ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD

    公开(公告)号:US20230124913A1

    公开(公告)日:2023-04-20

    申请号:US17705405

    申请日:2022-03-28

    Abstract: An electroplating apparatus includes an anode and a cathode, a power supply, a regulating plate, and a controller. The power supply is electrically connected to the anode and the cathode. The regulating plate is disposed between the anode and the cathode. The regulating plate includes an insulation grid plate and a plurality of wires. The controller is electrically connected to the plurality of wires to control a state of an electromagnetic field around the plurality of wires. An electroplating method is also provided.

    CIRCUIT BOARD STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240414850A1

    公开(公告)日:2024-12-12

    申请号:US18404845

    申请日:2024-01-04

    Abstract: A circuit board structure includes a core layer, at least one electroplating metal layer, at least one dielectric layer and at least one conductive metal layer. The core layer includes at least one dielectric portion and at least one metal portion. The electroplating metal layer is disposed on at least one of a first surface and a second surface of the core layer, exposing a portion of at least one of the first surface and the second surface and at least connecting the at least one metal part. The dielectric layer is disposed on at least one of the first surface and the second surface and on the electroplating metal layer. The dielectric layer has at least one opening exposing a portion of the electroplating metal layer. The conductive metal layer is disposed in the opening of the dielectric layer and is correspondingly connected to the electroplating metal layer.

Patent Agency Ranking