公开(公告)号：US06227709B1

公开(公告)日：2001-05-08

申请号：US09051734

申请日：1999-04-20

申请人： Uwe Lehmann ,  Michael Lill

发明人： Uwe Lehmann ,  Michael Lill

IPC分类号： F16C3304

CPC分类号： F16C33/08 ,  F16C9/04 ,  F16C17/022 ,  F16C17/10 ,  F16C2226/50

摘要： A bearing shell with at least one retaining cam which, when looking down on the partial surface of the bearing shell, has a rectangular external contour line and an indentation on the inside, the indentation being at its largest around the center (M) of the cam. The indentation, when looking down on the partial surface, has a curved contour line. The cam is made by being either hammered or pressed using a rounded blade.

摘要翻译： 一种具有至少一个保持凸轮的轴承壳体，当在轴承壳体的部分表面上向下看时，其具有矩形外部轮廓线和内部的凹口，所述凹陷在其最大的中心（M）附近 凸轮 当向下看部分表面时，缩进具有曲线轮廓线。 凸轮通过使用圆形刀片进行锤击或压制而制成。

公开(公告)号：US20090233233A1

公开(公告)日：2009-09-17

申请号：US12403132

申请日：2009-03-12

申请人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

发明人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03F7/004

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。

公开(公告)号：US20080291419A1

公开(公告)日：2008-11-27

申请号：US12187116

申请日：2008-08-06

申请人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

发明人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

公开(公告)号：US20050225737A1

公开(公告)日：2005-10-13

申请号：US11015553

申请日：2004-12-20

申请人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Guenter Scheible

发明人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Guenter Scheible

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

摘要翻译： 在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中 平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

公开(公告)号：US08279402B2

公开(公告)日：2012-10-02

申请号：US12403132

申请日：2009-03-12

申请人： Stephan Six ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

发明人： Stephan Six ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

IPC分类号： G03F7/207

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。