公开(公告)号：US20070225465A1

公开(公告)日：2007-09-27

申请号：US11578407

申请日：2005-04-13

申请人： Toshiyuki Akiike ,  Toru Kajita ,  Kinji Yamada

发明人： Toshiyuki Akiike ,  Toru Kajita ,  Kinji Yamada

IPC分类号： C08G77/00 ,  C08G77/06 ,  C08G77/12 ,  C08G77/22

CPC分类号： C08G77/14 ,  C08K5/09 ,  C08L83/06 ,  C09K3/1018 ,  H01L23/293 ,  H01L33/56 ,  H01L2924/0002 ,  H01L2924/00

摘要： A polyorganosiloxane having a weight average molecular weight of 500 to 1,000,000 obtained by heating a silane compound having an epoxy group and a silane compound having no epoxy group in the presence of an organic solvent, an organic base and water, an optical semiconductor sealing composition comprising the same as the main component, an optical semiconductor sealer and an optical semiconductor.

摘要翻译： 通过在有机溶剂，有机碱和水的存在下加热具有环氧基的硅烷化合物和不具有环氧基的硅烷化合物而获得的重均分子量为500至1,000,000的聚有机硅氧烷，包括 与主要部件相同，光学半导体封口器和光学半导体。

公开(公告)号：US07202016B2

公开(公告)日：2007-04-10

申请号：US11116269

申请日：2005-04-28

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 一种包含特定共聚物和光致酸发生剂的化学放大的辐射敏感性树脂组合物，其中共聚物含有以下重复单元（1）和/或重复单元（2）和重复单元（3-1），

公开(公告)号：US06933094B2

公开(公告)日：2005-08-23

申请号：US09953941

申请日：2001-09-18

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

公开(公告)号：US20050214680A1

公开(公告)日：2005-09-29

申请号：US11116269

申请日：2005-04-28

申请人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Masaaki Miyaji ,  Tomoki Nagai ,  Yuji Yada ,  Jun Numata ,  Yukio Nishimura ,  Masafumi Yamamoto ,  Hiroyuki Ishii ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/122

摘要： A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein R1 is a hydrogen or methyl, R2 is a C4-10 tertiary alkyl, R3 and R4 are a hydrogen, C1-12 alkyl, C6-15 aromatic, C1-12 alkoxyl, or R3 and R4 may form, in combination and together with the nitrogen atom with which the R3 and R4 groups bond, a C3-15 cyclic structure, provided that R3 and R4 are not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.

摘要翻译： 包含特定共聚物和光酸产生剂的化学放大的辐射敏感性树脂组合物，其中所述共聚物包含以下重复单元（1）和/或重复单元（2）和重复单元（3-1），其中R 1是氢或甲基，R 2是C 4-10叔烷基，R 3和R 3 H 4是氢，C 1-12烷基，C 6-15芳族，C 1-12烷氧基， ，或R 3和R 4可以与R 3和R 4的氮原子组合形成， 基团键合，C 3-15-15环状结构，条件是R 3和R 4不是氢原子 同时。 该组合物有效响应各种辐射，显示出优异的分辨率和图案配置以及最小的等密度偏差，并能以高精度和稳定的方式形成精细图案。

公开(公告)号：US06800414B2

公开(公告)日：2004-10-05

申请号：US09879894

申请日：2001-06-14

申请人： Yukio Nishimura ,  Noboru Yamahara ,  Masafumi Yamamoto ,  Toru Kajita ,  Tsutomu Shimokawa ,  Hiroshi Ito

发明人： Yukio Nishimura ,  Noboru Yamahara ,  Masafumi Yamamoto ,  Toru Kajita ,  Tsutomu Shimokawa ,  Hiroshi Ito

IPC分类号： G03F7004

CPC分类号： G03F7/0046 ,  G03F7/0233 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

摘要翻译： 公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。 该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或 不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或 具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。 树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

公开(公告)号：US06838225B2

公开(公告)日：2005-01-04

申请号：US10046080

申请日：2002-01-16

申请人： Yukio Nishimura ,  Masafumi Yamamoto ,  Atsuko Kataoka ,  Toru Kajita

发明人： Yukio Nishimura ,  Masafumi Yamamoto ,  Atsuko Kataoka ,  Toru Kajita

IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/111 ,  Y10S430/123

摘要： A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R5 represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.

摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）不溶解或几乎不溶于碱的酸解离基团的树脂，当酸解离基解离时变得可溶于碱，并且含有具有特定结构的重复单元，（B） 式（3）的光酸产生剂，其中R 5表示一价芳族烃基，m为1-8，n为0-5。 该树脂组合物适合作为对KrF准分子激光器和ArF准分子激光器等深紫外线的化学增幅抗蚀剂，具有高透明度，优异的分辨率，耐干蚀刻性和灵敏度，产生良好的图案形状，并且良好地粘附于 底物。

公开(公告)号：US06692887B1

公开(公告)日：2004-02-17

申请号：US09197699

申请日：1998-11-23

申请人： Mitsuhito Suwa ,  Toru Kajita ,  Shin-ichiro Iwanaga ,  Toshiyuki Ota

发明人： Mitsuhito Suwa ,  Toru Kajita ,  Shin-ichiro Iwanaga ,  Toshiyuki Ota

IPC分类号： G03F7004

CPC分类号： C08G61/08 ,  C08L65/00 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/111

