Method and apparatus for direct probe sensing
    2.
    发明授权
    Method and apparatus for direct probe sensing 失效
    用于直接探针感测的方法和装置

    公开(公告)号:US6096567A

    公开(公告)日:2000-08-01

    申请号:US980595

    申请日:1997-12-01

    IPC分类号: G01R1/06 G01R31/28 H01L21/66

    CPC分类号: G01R31/2831 G01R31/2887

    摘要: An improved method and apparatus for automatically aligning a wafer prober to the bonding pads of a semiconductor device are provided. In one embodiment of one aspect of the invention, a pattern of contact electrodes is located using a low magnification image of a number of contact electrodes. A shape representative of a contact electrode point is then fitted to each of the number of contact electrodes using a high magnification image of the contact electrodes and a centroid of that fitted shape is determined. The position of the centroid is compared to the position of each of the number of pads, and the pads and contact electrodes are moved relative to each other to a position for contact between the pads and contact electrodes. Other aspects and other embodiments are also described.

    摘要翻译: 提供了一种用于将晶片探针自动对准半导体器件的焊盘的改进的方法和装置。 在本发明的一个方面的一个实施例中,使用多个接触电极的低倍率图像来定位接触电极的图案。 然后,使用接触电极的高倍率图像将代表接触电极点的形状拟合到多个接触电极中的每一个上,并确定该拟合形状的质心。 将质心的位置与每个焊盘的位置进行比较,并且焊盘和接触电极相对于彼此移动到焊盘和接触电极之间的接触位置。 还描述了其它方面和其他实施例。