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    Lithographic apparatus and device manufacturing method
    2.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US20070146659A1

    公开(公告)日：2007-06-28

    申请号：US11319190

    申请日：2005-12-28

    申请人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Derk Jan Klunder ,  Levinus Bakker ,  Vadim Banine ,  Frank Jeroen Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

    摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

    摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus
    3.
    发明申请
    Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus 失效
    用于从辐射束中过滤颗粒并用于光刻设备的过滤器的方法

    公开(公告)号：US20070023693A1

    公开(公告)日：2007-02-01

    申请号：US11493848

    申请日：2006-07-27

    申请人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    发明人： Levinus Bakker ,  Derk Klunder ,  Maarten Marinus Wilhelmus Van Herpen

    IPC分类号： A61N5/00

    CPC分类号： G03F7/70916 ,  H05G2/001

    摘要： A method for filtering particles out of a beam of radiation propagating from a radiation source is provided. The method includes passing the beam of radiation through a filter having a first portion within the beam of radiation and a second portion outside of the beam of radiation, capturing at least some of the particles in the beam of radiation with the first portion, and moving the filter in a direction that is transverse to the beam of radiation so that the first portion is moved outside of the beam of radiation and the second portion is moved into the beam of radiation.

    摘要翻译： 提供了从辐射源传播的辐射束中过滤颗粒的方法。 该方法包括将辐射束通过过滤器，该过滤器具有在辐射束内的第一部分和位于辐射束之外的第二部分，用第一部分捕获辐射束中的至少一些颗粒，并移动 所述过滤器在横向于所述辐射束的方向上，使得所述第一部分移动到所述辐射束的外部，并且所述第二部分被移动到所述辐射束中。

    METHOD OF IMAGING A SAMPLE
    4.
    发明申请
    METHOD OF IMAGING A SAMPLE 审中-公开
    成像方法

    公开(公告)号：US20110025837A1

    公开(公告)日：2011-02-03

    申请号：US12672551

    申请日：2008-08-12

    申请人： Dirk Vossen ,  Levinus Bakker ,  Bas Hulsken ,  Sjoerd Stallinga

    发明人： Dirk Vossen ,  Levinus Bakker ,  Bas Hulsken ,  Sjoerd Stallinga

    IPC分类号： G06K9/60 ,  H04N7/18

    CPC分类号： G02B21/002 ,  G02B21/004 ,  G02B21/008 ,  G02B21/086 ,  G02B21/14

    摘要： A method of imaging a sample comprises the steps of: -providing S1 a reference array of spots 104, -illuminating the sample 106 with the reference array of spots 104 and acquiring S2 at least one sample image IMSi comprising a sample related array of spots 107 resulting from the reference array of spots interacting with the sample 106, -determining S3 a spot characterizing parameter for each of a plurality of sample related spots, and -constructing S4 an image of the sample IM, By plotting the spot characterizing parameter for each of the plurality of sample related spots at the respective sample related spot position.

    摘要翻译： 一种对样本进行成像的方法包括以下步骤： - 提供斑点104的参考阵列， - 用点104的参考阵列照亮样本106，并且获取S2至少一个样本图像IMSi，其包括样本相关的点阵列107 由与样本106相互作用的点的参考阵列产生， - 确定S3是多个样本相关斑点中的每一个的斑点特征参数，以及 - 构造样本IM的图像，通过绘制样本IM的图像 在相应样品相关点位置处的多个样品相关斑点。

    Lithographic apparatus, device manufacturing method and radiation system
    6.
    发明申请
    Lithographic apparatus, device manufacturing method and radiation system 有权
    光刻设备，设备制造方法和辐射系统

    公开(公告)号：US20050253091A1

    公开(公告)日：2005-11-17

    申请号：US10844577

    申请日：2004-05-13

    申请人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

    发明人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

    IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

    摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

    摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。

    Display device for volumetric imaging using a birefringent optical path length adjuster
    10.
    发明申请
    Display device for volumetric imaging using a birefringent optical path length adjuster 审中-公开
    使用双折射光路长度调节器的体积成像显示装置

    公开(公告)号：US20070153234A1

    公开(公告)日：2007-07-05

    申请号：US10596877

    申请日：2005-01-06

    申请人： Bart Salters ,  Levinus Bakker

    发明人： Bart Salters ,  Levinus Bakker

    IPC分类号： G03B21/00 ,  G02B27/22

    CPC分类号： H04N13/395

    摘要： A display device for generating a three-dimensional volumetric image incorporates an optical path length adjuster enables electro-optical control of a physical path length between a display panel and a focusing element, to generate a virtual image within a defined imaging volume. The adjuster varies an optical path length between an input optical path and an output optical path and includes: a first polarisation switch for selecting a polarisation state for an input beam on the input optical path and an optical element having birefringent properties and thereby defining at least two possible effective optical paths of different lengths therethrough, for passing the input beam along a selected one of said at least two possible optical paths according to the selected polarisation state of the input beam and for providing an output beam of light, on said optical output path, that has travelled along the selected optical path.

    摘要翻译： 用于产生三维体积图像的显示装置包括光路长度调节器，能够对显示面板和聚焦元件之间的物理路径长度进行电光控制，以在定义的成像体积内产生虚像。 调节器改变输入光路和输出光路之间的光路长度，包括：用于选择输入光路上的输入光束的偏振状态的第一偏振开关和具有双折射特性的光学元件，从而至少限定 根据所选择的输入光束的偏振状态使输入光束沿所选择的所述至少两个可能的光路中的一个通过输入光束并用于在所述光输出端上提供输出光束 沿着所选光路行进的路径。