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    Method for forming a positive image
    4.
    发明授权
    Method for forming a positive image 有权
    形成正像的方法

    公开(公告)号：US06399279B1

    公开(公告)日：2002-06-04

    申请号：US09232727

    申请日：1999-01-19

    申请人： Toshiyuki Urano ,  Etsuko Hino ,  Mitsuru Sasaki

    发明人： Toshiyuki Urano ,  Etsuko Hino ,  Mitsuru Sasaki

    IPC分类号： G03F732

    CPC分类号： G03F7/322 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/262

    摘要： A method for forming a positive image, which comprises exposing an image-forming material comprising a substrate and a positive photosensitive composition layer containing a novolak resin and a photo-thermal conversion material which absorbs light from an image exposure light source and converts it to heat and not containing a thermally decomposable material which decomposes by the action of heat generated by the photo-thermal conversion material upon absorption of light from the image exposure light source, formed on the substrate, followed by development with an alkali developer containing an amphoteric surfactant to form a positive image.

    摘要翻译： 一种用于形成正像的方法，其包括曝光包含基底的图像形成材料和含有酚醛清漆树脂的正性感光性组合物层和从图像曝光光源吸收光的光热转换材料，并将其转换成热 并且不含有通过在形成于基板上的来自图像曝光光源的光吸收时由光热转换材料产生的热的作用而分解的热分解材料，然后用含有两性表面活性剂的碱性显影剂显影， 形成积极的形象。

    Radiation sensitive composition
    5.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US6090518A

    公开(公告)日：2000-07-18

    申请号：US72970

    申请日：1998-05-06

    申请人： Takaaki Niinomi ,  Jun Fujita ,  Toshiyuki Urano ,  Etsuko Hino ,  Toshiaki Yokoo

    发明人： Takaaki Niinomi ,  Jun Fujita ,  Toshiyuki Urano ,  Etsuko Hino ,  Toshiaki Yokoo

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  Y10S430/106

    摘要： A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.

    摘要翻译： 一种辐射敏感性组合物，其包含成膜树脂和下式（1）或（2）的双（磺酰基）重氮甲烷化合物：其中R 1和R 3各自为可被取代的直链，支链或环状烷基， R 2为卤素原子，可以被取代的烷氧基，硝基，氰基，腈基或酰胺基，R 4，R 5和R 6各自独立地为直链状，支链状 或可被取代的环状烷基，卤素原子，可被取代的烷氧基，硝基，氰基，腈基或酰胺基。

    Photopolymerizable composition and photosensitive lithographic printing plate
    8.
    发明授权
    Photopolymerizable composition and photosensitive lithographic printing plate 失效
    光聚合组合物和光敏平版印刷版

    公开(公告)号：US5738974A

    公开(公告)日：1998-04-14

    申请号：US520724

    申请日：1995-08-29

    申请人： Hideki Nagasaka ,  Toshiyuki Urano ,  Akihisa Murata

    发明人： Hideki Nagasaka ,  Toshiyuki Urano ,  Akihisa Murata

    IPC分类号： G03F7/029

    CPC分类号： G03F7/029 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/127 ,  Y10S430/148

    摘要： A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises: (a) a titanocene compound, and (b) at least one coumarin compound of the following formula (I): ##STR1## wherein (i) each of R.sup.1, R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, each of R.sup.3 and R.sup.4 is an alkyl group, provided that at least one of R.sup.3 and R.sup.4 is a C.sub.4-16 alkyl group, or (ii) R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and at least one set of R.sup.2 and R.sup.3, and R.sup.4 and R.sup.5, is connected to form an alkylene group substituted by a lower alkyl group, provided that when they do not form the connecting group, each of R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and each of R.sup.3 and R.sup.4 is an alkyl group; R.sup.6 is a hydrogen atom, an alkyl group, an alkoxy group, an acyl group, a cyano group, or a carboxyl group or a group of its ester derivative or amide derivative, and R.sup.7 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17.

    摘要翻译： 一种可光聚合组合物，其包含具有至少一个烯属不饱和双键的加成聚合化合物和光聚合引发剂体系，其中所述光聚合引发剂体系包括：（a）二茂钛化合物和（b）至少一种下式的香豆素化合物 I）：其中（i）R1，R2和R5各自为氢原子，卤素原子，烷基或烷氧基，R3和R4各自为烷基，条件是在 R3和R4中的至少一个是C4-16烷基，或（ii）R1是氢原子，卤素原子，烷基或烷氧基，以及至少一个R2和R3以及R4和R5， 连接形成被低级烷基取代的亚烷基，条件是当它们不形成连接基团时，R 2和R 5各自为氢原子，卤素原子，烷基或烷氧基，R 3 R4为烷基; R6为氢原子，烷基，烷氧基，酰基，氰基或羧基或其酯衍生物或酰胺衍生物的基团，R7为碳原子数为 从3到17。

    Polymerizable composition containing pyrromethene type coloring matter and titanocene compound
    10.
    发明授权
    Polymerizable composition containing pyrromethene type coloring matter and titanocene compound 失效
    含有亚甲基吡咯型色素和二茂钛化合物的可聚合组合物

    公开(公告)号：US5498641A

    公开(公告)日：1996-03-12

    申请号：US224879

    申请日：1994-04-08

    申请人： Toshiyuki Urano ,  Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Hiroshi Ide

    发明人： Toshiyuki Urano ,  Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Hiroshi Ide

    IPC分类号： C08F2/50 ,  G03F7/029 ,  C08F4/14 ,  C08F4/649

    CPC分类号： G03F7/029 ,  C09B23/04 ,  C09B69/105

    摘要： A photopolymerizable composition comprising at least an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, which system comprises (a) a sensitizer of the formula (I): ##STR1## wherein each of R.sup.1 to R.sup.6 is hydrogen, halogen, alkyl, aryl, aralkyl, acyl, alkoxycarbonyl, optionally substituted hydrocarbon ring, optionally substituted heterocyclic residue or --SO.sub.3 --R.sup.8, wherein R.sup.8 is hydrogen, alkyl, aryl, aralkyl, alkali metal, or quaternary ammonium, R.sup.7 is hydrogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, each of X.sup.1 and X.sup.2 is halogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, and (b) a titanocene compound.

    摘要翻译： 至少包含具有至少一个烯键式不饱和双键的加聚聚合化合物和光聚合引发剂体系的可光聚合组合物，该体系包含（a）式（I）的敏化剂：基，卤素，烷基，芳基，芳烷基，酰基 ，烷氧基羰基，任选取代的烃环，任选取代的杂环残基或-SO 3 -R 8，其中R 8是氢，烷基，芳基，芳烷基，碱金属或季铵，R 7是氢，烷​​基，芳基，芳烷基，任选取代的烃环 或任选取代的杂环基，X 1和X 2各自为卤素，烷基，芳基，芳烷基，任选取代的烃环或任选取代的杂环基，和（b）二茂钛化合物。