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公开(公告)号：US20130126733A1
公开(公告)日：2013-05-23
申请号：US13812899
申请日：2011-08-08
申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
发明人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
IPC分类号： H01J37/26
CPC分类号： H01J37/263 , G01N23/22 , H01J37/222 , H01J37/28
摘要： This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
摘要翻译： 该带电粒子束显微镜的特征在于设置有用于检测粒子（118）的测量处理方法的选择装置（153,155），并且通过这种方式为具有大量二次电子的扫描区域选择不同的测量处理方法 （114）和二次电子数量少的区域（115）。 因此，在使用带电粒子束显微镜的样本扫描中，强调了具有较少发射的二次电子的底部孔和通道底部的对比度的图像，并且可以在短时间内获取强调阴影对比度的图像。
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公开(公告)号：US08405026B2
公开(公告)日：2013-03-26
申请号：US12554275
申请日：2009-09-04
CPC分类号： H01J37/153 , H01J37/04 , H01J37/28
摘要： Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.
摘要翻译： 本文公开了一种带电粒子束装置，其能够根据目标物镜孔径来控制探针电流和物镜发散角度，以获得所需的探针电流和期望的物体发散角。 该装置被配置为在第一和第二聚光透镜之间包括物镜孔，以根据物镜孔的直径来计算和设置第一聚光透镜的控制值，以获得所需的探针电流，并计算 根据目标发散角的孔的直径和第二聚光透镜设定装置的控制值的第二聚光透镜设定装置的控制值，由此设定计算出的第二聚光透镜设定装置的控制值， 客观发散角。
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公开(公告)号：US08841612B2
公开(公告)日：2014-09-23
申请号：US13812899
申请日：2011-08-08
申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
发明人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
CPC分类号： H01J37/263 , G01N23/22 , H01J37/222 , H01J37/28
摘要： This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
摘要翻译： 该带电粒子束显微镜的特征在于设置有用于检测粒子（118）的测量处理方法的选择装置（153,155），并且通过这种方式为具有大量二次电子的扫描区域选择不同的测量处理方法 （114）和二次电子数量少的区域（115）。 因此，在使用带电粒子束显微镜的样本扫描中，强调了具有较少发射的二次电子的底部孔和通道底部的对比度的图像，并且可以在短时间内获取强调阴影对比度的图像。
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公开(公告)号：US08467595B2
公开(公告)日：2013-06-18
申请号：US13056353
申请日：2009-07-27
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
摘要翻译： 提供一种系统，其实现了坐标误差的降低和吞吐量的提高，并且允许观察微缺陷。 该系统包括：测量预先计算的坐标与实际样本位置之间的位移量的功能; 优化坐标校正公式的功能，以使从所测量的位移量中的位移量最小化; 以及通过统计处理来计算预先计算的坐标与实际样本位置之间的位移变化的功能。 当相对于作为缺陷观察图像的观察用图像的视场的坐标变化量足够小时，系统仅获取用于观察的图像，而不进行用于搜索的图像的获取，其是 成为缺陷搜索图像。
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5.发明授权Charged particle beam apparatus permitting high resolution and high-contrast observation 有权带电粒子束装置允许高分辨率和高对比度观察公开(公告)号：US08431915B2
公开(公告)日：2013-04-30
申请号：US13551452
申请日：2012-07-17
CPC分类号： H01J37/28 , G01N23/225 , H01J37/145 , H01J2237/21 , H01J2237/28
摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
摘要翻译： 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源使电子束减速的减速电场控制单元，以及抑制使用控制磁路电源对样品进行放电的抑制单元。
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6.发明授权Charged particle beam apparatus permitting high-resolution and high-contrast observation 有权带电粒子束装置允许高分辨率和高对比度观察公开(公告)号：US08389935B2
公开(公告)日：2013-03-05
申请号：US12385612
申请日：2009-04-14
CPC分类号： H01J37/28 , G01N23/225 , H01J37/145 , H01J2237/21 , H01J2237/28
摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply. Thus, whether landing energy of an electron beam varies widely, the electron beam can be focused with the electromagnetic superposition type objective lens approached to the sample.
摘要翻译： 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。 因此，无论电子束的着陆能量是否变化很大，电子束可以与接近样品的电磁叠加型物镜聚焦。
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公开(公告)号：US20110129142A1
公开(公告)日：2011-06-02
申请号：US13056353
申请日：2009-07-27
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
摘要翻译： 提供一种系统，其实现了坐标误差的降低和吞吐量的提高，并且允许观察微缺陷。 该系统包括：测量预先计算的坐标与实际样本位置之间的位移量的功能; 优化坐标校正公式的功能，以使从所测量的位移量中的位移量最小化; 以及通过统计处理来计算预先计算的坐标与实际样本位置之间的位移变化的功能。 当相对于作为缺陷观察图像的观察用图像的视场的坐标变化值足够小时，系统仅获取用于观察的图像，而不进行用于搜索的图像的获取，其是 成为缺陷搜索图像。
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公开(公告)号：US08207498B2
公开(公告)日：2012-06-26
申请号：US12985633
申请日：2011-01-06
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an ExB deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译： 一种电子束装置，包括放置样品的样品台和电子光学系统。 电子光学系统包括产生一次电子束的电子枪，将一次电子束收敛在样品上的浸没物镜，将一次束照射产生的二次粒子分离为样品的ExB偏转器 从一次光束的光轴，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测三元的速度分量和方位分量 由二次粒子与反射部件碰撞而产生的粒子和位于反射部件上方的中心检测器。
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公开(公告)号：US20080099673A1
公开(公告)日：2008-05-01
申请号：US11877715
申请日：2007-10-24
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： The present invention provides a charged-particle beam inspection technology that enables to acquire a shadow contrast enhanced image, and to detect a shallow roughness with sufficient sensitively, which is caused by a micro-scale or nano-scale foreign matter in an inspection of a semiconductor device having a circuit pattern or the like. Immersion objective lens is employed as an objective lens for the high-resolution observation. A converged electron beam is obtained due to the objective lens. An assist electrode, a right detector and a left detector are provided in the objective lens. A velocity component of a secondary electron caused by the irradiation of the sample with an electron beam is discriminated. An azimuth component is further discriminated.
摘要翻译： 本发明提供了一种带电粒子束检查技术，其能够获得阴影对比度增强图像，并且在检查中由微尺度或纳米级异物引起的足够敏感地检测浅的粗糙度 具有电路图案等的半导体器件。 浸入式物镜被用作用于高分辨率观察的物镜。 由于物镜得到会聚的电子束。 辅助电极，右检测器和左检测器设置在物镜中。 鉴别由电子束照射样品引起的二次电子的速度分量。 进一步鉴别方位分量。
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公开(公告)号：US20120261574A1
公开(公告)日：2012-10-18
申请号：US13530797
申请日：2012-06-22
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译： 一种电子束装置，包括放置样品的样品台和电子光学系统。 电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量 由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。
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