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    LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS, SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD 审中-公开
    光刻设备，基板和器件制造方法

    公开(公告)号：US20130050674A1

    公开(公告)日：2013-02-28

    申请号：US13315912

    申请日：2011-12-09

    申请人： Vitaliy Prosyentsov ,  Johannes Maria Van Benten

    发明人： Vitaliy Prosyentsov ,  Johannes Maria Van Benten

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70575 ,  G03F7/7085 ,  G03F9/7015 ,  G03F9/7088

    摘要： A substrate table with a sensor that includes a block of material provided with a layer of material opaque to radiation. The layer of material has at least one window configured to allow the transmission of the radiation. The sensor includes a wavelength conversion material located at the window, and a waveguide positioned to receive radiation emitted by the wavelength conversion material. The waveguide is embedded in the block of material and configured to guide radiation emitted by the wavelength conversion material through the block of material and towards a detector.

    摘要翻译： 具有传感器的衬底台，该传感器包括具有不透射辐射的材料层的材料块。 材料层具有至少一个被配置为允许辐射传输的窗口。 该传感器包括位于窗口处的波长转换材料和定位成接收由波长转换材料发射的辐射的波导。 波导嵌入在材料块中并且被配置为引导由波长转换材料发射的辐射通过材料块并朝向检测器。

    Method of operating a patterning device and lithographic apparatus
    2.
    发明授权
    Method of operating a patterning device and lithographic apparatus 有权
    操作图案形成装置和光刻装置的方法

    公开(公告)号：US09417533B2

    公开(公告)日：2016-08-16

    申请号：US13306728

    申请日：2011-11-29

    申请人： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van der Wielen

    发明人： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van der Wielen

    IPC分类号： G03B27/42 ,  G03F7/20 ,  G03F1/44

    CPC分类号： G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

    摘要： A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

    摘要翻译： 光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。

    METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    操作设备的方法，平面设备和设备制造方法

    公开(公告)号：US20120133914A1

    公开(公告)日：2012-05-31

    申请号：US13306728

    申请日：2011-11-29

    申请人： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van der Wielen

    发明人： Vitaliy Prosyentsov ,  Willem Jurrianus Venema ,  Kars Zeger Troost ,  Adrianus Martinus Van der Wielen

    IPC分类号： G03B27/42

    CPC分类号： G03F7/705 ,  G03F1/44 ,  G03F7/70133 ,  G03F7/70783 ,  G03F7/70875

    摘要： A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations.

    摘要翻译： 光刻掩模版被照射以将图案转印到基板上，引起由于加热引起的变形。 使用标线的周边部分中的参考标记计算变形，并测量其相对位置随时间的变化。 定义了可以解决方程组的系统以计算每个单元的扩张的多个单元。 在一个实施例中，每个方程将标记对对于沿着连接每对的线（s，s1，s2）的细胞的扩张的位置。 可以通过组合至少一个测量的外围标记和位置之间的单元格的计算的扩张来计算位置的局部位置偏差。 校正可以根据计算结果进行应用。 可以将能量施加到图案形成装置（例如通过热输入或机械致动器）以修改局部位置偏差的分布。

    LITHOGRAPHIC APPARATUS
    6.
    发明申请
    LITHOGRAPHIC APPARATUS 有权
    LITHOGRAPHIC设备

    公开(公告)号：US20090316122A1

    公开(公告)日：2009-12-24

    申请号：US12486458

    申请日：2009-06-17

    申请人： Vitaliy Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

    发明人： Vitaliy Prosyentsov ,  Sanjaysingh Lalbahadoersing ,  Sami Musa ,  Hyun-Woo Lee

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/7085

    摘要： A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.

    摘要翻译： 用于浸入式光刻设备的衬底台被布置成将来自图案形成装置的图案化辐射束投影到衬底上，衬底台被构造成保持衬底并且至少包括用于感测图案化辐射束的传感器，传感器包括 至少部分透射层，其具有面向所述入射辐射束的前侧和与所述前侧相对的后侧，其中，所述后侧设置有至少一个传感器标记，所述传感器标记经受穿过所述层的辐射束。