公开(公告)号：US06960887B2

公开(公告)日：2005-11-01

申请号：US10359556

申请日：2003-02-07

申请人： Eric J. Strang ,  Wayne L. Johnson ,  Robert G. Hostetler ,  Steven T. Fink

发明人： Eric J. Strang ,  Wayne L. Johnson ,  Robert G. Hostetler ,  Steven T. Fink

IPC分类号： H01J37/32 ,  H01J7/24 ,  H01L21/302 ,  H05B31/26

CPC分类号： H01J37/32449 ,  H01J37/32623 ,  H01J37/32834

摘要： A plasma reactor or vacuum processing apparatus is provided with an orifice plate assembly. The orifice plate assembly includes an upper plate and a lower plate. Each plate is configured with through holes. The upper and lower orifice plates are independently rotatable with respect to each other. The plates are arranged within the vacuum chamber a discharge reactor such that the chuck assembly is disposed within an opening in the orifice plate assembly. The orifice plate assembly is further configured to have a perimeter shape that substantially matches the interior wall shape of vacuum chamber.

摘要翻译： 等离子体反应器或真空处理装置设置有孔板组件。 孔板组件包括上板和下板。 每个板配置有通孔。 上下孔板可独立地相对于彼此旋转。 板在真空室内布置有排放反应器，使得卡盘组件设置在孔板组件的开口内。 孔板组件进一步构造成具有与真空室的内壁形状基本匹配的周边形状。

公开(公告)号：US09587211B2

公开(公告)日：2017-03-07

申请号：US13452442

申请日：2012-04-20

申请人： Wayne L. Johnson ,  Steven T. Fink

发明人： Wayne L. Johnson ,  Steven T. Fink

IPC分类号： C12M1/00 ,  C12M3/00 ,  C12M1/34

CPC分类号： C12M21/02 ,  C12M27/20 ,  C12M31/10 ,  C12M41/00 ,  C12M41/10 ,  C12M41/26 ,  C12M41/32 ,  C12M41/36 ,  C12M43/02

摘要： A photo-bioreactor system for growing and harvesting photosynthetic organisms includes an interior space partitioned into a plurality of independently controlled reactor cells, each stepped downward along a slope from a first elevation to a second elevation, and a light source coupled to each reactor cell and configured to illuminate the photosynthetic organisms with first and second light-emitting surfaces. The system includes a fluid circulation system coupled to the reactor container and configured to force a continuous flow of fluid through the cell passages.

摘要翻译： 用于生长和收获光合生物的光生物反应器系统包括分隔成多个独立控制的反应器单元的内部空间，每个反应器单元沿着从第一高度到第二高度的斜坡逐步向下，以及耦合到每个反应器单元的光源， 被配置为用第一和第二发光表面照射光合生物。 该系统包括流体循环系统，其耦合到反应器容器并且构造成迫使流体连续流过细胞通道。

公开(公告)号：US06949722B2

公开(公告)日：2005-09-27

申请号：US10630783

申请日：2003-07-31

申请人： Eric J. Strang ,  Wayne L. Johnson

发明人： Eric J. Strang ,  Wayne L. Johnson

IPC分类号： H01L21/26 ,  H01L21/00 ,  H01L21/687 ,  H05B3/68

CPC分类号： H01L21/68757 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/68785

摘要： A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating assembly, cooling the substrate to the predetermined temperature using a cooling assembly located such that a thermal conductance region is provided between the heating and cooling assemblies, and adjusting a thermal conductance of the thermal conductance region to aid in heating and cooling of the substrate. The apparatus includes a heating assembly, a cooling assembly located such that a thermal conductance region is provided between the heating and cooling assemblies, and a structure or configuration for adjusting a thermal conductance of the thermal conductance region.

公开(公告)号：US06819053B2

公开(公告)日：2004-11-16

申请号：US10419258

申请日：2003-04-21

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： H01J724

CPC分类号： H01J27/146 ,  H01J27/16

摘要： A high current density, low voltage ion source includes a vacuum chamber. A plasma source induces generation of a plasma within the chamber, or injects a plasma directly into the chamber. A magnetic and electric field cooperate to guide the ions from the plasma region in a beam towards a substrate to be processed by the ions. A method of use of the ion source includes production of an ion beam for processing of a substrate.

