CVI/CVD MATRIX DENSIFICATION PROCESS AND APPARATUS

    公开(公告)号:US20200157679A1

    公开(公告)日:2020-05-21

    申请号:US16192286

    申请日:2018-11-15

    Abstract: A chemical vapor infiltration and deposition (CVI/CVD) reactor assembly includes a CVI/CVD reactor and a reactant gas feed source. The CVI/CVD reactor includes a first inlet at a first end of the CVI/CVD reactor, a second inlet at a second end of the CVI/CVD reactor opposite the first end, a first outlet at the second end, a second outlet at the first end, and a chamber in fluid communication with the first and second inlets and first and second outlets and configured to hold a substrate. The reactant gas feed source is interchangeably and fluidly connected to the first and second inlets by first and second valved gas lines, respectively.

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