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    Method for forming a positive image
    2.
    发明授权
    Method for forming a positive image 有权
    形成正像的方法

    公开(公告)号：US06399279B1

    公开(公告)日：2002-06-04

    申请号：US09232727

    申请日：1999-01-19

    申请人： Toshiyuki Urano ,  Etsuko Hino ,  Mitsuru Sasaki

    发明人： Toshiyuki Urano ,  Etsuko Hino ,  Mitsuru Sasaki

    IPC分类号： G03F732

    CPC分类号： G03F7/322 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/262

    摘要： A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.

    摘要翻译： 一种用于形成正像的方法，其包括曝光包含基底的图像形成材料和含有酚醛清漆树脂的正性感光性组合物层和从图像曝光光源吸收光的光热转换材料，并将其转换成热 并且不含有通过在形成于基板上的来自图像曝光光源的光吸收时由光热转换材料产生的热的作用而分解的热分解材料，然后用含有两性表面活性剂的碱性显影剂显影， 形成积极的形象。

    Radiation sensitive composition
    3.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US6090518A

    公开(公告)日：2000-07-18

    申请号：US72970

    申请日：1998-05-06

    申请人： Takaaki Niinomi ,  Jun Fujita ,  Toshiyuki Urano ,  Etsuko Hino ,  Toshiaki Yokoo

    发明人： Takaaki Niinomi ,  Jun Fujita ,  Toshiyuki Urano ,  Etsuko Hino ,  Toshiaki Yokoo

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  Y10S430/106

    摘要： A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.

    摘要翻译： 一种辐射敏感性组合物，其包含成膜树脂和下式（1）或（2）的双（磺酰基）重氮甲烷化合物：其中R 1和R 3各自为可被取代的直链，支链或环状烷基， R 2为卤素原子，可以被取代的烷氧基，硝基，氰基，腈基或酰胺基，R 4，R 5和R 6各自独立地为直链状，支链状 或可被取代的环状烷基，卤素原子，可被取代的烷氧基，硝基，氰基，腈基或酰胺基。

    Production process for structure and production process for liquid discharge head
    8.
    发明授权
    Production process for structure and production process for liquid discharge head 有权
    液体排放头结构和生产工艺的生产工艺

    公开(公告)号：US08409454B2

    公开(公告)日：2013-04-02

    申请号：US12731563

    申请日：2010-03-25

    申请人： Etsuko Hino ,  Shoji Shiba

    发明人： Etsuko Hino ,  Shoji Shiba

    IPC分类号： G01D15/00 ,  G11B5/127

    CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1639 ,  Y10T29/49401

    摘要： A production process for a structure includes preparing a substrate on which a first layer and a second layer are provided in this order; forming a second mold, which is a part of a mold member serving as a mold for forming the structure, from the second layer; etching the first layer using the second mold as a mask and thereby forming a first mold, which is another part of the mold member from the first layer; providing a coating layer which serves as the structure to cover the first mold and the second mold; and removing the first mold and the second mold and thereby forming the structure.

    摘要翻译： 用于结构的制造方法包括制备其上以该顺序设置有第一层和第二层的基板; 从所述第二层形成作为用于形成所述结构的模具的模具部件的一部分的第二模具; 使用第二模具作为掩模蚀刻第一层，从而形成第一模具，该第一模具是来自第一层的模具构件的另一部分; 提供用作覆盖第一模具和第二模具的结构的涂层; 并移除第一模具和第二模具，从而形成结构。