摘要翻译： 高电流密度，低电压离子源包括真空室。 等离子体源在室内产生等离子体，或者将等离子体直接注入到室中。 磁场和电场协调以将离子从光束中的等离子体区域引导到衬底以由离子处理。 使用离子源的方法包括制造用于处理衬底的离子束。

公开(公告)号：US06806650B2

公开(公告)日：2004-10-19

申请号：US10218090

申请日：2002-08-14

申请人： Wayne L. Johnson ,  Thomas H. Windhorn

发明人： Wayne L. Johnson ,  Thomas H. Windhorn

IPC分类号： H01J724

CPC分类号： H05H1/0081 ,  G01R19/0053 ,  G01R29/0878 ,  H05H1/0062

摘要： An RF electric field probe device for measuring an RF electric field intensity in a plasma. The device is composed essentially of an electric field sensing unit and an output unit. The electric field sensing unit is composed of a first electro-optical component positionable in the plasma and operable to modulate light as a function of variations of the RF electric field in the plasma at the fundamental frequency and harmonics of the RF electric field, and a first antenna unit electrically coupled to the first component for coupling the first component to the RF electric field. The output unit is coupled to the electric field sensing unit for providing an output signal containing information relating to the magnitude and frequency of the modulation which occurs in the first component. The probe device may be used to map a plasma region by moving the probe device to any selected point in the plasma region.

摘要翻译： 一种RF电场探针装置，用于测量等离子体中的RF电场强度。 该装置主要由电场感测单元和输出单元组成。 电场感测单元由可定位在等离子体中的第一电光部件组成，可用于根据射频电场的基频和谐波等离子体中的RF电场的变化来调制光，并且 电耦合到第一部件的第一天线单元，用于将第一部件耦合到RF电场。 输出单元耦合到电场感测单元，用于提供包含与发生在第一组件中的调制的幅度和频率有关的信息的输出信号。 探针装置可以用于通过将探针装置移动到等离子体区域中的任何选定点来映射等离子体区域。

公开(公告)号：US06790487B2

公开(公告)日：2004-09-14

申请号：US10218029

申请日：2002-08-14

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： C23C1428

CPC分类号： H01J37/32522 ,  H01J37/32082 ,  H01J37/32165 ,  H05H1/46

摘要： A method and apparatus for generating a plasma having a selected electron temperature, by: generating electrical power having components at at least two different frequencies; deriving electromagnetic energy at the at least two different frequencies from the generated electrical power and inductively coupling the derived electromagnetic energy into a region containing an ionizable gas to ionize the gas and create a plasma composed of the resulting ions; and selecting a power level for the electrical power component at each frequency in order to cause the plasma to have the selected electron temperature.

摘要翻译： 一种通过以下方式产生具有所选电子温度的等离子体的方法和装置：产生具有至少两个不同频率的分量的电功率; 在所述至少两个不同频率处从所产生的电功率中导出电磁能量，并且将导出的电磁能感应耦合到包含可电离气体的区域中，以使气体离子化并产生由所得离子组成的等离子体; 并且为了使等离子体具有所选择的电子温度，在每个频率处选择功率分量的功率电平。

公开(公告)号：US06767698B2

公开(公告)日：2004-07-27

申请号：US10204263

申请日：2002-08-20

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： G03F742

CPC分类号： H01L21/31138 ,  C23C16/4586 ,  C23C16/46 ,  H01J2237/3342

摘要： A method and system (100) for the stripping of photoresist layers using an electrostatically shielded RF (ESRF) plasma for the reduction of a crust and then the removal of the softened photoresist in an ESRF plasma. By varying the temperature during the two steps the method and system further provides the processing parameters for the needs of the stripping reaction.

摘要翻译： 一种用于使用静电屏蔽RF（ESRF）等离子体剥离光致抗蚀剂层以减少外壳然后在ESRF等离子体中去除软化的光致抗蚀剂的方法和系统（100）。 通过在两个步骤期间改变温度，方法和系统进一步提供了汽提反应需要的处理参数。

公开(公告)号：US06758948B2

公开(公告)日：2004-07-06

申请号：US10227526

申请日：2002-08-26

申请人： Wayne L. Johnson

发明人： Wayne L. Johnson

IPC分类号： C23C1434

CPC分类号： H01J37/321 ,  C23C14/3407 ,  C23C14/345 ,  C23C14/358 ,  H01J37/34

摘要： A method and apparatus for performing physical vapor deposition of a layer or a substrate, composed of a deposition chamber enclosing a plasma region for containing an ionizable gas; an electromagnetic field generating system surrounding the plasma region for inductively coupling an electromagnetic field into the plasma region to ionize the gas and generate and maintain a high density, low potential plasma; a source of deposition material including a solid target constituting a source of material to be deposited onto the substrate; a unit associated with the target for electrically biasing the target in order to cause ions in the plasma to strike the target and sputter material from the target; and a substrate holder for holding the substrate at a location to permit material sputtered from the target to be deposited on the substrate.

