公开(公告)号：US10763144B2

公开(公告)日：2020-09-01

申请号：US15909265

申请日：2018-03-01

Applicant: Verity Instruments, Inc.

Inventor： Sean Lynes ,  Richard J. Daignault, Jr. ,  Zhiyong Gu ,  Hong Chen

IPC: H01L21/67 ,  H01L21/66 ,  G05B19/00

Abstract: A method of operating a process control system and a process control system are provided by the disclosure. In one embodiment, the process control system includes: (1) an optical sensor configured to monitor a production process within a process chamber and generate optical data therefrom, (2) an operational controller configured to perform critical functions to determine processing conditions of the production process from the optical data, wherein the critical functions are directed by critical function controls, (3) an adaptable management controller configured to provide the critical function controls to the operational controller, wherein the adaptable management controller is hierarchically isolated from the operational controller during the critical functions.

公开(公告)号：US20190273007A1

公开(公告)日：2019-09-05

申请号：US15909265

申请日：2018-03-01

Applicant: Verity Instruments, Inc.

Inventor： Sean Lynes ,  Richard J. Daignault, JR. ,  Zhiyong Gu ,  Hong Chen

IPC: H01L21/67 ,  H01L21/66

Abstract: A method of operating a process control system and a process control system are provided by the disclosure. In one embodiment, the process control system includes: (1) an optical sensor configured to monitor a production process within a process chamber and generate optical data therefrom, (2) an operational controller configured to perform critical functions to determine processing conditions of the production process from the optical data, wherein the critical functions are directed by critical function controls, (3) an adaptable management controller configured to provide the critical function controls to the operational controller, wherein the adaptable management controller is hierarchically isolated from the operational controller during the critical functions.

公开(公告)号：US10365212B2

公开(公告)日：2019-07-30

申请号：US15802286

申请日：2017-11-02

Applicant: Verity Instruments, Inc.

Inventor： Andrew Weeks Kueny ,  Mike Whelan ,  Mark Anthony Meloni ,  John D. Corless ,  Rick Daignault ,  Sean Lynes

IPC: H01J1/00 ,  G01N21/27 ,  G01J3/28 ,  G01J3/443 ,  G01N21/66 ,  H01J37/32 ,  H01L21/68 ,  H01L21/66 ,  H05H1/00 ,  G01N21/73 ,  G01N21/84

Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.

公开(公告)号：US20180136118A1

公开(公告)日：2018-05-17

申请号：US15802286

申请日：2017-11-02

Applicant: Verity Instruments, Inc.

Inventor： Andrew Weeks Kueny ,  Mike Whelan ,  Mark Anthony Meloni ,  John D. Corless ,  Rick Daignault ,  Sean Lynes

IPC: G01N21/27 ,  H01J37/32 ,  G01J3/443 ,  G01J3/28 ,  H01L21/68 ,  G01N21/66 ,  H05H1/00 ,  H01L21/66

CPC classification number: G01N21/274 ,  G01J3/0289 ,  G01J3/0297 ,  G01J3/10 ,  G01J3/2823 ,  G01J3/443 ,  G01N21/66 ,  G01N21/73 ,  G01N2021/8416 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/2482 ,  H01L21/681 ,  H01L22/26 ,  H05H1/0006

Abstract: The disclosure provides an optical calibration device for in-chamber calibration of optical signals associated with a processing chamber, a characterization system for plasma processing chambers, methods of characterizing plasma processing chambers, and a chamber characterizer. In one example, the optical calibration device includes: (1) an enclosure, (2) an optical source located within the enclosure and configured to provide a source light having a continuous spectrum, and (3) optical shaping elements located within the enclosure and configured to form the source light into a calibrating light that approximates a plasma emission during an operation within the processing chamber.