摘要:
The invention is a continuous finishing apparatus for a slide fastener having a slider introduction portion for successively introducing a slider by intermittently running a slide fastener chain, wherein, a slider introduction member thrusts into the space portion when the slider held by a slider holding member is brought into a space portion and set therein, moves downstream of the slide fastener chain within the space portion, holds an engaging element disposed at a downstream end portion of the space portion, and then, continues to move to the downstream for carrying the slide fastener chain, and wherein the slider is introduced and set along the same chain upon this carriage. Because the slider introduction member carries the slide fastener by holding the engaging elements on an edge of the fastener tape, which is least elongated, no disagreement occurs in position of corresponding right and left engaging elements.
摘要:
The invention is a continuous finishing apparatus for a slide fastener having a slider introduction portion for successively introducing a slider by intermittently running a slide fastener chain, wherein, a slider introduction member thrusts into the space portion when the slider held by a slider holding member is brought into a space portion and set therein, moves downstream of the slide fastener chain within the space portion, holds an engaging element disposed at a downstream end portion of the space portion, and then, continues to move to the downstream for carrying the slide fastener chain, and wherein the slider is introduced and set along the same chain upon this carriage. Because the slider introduction member carries the slide fastener by holding the engaging elements on an edge of the fastener tape, which is least elongated, no disagreement occurs in position of corresponding right and left engaging elements.
摘要:
In a slide fastener chain sewing apparatus, a continuously supplied slide fastener chain is successively sewn onto a pair of left and right cloth pieces. A chain cutter cuts the slide fastener chain between the cloth pieces which are moved continuously over a sewn product transfer device table and suspending from a front end of the table. A sewn product receiving section has sewn product transfer means for receiving, in a lower part, a sewn product cut away from the succeeding cloth piece having the fastener chain sewn thereto. The sewn product transfer device transfers the sewn product to a rear end of the table through a lower space portion of the table.
摘要:
An apparatus and method for manufacturing a slide fastener. The apparatus may provide a chain transfer path inclined downward for transferring a fastener chain, a chain cutting portion disposed at a middle of the transfer path and a feed portion disposed on an upstream side of the chain cutting portion of the chain transfer path. A control portion may also be provided for a) stopping to transfer the fastener chain by the feed portion and b) operating the chain cutting portion. A pivoting section may also be provided, which pivots the chain cutting portion by a predetermined angle on the chain transfer path around an axis line orthogonal to the transfer path.
摘要:
A method of manufacturing a slide fastener by cutting a long fastener chain, alternately having in a longitudinal direction thereof a pair of element rows meshing with each other and an interval portion lacking the element row, at a predetermined position of the interval portion, the method including the steps of: arranging a feed portion of the fastener chain on an upstream side of a chain cutting portion; positively transferring the fastener chain successively by the feed portion to the chain cutting portion along an inclined transfer path inclined downward; operating the chain cutting portion after awaiting for stopping to transfer the fastener chain and cutting the slide faster chain in a cross direction at the predetermined position of the interval portion; and making the slide fastener cut to be separated by the chain cutting portion slide down by a self weight thereof along the transfer path.
摘要:
First, second, and third semiconductor switches are connected in series terminal between input and output terminals and first and second voltage application means are connected in parallel to the first and third semiconductor switches, whereby providing semiconductor switch circuit. Each voltage application means is composed of a series-connected circuit of first or second voltage application semiconductor switch and direct current amplifier having gain state of approximately +1 and whose input side is connected to the input or output terminal. One end of the first or second voltage application semiconductor switch is connected to the junction J of the first and second semiconductor switches, or to the junction K of the second and third semiconductor switches, respectively. When first through third semiconductor switches are turned OFF, first and second voltage application semiconductor switches are turned on to apply the potential of input and output terminals to the junctions J and K.
摘要:
In a method for automatically attaching successive fly strips to a continuous slide fastener chain, the successive strips are fed to a standby point one after another by a conveyor horizontally spaced from a sewing machine by a gap in which the standby point is disposed. A preceding strip is supplied from the standby point to the sewing machine with its trailing end portion hanging in the gap, while a succeeding strip is kept waiting at the standby point for a subsequent supply. When the trailing end of the preceding strip has passed a fixed point downstream of the standby point in the gap as the sewing of the preceding strip progresses, the succeeding strip is supplied at a speed higher than the rate at which the sewing of the preceding strip progresses.
摘要:
To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.
摘要:
To provide a technique capable of positioning of a semiconductor chip and a mounting substrate with high precision by improving visibility of an alignment mark. In a semiconductor chip constituting an LCD driver, a mark is formed in an alignment mark formation region over a semiconductor substrate. The mark is formed in the same layer as that of an uppermost layer wiring (third layer wiring) in an integrated circuit formation region. Then, in the lower layer of the mark and a background region surrounding the mark, patterns are formed. At this time, the pattern P1a is formed in the same layer as that of a second layer wiring and the pattern P1b is formed in the same layer as that of a first layer wiring. Further, the pattern P2 is formed in the same layer as that of a gate electrode, and the pattern P3 is formed in the same layer as that of an element isolation region.
摘要:
A semiconductor device manufacturing method is disclosed wherein a semiconductor integrated circuit is formed in each of plural semiconductor chip regions of a semiconductor wafer which regions are to become semiconductor chips later and then the semiconductor wafer is cut along scribing regions each provided between adjacent semiconductor chip regions. The semiconductor chip regions are each in a rectangular shape having long sides and short sides. The scribing regions include a first scribing region in contact with the short sides and a second scribing region in contact with the long sides. The width of the second scribing region is smaller than the width of the first scribing region. In a photolithography process, first and second alignment patterns for making alignment in both X and Y directions are all formed in the first scribing region and not formed in the second scribing region. Both improvement of the alignment accuracy and reduction of the semiconductor device manufacturing cost can be attained.