摘要翻译： 一种用于进行由包围用于容纳可电离气体的等离子体区域的沉积室构成的层或基板进行物理气相沉积的方法和装置; 围绕等离子体区域的电磁场产生系统，用于将电磁场感应耦合到等离子体区域中以使气体离子化并产生并保持高密度低电位等离子体; 沉积材料源，包括构成要沉积到基底上的材料源的固体靶; 与所述目标相关联的单元，用于电偏置所述靶，以使所述等离子体中的离子撞击所述靶并从所述靶溅射材料; 以及用于将基板保持在允许从靶溅射的材料沉积在基板上的位置的基板保持器。

公开(公告)号：US06741944B1

公开(公告)日：2004-05-25

申请号：US10031374

申请日：2002-05-22

申请人： Joseph T. Verdeyen ,  Wayne L. Johnson ,  Murray D. Sirkis

发明人： Joseph T. Verdeyen ,  Wayne L. Johnson ,  Murray D. Sirkis

IPC分类号： H01S313

CPC分类号： H01J37/32266 ,  H01J37/32311 ,  H01J37/32935 ,  H01J37/3299

摘要： A system for measuring plasma electon densities (e.g., in the range of 1010 to 1012 cm−3) and for controlling a plasma generator (240). Measurement of the plasma density is essential if plasma-assisted processes, such depositions or etches, are to be adequately controlled using a feedback control. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator (240) to maintain the plasma electron density at a pre-selected value. The system utilizes a frequency stabilization system to lock the frequency of a local oscillator (100) to the resonant frequency of an open microwave resonator (245) when the resonant frequency changes due to the introduction of a plasma within the open resonator. The amplified output voltage of a second microwave discriminator may be used to control a plasma generator (240).

摘要翻译： 用于测量等离子体电离密度（例如，10 10 -10 cm -3 -3）的系统和用于控制等离子体发生器（240）的系统。 如果使用反馈控制充分控制等离子体辅助过程，这种沉积或蚀刻，则等离子体密度的测量是必不可少的。 等离子体测量方法和系统都产生控制电压，该控制电压又控制等离子体发生器（240）以将等离子体电子密度维持在预选值。 当谐振频率由于在开放谐振器内引入等离子体而改变时，系统利用频率稳定系统将本地振荡器（100）的频率锁定到开放式微波谐振器（245）的谐振频率。 第二微波识别器的放大的输出电压可以用于控制等离子体发生器（240）。

公开(公告)号：US07462335B2

公开(公告)日：2008-12-09

申请号：US10259845

申请日：2002-09-30

申请人： Lianjun Liu ,  Wayne L. Johnson

发明人： Lianjun Liu ,  Wayne L. Johnson

IPC分类号： B01J19/12 ,  H05B31/48

CPC分类号： H01J37/32082 ,  C23C16/509 ,  C23C16/52 ,  H01J37/32532 ,  H01J37/32935 ,  H01J37/32972 ,  H01J37/3299 ,  H05H1/0037

摘要： A method of adjusting plasma processing of a substrate in a plasma reactor having an electrode assembly. The method includes the steps of positioning the substrate in the plasma reactor, creating a plasma in the plasma reactor, monitoring optical emissions emanating from a plurality of different regions of the plasma in a direction substantially parallel to the surface of the substrate during plasma processing of the substrate, and determining an integrated power spectrum for each of the different plasma regions and comparing each of the integrated power spectra to a predetermined value. One aspect of the method includes utilizing an electrode assembly having a plurality of electrode segments and adjusting RF power delivered to the one or more electrode segments based on differences in the integrated power spectra from the predetermined value. Another aspect of the invention includes altering the flow of gas to different regions of the plasma in response to differences in the integrated power spectra detected by the fiber optic sensors. Several types of novel electrode assemblies suitable for carrying out the method of the invention are also disclosed.

摘要翻译： 一种在具有电极组件的等离子体反应器中调整衬底的等离子体处理的方法。 该方法包括以下步骤：将衬底定位在等离子体反应器中，在等离子体反应器中产生等离子体，在等离子体处理期间在基本上平行于衬底的表面的方向上监测从等离子体的多个不同区域发出的光发射 并且确定每个不同等离子体区域的综合功率谱，并将每个积分功率谱与预定值进行比较。 该方法的一个方面包括利用具有多个电极段的电极组件，并且基于来自预定值的积分功率谱的差异来调节传递到一个或多个电极段的RF功率。 本发明的另一方面包括响应于由光纤传感器检测到的积分功率谱的差异，改变气体流到等离子体的不同区域。 还公开了适用于实施本发明方法的几种类型的新型电极组件。