摘要： A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

公开(公告)号：US06623907B2

公开(公告)日：2003-09-23

申请号：US09774714

申请日：2001-02-01

申请人： Jun Numata ,  Aki Suzuki ,  Hiromichi Hara ,  Norihiro Natsume ,  Kiyoshi Murata ,  Masafumi Yamamoto ,  Akimasa Soyano ,  Toru Kajita ,  Tsutomu Shimokawa

发明人： Jun Numata ,  Aki Suzuki ,  Hiromichi Hara ,  Norihiro Natsume ,  Kiyoshi Murata ,  Masafumi Yamamoto ,  Akimasa Soyano ,  Toru Kajita ,  Tsutomu Shimokawa

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/128

摘要： A positive-tone radiation-sensitive resin composition comprising: (A) a low molecular weight compound having at least one amino group in which the nitrogen atom has at least one hydrogen atom bonded thereto and at least one of the hydrogen atoms is replaced by a t-butoxycarbonyl group, (B) a photoacid generator, and (C-1) a resin insoluble or scarcely soluble in alkali which is protected by an acid-dissociable group and becomes soluble in alkali when the acid-dissociable group dissociates or (C-2) an alkali-soluble resin and an alkali solubility control agent is disclosed. Also disclosed is a negative-tone radiation-sensitive resin composition comprising the low molecular weight compound (A), the photoacid generator (B), an alkali-soluble resin (D), and a compound capable of crosslinking with the alkali-soluble resin in the presence of an acid(E). The composition are useful as a chemically amplified resist which effectively responds to various radiations, exhibits superior sensitivity and resolution, forms fine patterns at a high precision and in a stable manner even if the patterns are isolated line patterns.

摘要翻译： 一种正色辐射敏感性树脂组合物，其包含：（A）具有至少一个氨基的低分子量化合物，其中所述氮原子具有与其键合的至少一个氢原子，并且至少一个氢原子被 叔丁氧基羰基，（B）光酸产生剂和（C-1）不溶于或几乎不溶于碱的树脂，其被酸解离基团保护并且当酸解离基解离时变得可溶于碱，或（C -2）碱溶性树脂和碱溶性控制剂。 还公开了包含低分子量化合物（A），光酸产生剂（B），碱溶性树脂（D）和能够与碱溶性树脂交联的化合物的负色辐射敏感性树脂组合物 在酸（E）的存在下。 该组合物可用作化学放大抗蚀剂，其有效地响应各种辐射，表现出优异的灵敏度和分辨率，即使图案是隔离线图案，也以高精度和稳定的方式形成精细图案。

公开(公告)号：US06322949B2

公开(公告)日：2001-11-27

申请号：US09739833

申请日：2000-12-20

申请人： Mitsuhito Suwa ,  Haruo Iwasawa ,  Toru Kajita ,  Shin-ichiro Iwanaga

发明人： Mitsuhito Suwa ,  Haruo Iwasawa ,  Toru Kajita ,  Shin-ichiro Iwanaga

IPC分类号： G03F7004

CPC分类号： G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/128

摘要： A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group , R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.

摘要翻译： 一种正色调或负色调辐射敏感性树脂组合物，其包含（A）由下式（1-1）或（1-2）表示的光酸产生剂：其中R1，R2，R5和R6是烷基， R3和R7是羟基或-OR4（其中R4是有机基团），A1-和A2-表示一价阴离子，a和c表示4-7的整数，b和d是0-7的整数 。 正色调树脂组合物还包含（B1）含有酸分解性基团的树脂或（B2）碱溶性树脂和碱溶性调节剂，负色调辐射敏感性树脂组合物还包含（C） 碱溶性树脂和（D）交联剂。 树脂组合物高度敏感，表现出优异的分辨率和图案形成性能。

公开(公告)号：US06180316B2

公开(公告)日：2001-01-30

申请号：US09231762

申请日：1999-01-15

申请人： Toru Kajita ,  Mitsuhito Suwa ,  Haruo Iwasawa ,  Masafumi Yamamoto

发明人： Toru Kajita ,  Mitsuhito Suwa ,  Haruo Iwasawa ,  Masafumi Yamamoto

IPC分类号： G03F7004

CPC分类号： G03F7/0395 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

摘要： A radiation-sensitive resin composition which comprises, (A) a polymer containing, (a) a recurring unit (I) of the following formula (1):  or a recurring unit (I) of the formula (1) and a recurring unit (II) of the following formula (2),  and (b) a recurring unit (III) which is derived from a monomer having at least two polymerizable carbon—carbon double bonds by cleavage of the carbon—carbon double bonds, wherein the monomer has, in addition to said at least two polymerizable carbon—carbon double bonds, at least one acid-decomposable divalent group of the following formula (3) or (4),  said at least two polymerizable carbon—carbon double bonds being linked via the least one acid-decomposable divalent group of the formula (3) or (4), and (B) a photoacid generator.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有（a）下式（1）的重复单元（I）或式（1）的重复单元（I）的聚合物和重复单元 （II）和（b）通过裂解碳 - 碳双键衍生自具有至少两个可聚合碳 - 碳双键的单体的重复单元（III），其中单体 除了所述至少两个可聚合碳 - 碳双键之外，还具有至少一个下式（3）或（4）的可酸分解的二价基团，所述至少两个可聚合碳 - 碳双键经由 至少一个式（3）或（4）的酸可分解的二价基团，和（B）光酸产生剂。