公开(公告)号：US07372058B2

公开(公告)日：2008-05-13

申请号：US11235547

申请日：2005-09-27

申请人： Vadim Yevgenyevich Banine ,  Lambertus Adrianus Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits

发明人： Vadim Yevgenyevich Banine ,  Lambertus Adrianus Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US08598550B2

公开(公告)日：2013-12-03

申请号：US13365758

申请日：2012-02-03

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US20100290015A1

公开(公告)日：2010-11-18

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03F7/20 ,  G02B27/00 ,  G03B27/54 ,  B08B5/00

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US20120140196A1

公开(公告)日：2012-06-07

申请号：US13365758

申请日：2012-02-03

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： B08B3/00 ,  G03B27/54

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US08134136B2

公开(公告)日：2012-03-13

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Johannes Bernardus Ridder ,  Harm-Jan Voorma ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US07767989B2

公开(公告)日：2010-08-03

申请号：US11527728

申请日：2006-09-27

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03B7/20

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US07462851B2

公开(公告)日：2008-12-09

申请号：US11525224

申请日：2006-09-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Robert Rafilevitch Gayazov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H01J65/04

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.

摘要翻译： 基于放电产生辐射源的装置包括阴极和阳极。 在包含两种或更多种物质的合金的材料中产生放电。

公开(公告)号：US20080137050A1

公开(公告)日：2008-06-12

申请号：US11634386

申请日：2006-12-06

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/42 ,  G21K5/00

CPC分类号： H05G2/003 ,  H05G2/005

摘要： A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.

摘要翻译： 公开了一种辐射源，其包括阳极和阴极，其构造和布置成在阳极和阴极之间的放电空间中的物质中产生放电并形成等离子体以产生电磁辐射，阳极和 阴极围绕旋转轴线可旋转地安装，阴极被布置成保持液态金属。 辐射源还包括激活源，其被布置成将能量束引导到液态金属上，以便使部分液态金属蒸发，并且液态金属提供器被布置成提供附加的液态金属，以便补偿液态金属的汽化部分 。

公开(公告)号：US07061574B2

公开(公告)日：2006-06-13

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US20080142736A1

公开(公告)日：2008-06-19

申请号：US11637936

申请日：2006-12-13

申请人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

发明人： Arnoud Cornelis Wassink ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Theodorus Petrus Maria Cadee ,  Vladimir Mihailovitch Krivtsun ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Paul Peter Anna Antonius Brom ,  Wouter Anthon Soer

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。