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1.发明申请公开(公告)号：US20050048402A1
公开(公告)日：2005-03-03
申请号：US10929443
申请日：2004-08-31
IPC分类号： G03F7/039 , G03C1/76 , G03F7/004 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , Y10S430/114
摘要： A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a pattern formation method using the positive resist composition.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）通过酸的作用而分解以提高在碱性显影液中的溶解度的树脂的树脂，并且包括特定重复单元和（B）在光化射线照射时产生酸的化合物或 辐射和使用正性抗蚀剂组合物的图案形成方法。
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公开(公告)号：US06555289B2
公开(公告)日：2003-04-29
申请号：US09826850
申请日：2001-04-06
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/0758 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/111 , Y10S430/115
摘要： Provided is a positive photoresist composition for use in the production of a semiconductor device, which ensures high resolution, reduced edge roughness of a line pattern and a small number of development defects. The positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an alkali developer increases under the action of an acid.
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3.发明授权公开(公告)号：US07157208B2
公开(公告)日：2007-01-02
申请号：US11060533
申请日：2005-02-18
申请人： Tomoya Sasaki , Kazuyoshi Mizutani
发明人： Tomoya Sasaki , Kazuyoshi Mizutani
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition satisfying all of high sensitivity, high resolution, good pattern profile, good line edge roughness and good in-vacuum PED characteristics, is provided, the positive resist composition comprising: (A) a resin containing a repeating unit having a specific styrene skeleton, which is insoluble or hardly soluble in an alkali developer and becomes soluble in an alkali developer under the action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (C) an organic basic compound, and a pattern formation method using the positive resist composition.
摘要翻译： 提供满足高灵敏度，高分辨率，良好图案轮廓，良好的线边缘粗糙度和良好的真空PED特性的正性抗蚀剂组合物，正型抗蚀剂组合物包含：（A）含有具有特定 苯乙烯骨架，其在碱性显影剂中不溶或难溶，并在酸的作用下变得可溶于碱显影剂; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; 和（C）有机碱性化合物，以及使用正性抗蚀剂组合物的图案形成方法。
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4.发明授权Positive resist composition to be irradiated with one of an electron beam and X-ray 有权要用电子束和X射线之一照射正电子抗蚀剂组合物公开(公告)号：US06727040B2
公开(公告)日：2004-04-27
申请号：US10024358
申请日：2001-12-21
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/143 , Y10S430/167
摘要： A positive resist composition to be irradiated with one of an electron beam and X-ray, comprises: (a) a compound capable of generating an acid upon irradiation with one of electron beam and X-ray; (b1) a resin: increasing the solubility in an alkali developer by the action of an acid; and having a group capable of leaving by the action of an acid, in which the leaving group includes a residue of a compound, the compound having a smaller ionization potential value than p-ethylphenol; and (c) a solvent.
摘要翻译： 用电子束和X射线之一照射的正性抗蚀剂组合物包括：（a）在用电子束和X射线之一照射时能够产生酸的化合物; （b1）树脂：通过酸的作用增加在碱性显影剂中的溶解度; 并且具有能够通过酸的作用离开的基团，其中离去基团包括化合物的残基，具有比对乙基苯酚更小的电离电位值的化合物; 和（c）溶剂。
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公开(公告)号：US07198880B2
公开(公告)日：2007-04-03
申请号：US10422789
申请日：2003-04-25
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0395 , G03F7/0397
摘要： A positive resist composition comprising: (A1) a resin containing at least one type of repeating unit represented by the specific formula and additionally containing at least one type of repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound which is capable of generating an acid by the action of actinic ray or radiation.
摘要翻译： 正性抗蚀剂组合物包含
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公开(公告)号：US06939662B2
公开(公告)日：2005-09-06
申请号：US10448041
申请日：2003-05-30
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/114
摘要： A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
摘要翻译： 一种正性抗蚀剂组合物，其包含：（A1）含有由所述特定式表示的重复单元的树脂，其通过酸的作用增加在碱性显影液中的溶解度，和（B）能够产生酸的化合物 用光化射线和辐射之一照射时。
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公开(公告)号：US07335454B2
公开(公告)日：2008-02-26
申请号：US10317110
申请日：2002-12-12
IPC分类号： G03C1/00
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/114 , Y10S430/115
摘要： A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.
摘要翻译： 一种正型抗蚀剂组合物，其包含（A）在聚合物骨架的主链和/或侧链中具有被氟原子取代的结构的含氟基树脂和通过酸的作用而分解的基团以增加 在碱显影剂中的溶解度和（B）能够在光化射线或辐射照射时能产生酸的酸发生剂，（B）的酸产生剂是选自不含芳环的锍盐和具有 苯甲酰锍盐结构。
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公开(公告)号：US07214467B2
公开(公告)日：2007-05-08
申请号：US10455459
申请日：2003-06-06
IPC分类号： G03F7/00
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/114 , Y10S430/115
摘要： The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light, where line edge roughness and development time dependence are small and a problem of footing formation is improved; and comprising a resin which decomposes by an action of acid to increase the solubility in alkali developer, in which the resin contains a specific repeat unit; a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, in which the compound includes at least two kinds of compounds selected from the group consisting of specific compounds (B1), (B2), (B3) and (B4).
摘要翻译： 本发明的感光性树脂组合物是优异的感光性树脂组合物，其在使用160nm以下的曝光光源，更具体地是2/2准分子激光的情况下显示显着的透射性，其中线边 粗糙度和开发时间依赖性小，基础形成问题得到改善; 并且包含通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂，其中树脂含有特定的重复单元; 其中化合物包括选自特定化合物（B1），（B2），（B3）和（B3）中的至少两种化合物， （B4）。
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9.发明授权公开(公告)号：US07202015B2
公开(公告)日：2007-04-10
申请号：US10921962
申请日：2004-08-20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , Y10S430/108
摘要： A positive photoresist composition containing: (A) a resin which contains at least one of a repeating unit represented by the formula (IA) defiend herein and a repeating unit represented by the formula (IB) defined herein, and is decomposed by an action of an acid and shows an increase in a solubility in an alkali developer; and (B) as compounds capable of generating an acid upon irradiation with one of an actinic ray and a radiation, at least two compounds selected from the compounds (B1), (B2), (B3) and (B4) as defiend herein.
摘要翻译： 一种正性光致抗蚀剂组合物，其含有：（A）含有本文所述的由式（IA）表示的重复单元和本文定义的式（IB）表示的重复单元中的至少一种的树脂，并且通过 酸显示出在碱性显影剂中的溶解度的增加; 和（B）作为能够在用光化学射线和辐射之一照射时产生酸的化合物，至少两种选自化合物（B1），（B2），（B3）和（B4）的化合物，如本文所述。
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公开(公告)号：US07163776B2
公开(公告)日：2007-01-16
申请号：US10417209
申请日：2003-04-17
IPC分类号： G03F7/004
CPC分类号： G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/122
摘要： A positive-working resist composition comprising (A1) a resin containing a repeating unit represented by the specific general formula, wherein the resin increases the solubility in an alkali developing solution by the action of an acid.
摘要翻译： 一种正性抗蚀剂组合物，其包含（A1）含有由特定通式表示的重复单元的树脂，其中所述树脂通过酸的作用增加了在碱性显影液中的溶解度。
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