Abstract:
A method is provided for depositing thin adherent films of high purity titanium dioxide on a substrate. A gaseous mixture of a titanium tetrahalide, hydrogen and oxygen containing a molar excess of hydrogen is passed over a heated substrate surface. The substrate is heated to a temperature between 227*C. and 927*C. and preferably below 600*C. to provide a reaction between the gaseous mixture which results in the formation of an adherent titanium dioxide on the surface of the substrate.
Abstract:
IN SELECTIVE ETCHING BY THE BOMBARDMENT ENHANCE ETCHING RATE (BEER) EFFECT, A METAL LAYER ON THE BON BARDMENT INSULATOR IS USED TO PROVIDE INCREASED ETCH EN HANCEMENT. THE METAL LAYER ALSO MAY SERVE AS AN ELEC TRODE IN BIASING THE STRUCTURE TO PRODUCE A BEAM INDUCE CURRENT FROM WHICH THE APPLIED DOSE IS INDICATED.