一管状外杯被提升，使得其上端位于液体接收杯的上方，并且位于低于提升位置的降低位置，以及设置在第一管状外杯外侧的第二管状外杯。 管状外杯根据处理液的种类选择。

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