公开(公告)号：US20170231077A1

公开(公告)日：2017-08-10

申请号：US15400129

申请日：2017-01-06

Applicant: Peter J. Morrisroe

Inventor： Peter J. Morrisroe

IPC: H05H1/30 ,  H01J49/04 ,  H05H1/00

CPC classification number: H05H1/30 ,  H01J49/04 ,  H05H1/0037

Abstract: Certain embodiments described herein are directed to devices, systems and methods that comprise asymmetric induction devices. In some instances, the device can include a plurality of plate electrodes which can be spaced asymmetrically or a plurality of coils which can be spaced asymmetrically.

公开(公告)号：US20140264000A1

公开(公告)日：2014-09-18

申请号：US14074824

申请日：2013-11-08

Applicant: Thermo Electron Manufacturing Limited

Inventor： Stephen HARTWELL

IPC: H01J37/244 ,  H01J49/26 ,  G01J3/443 ,  H01J37/08

CPC classification number: H01J37/244 ,  G01J3/443 ,  G01J2003/4435 ,  H01J27/16 ,  H01J37/08 ,  H01J37/32972 ,  H01J37/3299 ,  H01J49/105 ,  H01J49/26 ,  H05H1/0037

Abstract: A method of and apparatus for controlling the temperature of an inductively coupled or microwave induced plasma for optical emission spectrometry or mass spectrometry in which the intensities of two spectral lines of radiation emitted by the plasma are measured, and the power provided to sustain the plasma is adjusted so that the ratio of the intensities remains substantially constant.

Abstract translation: 用于控制用于光发射光谱或质谱的电感耦合或微波感应等离子体的温度的方法和装置，其中测量由等离子体发射的两束辐射谱线的强度，并且提供用于维持等离子体的功率为 调节使得强度比保持基本恒定。

公开(公告)号：US20090051915A1

公开(公告)日：2009-02-26

申请号：US11887797

申请日：2006-03-30

Applicant: Manuel Hertter ,  Joerg Hoeschele ,  Stefan Schneiderbanger ,  Juergen Steinwandel

Inventor： Manuel Hertter ,  Joerg Hoeschele ,  Stefan Schneiderbanger ,  Juergen Steinwandel

IPC: G01J3/443

CPC classification number: H05H1/0037 ,  H05H1/0025

Abstract: An arrangement for measuring characteristic properties of a plasma beam in a thermal spray process, including a device for introducing spray materials into the plasma, a one-dimensional or two-dimensional array including first optical waveguides for receiving the light radiation emitted by the plasma, and other optical waveguides for distributing the light radiation emitted by the plasma. A device is provided for splitting the light guided in the first optical waveguides into the other optical wave guides, one optical waveguide being connected to the opening diaphragm of a particle flow arrangement, and the other optical waveguide being connected to the opening diaphragm of a spectrometer. A device is also provided for determining the current state of the spray process.

Abstract translation: 一种用于在热喷涂工艺中测量等离子体束的特性的装置，包括用于将喷射材料引入等离子体的装置，包括用于接收等离子体发射的光辐射的第一光波导的一维或二维阵列， 以及用于分配等离子体发射的光辐射的其它光波导。 提供了一种用于将在第一光波导中引导的光分成另一个光波导的装置，一个光波导连接到粒子流布置的开口振膜，另一个光波导连接到光谱仪的开口振膜 。 还提供了用于确定喷雾过程的当前状态的装置。

公开(公告)号：US06943879B2

公开(公告)日：2005-09-13

申请号：US09986656

申请日：2001-11-09

Applicant: Juichiro Ukon ,  Yves Danthez

Inventor： Juichiro Ukon ,  Yves Danthez

IPC: G01N27/62 ,  G01J3/443 ,  G01N21/73 ,  H01J49/10 ,  H05H1/00 ,  G01J3/30

CPC classification number: G01J3/443 ,  G01N21/73 ,  H01J49/105 ,  H05H1/0037

Abstract: A method for monitoring and/or controlling the positioning and/or condition of a plasma in a plasma spectrometer, which comprises: acquiring image data of the plasma through a video-camera (7), and a) displaying on a display device (10) a plasma image from the acquired image data; and/or b) storing the image data in a computer unit (9). Application to inductively coupled high frequency plasma optical emission and mass spectrometers.

