Illumination optical system, exposure apparatus, and exposure method
    4.
    发明申请
    Illumination optical system, exposure apparatus, and exposure method 失效
    照明光学系统,曝光装置和曝光方法

    公开(公告)号:US20080074632A1

    公开(公告)日:2008-03-27

    申请号:US11979517

    申请日:2007-11-05

    IPC分类号: G03B27/72

    摘要: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

    摘要翻译: 一种照明光学系统,当安装在曝光系统中时,通过根据掩模的图案特性改变照明光的偏振状态,同时抑制光的强度损失,实现合适的照明条件。 照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置,反之亦然 。 偏光状态改变装置配置在光源单元与被照射面之间的光路中。 可以从照明光路去除偏振状态改变装置,并且具有去偏振器,用于选择性地使入射的线偏振光去极化。

    Illumination optical system, exposure apparatus, and exposure method
    8.
    发明申请
    Illumination optical system, exposure apparatus, and exposure method 审中-公开
    照明光学系统,曝光装置和曝光方法

    公开(公告)号:US20100149511A1

    公开(公告)日:2010-06-17

    申请号:US12656822

    申请日:2010-02-17

    IPC分类号: G03B27/72

    摘要: An illumination optical system illuminates an irradiated surface with light supplied from a light source. The illumination optical system includes a diffractive optical element disposed in an optical path of linearly polarized light supplied from the light source. The diffractive optical element forms a multipole illumination field including a plurality of illumination fields. The illumination optical system also includes an optical integrator that forms a multipole light source including a plurality of planar light sources with light that has passed through the multipole illumination field. The illumination optical system also includes a polarization optical member disposed in an illumination optical path and that sets a polarization direction of light that has passed through the multipole light source to a predetermined polarization direction.

    摘要翻译: 照明光学系统用从光源提供的光照射被照射的表面。 照明光学系统包括设置在从光源提供的线偏振光的光路中的衍射光学元件。 衍射光学元件形成包括多个照明场的多极照明场。 照明光学系统还包括光学积分器,其形成包括已经穿过多极照明场的光的多个平面光源的多极光源。 照明光学系统还包括设置在照明光路中并将已经通过多极光源的光的偏振方向设定为预定偏振方向的偏振光学构件。

    Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
    10.
    发明授权
    Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
    图像形成状态调整系统,曝光方法和曝光装置以及程序和信息存储介质

    公开(公告)号:US07391497B2

    公开(公告)日:2008-06-24

    申请号:US11736134

    申请日:2007-04-17

    IPC分类号: G03B27/52 G03B27/68

    摘要: A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

    摘要翻译: 第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量(例如波前像差)有关的曝光条件下的调整信息,以及 然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。 此外,第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息,然后基于目标曝光条件计算调整单元的最佳调整量 信息。 并且,第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。