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    SYSTEM AND METHOD FOR FAULT DETECTION AND OPERATIONAL READINESS FOR OPTICAL INSTRUMENTS FOR SEMICONDUCTOR PROCESSES
    2.
    发明公开
    SYSTEM AND METHOD FOR FAULT DETECTION AND OPERATIONAL READINESS FOR OPTICAL INSTRUMENTS FOR SEMICONDUCTOR PROCESSES 审中-公开

    公开(公告)号：US20240019305A1

    公开(公告)日：2024-01-18

    申请号：US18352058

    申请日：2023-07-13

    Applicant: Verity Instruments, Inc.

    Inventor： Andrew Weeks Kueny ,  Mike Whelan

    IPC: G01J3/28

    CPC classification number: G01J3/28

    Abstract: The disclosure recognizes that it is better to not start monitoring a controllable process than to monitor that process with an optical instrument, such as a process controlling instrument/sensor, when that optical instrument is not operating properly. Accordingly, the disclosure relates to novel features for checking that an optical instrument, such as a spectrometer, is working properly before being used to monitor a semiconductor process. In one aspect the disclosure provides a system for evaluation and verification of an operational state of an optical instrument. In one example, the system includes: (1) an integrated light source, (2) an optical sensor for collecting light from the integrated light source, (3) a controller controlling the integrated light source and the optical sensor, and (4) a processor for processing collected optical signal data obtained from the light and deriving a metric indicative of the operational state.

    VERY HIGH RESOLUTION SPECTROMETER FOR MONITORING OF SEMICONDUCTOR PROCESSES
    5.
    发明公开
    VERY HIGH RESOLUTION SPECTROMETER FOR MONITORING OF SEMICONDUCTOR PROCESSES 审中-公开

    公开(公告)号：US20240019302A1

    公开(公告)日：2024-01-18

    申请号：US18352091

    申请日：2023-07-13

    Applicant: Verity Instruments, Inc.

    Inventor： Andrew Weeks Kueny

    IPC: G01J3/02 ,  G01J3/12 ,  G01J3/26

    CPC classification number: G01J3/0208 ,  G01J3/12 ,  G01J3/26 ,  G01J2003/1204 ,  G01J2003/1213

    Abstract: An optical instrument of very high resolution is provided that can be used for monitoring semiconductor processes. Very high resolution may be considered in this application space to be resolutions sufficient to permit resolving of individual molecular rovibrational emission lines. In one example an optical instrument is provided that includes: (1) an optical interface that receives an optical fiber, (2) a narrow band pass filter that filters out a portion of an optical signal received via the optical fiber, (3) optical components that are selectively combined to process at least a portion of the unfiltered optical signal, wherein the optical components include a sensor that receives the unfiltered optical signal, and (4) one or more processors that process electrical signals from the sensor. The optical instrument can be a spectrometer suitable for a process control instrument.

    Method and Apparatus for Monitoring Pulsed Plasma Processes
    7.
    发明申请
    Method and Apparatus for Monitoring Pulsed Plasma Processes 审中-公开
    脉冲等离子体过程监测方法和装置

    公开(公告)号：US20160131587A1

    公开(公告)日：2016-05-12

    申请号：US14509038

    申请日：2014-10-07

    Applicant: Verity Instruments, Inc.

    Inventor： Mark Anthony Meloni ,  Andrew Weeks Kueny ,  Larry Arlos Bullock ,  Tim Charles Michals ,  Christopher David Pylant

    IPC: G01N21/66 ,  H01J37/32

    CPC classification number: G01N21/68 ,  G01N2021/8416 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32926 ,  H01J37/32935 ,  H01J37/32972 ,  H01J37/3299

    Abstract: Emitted light from a pulsed plasma system is detected, amplified and digitized over a plurality of pulse modulation cycles to produce a digitized signal over the plurality of RF modulation periods, each of which contains an amount of random intensity variations. The individual signal periods are then mathematically combined to produce a stable local reference waveform signal that has decreased random intensity variations. One mechanism for creating a stable local reference waveform signal is by subdividing each of the individual signal periods into a plurality of subunits and the mathematically averaging the respective subunits within the modulation period to produce the stable local reference waveform signal for the modulation period. The stable local reference waveform signal can then be compared to other instantaneous waveform signals from the pulsed plasma system, or waveform parameters can be derived using various signal processing techniques such as Fourier analysis.

    Abstract translation: 来自脉冲等离子体系统的发射光在多个脉冲调制周期被检测，放大和数字化，以在多个RF调制周期中产生数字化信号，每个RF调制周期包含一定量的随机强度变化。 然后将各个信号周期数学地组合以产生具有降低的随机强度变化的稳定的局部参考波形信号。 用于产生稳定的局部参考波形信号的一种机制是通过将各个信号周期中的每一个细分为多个子单元，并在调制周期内对各个子单元进行数学平均，以产生用于调制周期的稳定局部参考波形信号。 然后可以将稳定的本地参考波形信号与来自脉冲等离子体系统的其它瞬时波形信号进行比较，或者可以使用诸如傅里叶分析之类的各种信号处理技术来导出波形参数。

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