Abstract translation: 一种用于监测和/或控制等离子体光谱仪中的等离子体的定位和/或状态的方法，包括：通过摄像机（7）获取等离子体的图像数据，以及a）在显示装置（10）上显示 ）来自所获取的图像数据的等离子体图像; 和/或b）将图像数据存储在计算机单元（9）中。 应用于电感耦合高频等离子体发射和质谱仪。

公开(公告)号：US06797939B2

公开(公告)日：2004-09-28

申请号：US10219816

申请日：2002-08-16

Applicant: Erwin Bayer ,  Jörg Höschele ,  Stefan Schneiderbanger ,  Jürgen Steinwandel

Inventor： Erwin Bayer ,  Jörg Höschele ,  Stefan Schneiderbanger ,  Jürgen Steinwandel

IPC: G01J350

CPC classification number: C23C4/12 ,  H01J37/32972 ,  H05H1/0037

Abstract: A method for measuring characteristic properties of a plasma beam in a thermal spraying process, wherein the spraying materials are fed into the plasma (1) and the luminous radiation emitted by the plasma (1) is reproduced on optical fibers (2). The luminous radiation is reproduced on the one end (2a) of the optical fibers (2) arranged in a one-dimensional or two-dimensional array (6). Spectral analysis of the luminous radiation transmitted in the optical fiber (2) is accomplished with a spectrometer (3) arranged at the other end (2b) of an optical fiber (2). The frequency spectrums are analyzed in a processor (5) to determine the contemporaneous condition of the spraying process.

Abstract translation: 一种用于在热喷涂工艺中测量等离子体束的特性的方法，其中喷射材料被馈送到等离子体（1）中，并且由等离子体（1）发射的发光被再现在光纤（2）上。 在以一维或二维阵列（6）布置的光纤（2）的一端（2a）上再现发光。 在光纤（2）中发射的发光的光谱分析是通过布置在光纤（2）的另一端（2b）处的光谱仪（3）完成的。 在处理器（5）中分析频谱以确定喷雾过程的同时期条件。

公开(公告)号：US20040173309A1

公开(公告)日：2004-09-09

申请号：US10377826

申请日：2003-03-04

Inventor： Go Miya ,  Hiroyuki Kitsunai ,  Junichi Tanaka ,  Toshio Masuda ,  Hideyuki Yamamoto

IPC: C23F001/00

CPC classification number: G01N21/73 ,  H01J37/32935 ,  H01J37/32963 ,  H01L21/67253 ,  H05H1/0037

Abstract: In a plasma processing apparatus including: a process chamber 3; a light-receiving part 11 for receiving a plasma emission; a spectrometer unit 13 for performing a spectrometry on the plasma emission to convert the same into a multi-channel signal; a signal converting unit 14 for converting the multi-channel signal into one signal using a filter vector stored in a database 15; and a processing unit 16 for determining a condition in the process chamber based on the resulting signal, the condition in the process chamber is determined in such a manner that differences between principal component scores derived from plasma emission data on a lot of substrates by multivariate analysis and principal component scores for the preceding lot of substrates are found, an average value of the differences in one lot, a difference between a maximum and a minimum of the differences in one lot and a standard deviation of the differences in one lot are determined, and the values are compared with a preset threshold.

Abstract translation: 一种等离子体处理装置，包括：处理室3; 用于接收等离子体发射的光接收部分11; 用于对等离子体发射进行光谱测定以将其转换为多通道信号的光谱仪单元13; 信号转换单元14，用于使用存储在数据库15中的滤波器向量将多声道信号转换成一个信号; 以及处理单元16，用于基于所得到的信号来确定处理室中的状态，处理室中的条件以这样的方式确定，即通过多变量分析从大量基板上的等离子体发射数据得出的主成分分数之间的差异 并且发现前一批基板的主成分分数，确定一批中的差异的平均值，一批中的差异的最大值和最小值之间的差异以及一批中的差异的标准偏差， 并将这些值与预设阈值进行比较。

公开(公告)号：US20020096632A1

公开(公告)日：2002-07-25

申请号：US09988339

申请日：2001-11-19

Inventor： Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

IPC: H01J049/44 ,  H01J037/256 ,  G01N023/08

CPC classification number: G01N23/2251 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/262 ,  H01J2237/2802 ,  H05H1/0037

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract translation: 电子束检测器检测光谱的峰值，并且当峰值位置偏离电子束检测器上的参考位置时，使用用于控制电子束检测器上的电子束位置的控制器来校正偏差。 测量电子能量损失谱，同时控制校正电子束在样本上的位置与光谱的峰值位置之间的偏差，以及用电子束检测器测量的光谱。

公开(公告)号：US06023329A

公开(公告)日：2000-02-08

申请号：US119335

申请日：1998-07-20

Applicant: Ole Trinks ,  Walter Beck

Inventor： Ole Trinks ,  Walter Beck

IPC: G01J3/42 ,  G01N21/31 ,  G01P5/26 ,  H05H1/00 ,  G01J3/30 ,  G01B9/02

CPC classification number: G01J3/42 ,  G01N21/3103 ,  G01P5/26 ,  H05H1/0037

Abstract: A method and an apparatus determines at least one parameter of a material flow. The parameter is for example temperature, pressure or velocity of the gas or plasma flow. The material flow is either a gas or a plasma flow. The method and the apparatus are utilizing atomic absorption spectroscopy and feed a Rubidium compound into the gas or plasma flow, in which the Rubidium compound dissociates into Rubidium atoms. The Rubidium atoms are stimulated with a first laser beam and a first transmitted laser intensity is detected. First absorption lines are determined from the first transmitted laser intensity. Rubidium atoms are stimulated with a second laser beam, a second transmitted reference laser intensity is detected and second reference absorption lines are determined from the second transmitted reference laser intensity. Finally, at least one parameter of the gas or plasma flow is determined from the comparison of the first absorption lines and the second reference absorption lines of the Rubidium atoms.

Abstract translation: 方法和装置确定材料流的至少一个参数。 该参数例如是气体或等离子体流的温度，压力或速度。 材料流是气体或等离子体流。 该方法和装置利用原子吸收光谱法并将铷化合物进料到气体或等离子体流中，其中铷化合物分解成铷原子。 用第一激光束刺激铷原子，并检测第一透射激光强度。 从第一次发射的激光强度确定第一吸收线。 用第二激光束刺激铷原子，检测第二透射参考激光强度，并从第二透射参考激光强度确定第二参考吸收线。 最后，从铷原子的第一吸收线和第二参考吸收线的比较确定气体或等离子体流的至少一个参数。

公开(公告)号：US20240179826A1

公开(公告)日：2024-05-30

申请号：US18553417

申请日：2022-03-30

Applicant: Edwards Limited

Inventor： Gary Peter Knight ,  Erik Wagenaars ,  Neil Condon ,  Simone Magni

IPC: H05H1/34 ,  H05H1/00

CPC classification number: H05H1/3425 ,  H05H1/0037

Abstract: Aspects relate to monitorable plasma torch device components and in particular to monitoring and predictive maintenance of one or more such monitorable plasma torch device components. One aspect provides a monitorable plasma torch device component, the component comprising: a component body and a sacrificial component located in an erosion zone of the component body. The sacrificial component comprises material which differs from the plasma torch device component body and which, on exposure to a plasma torch in a plasma torch device, generates electromagnetic radiation distinct from that of the plasma torch device component body. The distinct electromagnetic radiation generated is indicative of erosion of the monitorable plasma torch device component in the erosion zone. Such a monitorable plasma torch device component can facilitate effective component monitoring which allows for ameliorative action to be taken in the event that degradation of the device component is detected.

公开(公告)号：US11800627B2

公开(公告)日：2023-10-24

申请号：US17255034

申请日：2019-06-25

Applicant: Ruhr-Universität Bochum

Inventor： Dennis Pohle ,  Christian Schulz ,  Ilona Rolfes

IPC: H05H1/00 ,  H01J37/32

CPC classification number: H05H1/0037 ,  H01J37/32935 ,  H01J37/32972

Abstract: A probe for measuring plasma parameters by means of active plasma resonance spectroscopy comprises an external coupling, a balun, an internal coupling, and a probe head. It is provided that the couplings, the balun, and the probe head are integrated in an electrically-insulating substrate cylinder, and the substrate cylinder has a layered structure made from multiple substrate layers along its rotational axis. In this way, a probe for measuring plasma parameters is provided which enables an improved measurement of the plasma parameters, wherein the plasma is influenced as little as possible during the measurement of the plasma parameters.