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1.发明申请METHOD AND APPARATUS FOR ACTIVE PARTICLE AND CONTAMINANT REMOVAL IN WET CLEAN PROCESSES IN SEMICONDUCTOR MANUFACTURING 审中-公开在半导体制造中的清洁过程中主动颗粒和污染物去除的方法和装置公开(公告)号：US20080135070A1
公开(公告)日：2008-06-12
申请号：US11609843
申请日：2006-12-12
申请人： Wei Lu , Jianshe Tang , Alexander Sou-Kang Ko , Nelson A. Yee , Bo Xie , Tseng-Chung Lee
发明人： Wei Lu , Jianshe Tang , Alexander Sou-Kang Ko , Nelson A. Yee , Bo Xie , Tseng-Chung Lee
IPC分类号： B08B3/02
CPC分类号： B08B3/02 , B05B7/0861 , H01L21/67051
摘要： An apparatus and a method for cleaning a wafer are described. A chamber has a substrate support. A nozzle is disposed above the substrate support to spray de-ionized water droplets. The nozzle is coupled to a source of de-ionized water and a source of nitrogen. The nozzle is configured to mix the de-ionized water and the nitrogen outside the nozzle to have independent flow rate control of the two fluids for an optimized atomization in terms of spray uniformity in droplet size and velocity distributions. The nozzle to wafer distance can be adjusted and tuned to have an optimized jet spray for efficiently removing particles or contaminants from a surface of a wafer without causing any feature damage.
摘要翻译： 描述了用于清洁晶片的装置和方法。 室具有基板支撑。 喷嘴设置在基板支架上方以喷射去离子水滴。 喷嘴连接到去离子水源和氮源。 喷嘴构造成将去离子水和喷嘴外部的氮混合以具有独立的流速控制两种流体，以便在液滴尺寸和速度分布中的喷雾均匀性方面实现优化的雾化。 喷嘴到晶片间距可以被调节和调整以具有优化的喷射喷雾，以有效地从晶片表面去除颗粒或污染物，而不会造成任何特征损坏。
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2.发明申请Method and apparatus for active particle and contaminant removal in wet clean processes in semiconductor manufacturing 审中-公开在半导体制造中的湿法清洁工艺中的活性颗粒和污染物去除的方法和装置公开(公告)号：US20080135069A1
公开(公告)日：2008-06-12
申请号：US11977935
申请日：2007-10-25
申请人： Wei Lu , Jianshe Tang , Alexander Sou-Kang Ko , Nelson A. Yee , Bo Xie , Tseng-Chung Lee
发明人： Wei Lu , Jianshe Tang , Alexander Sou-Kang Ko , Nelson A. Yee , Bo Xie , Tseng-Chung Lee
CPC分类号： B08B3/02 , B05B7/0861 , H01L21/67051
摘要： An apparatus and a method for cleaning a wafer are described. A chamber has a substrate support. A nozzle is disposed above the substrate support to spray de-ionized water droplets. The nozzle is coupled to a source of de-ionized water and a source of nitrogen. The nozzle is configured to mix the de-ionized water and the nitrogen outside the nozzle to have independent flow rate control of the two fluids for an optimized atomization in terms of spray uniformity in droplet size and velocity distributions. The nozzle to wafer distance can be adjusted and tuned to have an optimized jet spray for efficiently removing particles or contaminants from a surface of a wafer without causing any feature damage.
摘要翻译： 描述了用于清洁晶片的装置和方法。 室具有基板支撑。 喷嘴设置在基板支架上方以喷射去离子水滴。 喷嘴连接到去离子水源和氮源。 喷嘴构造成将去离子水和喷嘴外部的氮混合以使得两个流体具有独立的流速控制，以便在液滴尺寸和速度分布的喷雾均匀性方面优化雾化。 喷嘴到晶片间距可以被调节和调整以具有优化的喷射喷雾，以有效地从晶片表面去除颗粒或污染物，而不会造成任何特征损坏。
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公开(公告)号：US20080230092A1
公开(公告)日：2008-09-25
申请号：US11690405
申请日：2007-03-23
申请人： Alexander Sou-Kang Ko , Jianshe Tang , Brian J. Brown , Richard R. Endo , Steven Verhaverbeke , Cole Franklin , Dennis J. Yost , Runzi Chang
发明人： Alexander Sou-Kang Ko , Jianshe Tang , Brian J. Brown , Richard R. Endo , Steven Verhaverbeke , Cole Franklin , Dennis J. Yost , Runzi Chang
IPC分类号： B08B3/00
CPC分类号： B08B7/00 , B08B3/024 , B08B3/08 , H01L21/67051
摘要： A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially uniform static liquid layer over a substrate surface by atomizing the viscous liquid with an inert gas in a two-phase nozzle. In another embodiment of the present invention, after a layer of the cleaning solution is formed over the substrate to be cleaned, acoustic energy is applied to the substrate to improve the cleaning efficiency. In a further embodiment, cleaning solution precipitates are avoided by dispensing de-ionized water with a spray nozzle to gradually dilute the cleaning solution prior to dispensing de-ionized water with a stream nozzle.
摘要翻译： 对单基板清洗装置及其使用方法进行说明。 在本发明的一个实施例中，通过在两相喷嘴中用惰性气体雾化粘性液体，以小体积分配液体清洗溶液以在基板表面上形成基本均匀的静态液体层。 在本发明的另一个实施方案中，在将清洁溶液层形成在要清洁的基底上之后，将声能施加到基底以提高清洁效率。 在另一个实施方案中，通过用喷嘴分配去离子水以在用流喷嘴分配去离子水之前逐渐稀释清洁溶液来避免清洁溶液沉淀物。
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公开(公告)号：US20090145760A1
公开(公告)日：2009-06-11
申请号：US11953357
申请日：2007-12-10
CPC分类号： C25D15/02 , C25D7/12 , C25D13/22 , C25D17/00 , C25D17/001 , H01L31/022425 , H01L31/18 , Y02E10/50
摘要： Embodiments of the invention provide a novel apparatus and methods for forming a contact structure having metal lines formed using an electrophoretic deposition process. A substrate having a conductive or semiconductive layer is covered with an insulating layer and patterned to expose the conductive or semiconductive layer. The substrate is exposed to a processing medium comprising charged particles immersed in a dielectric fluid. An electric field is optionally applied. The charged particles deposit onto the exposed portions of the substrate and are then solidified in a reflow process.
摘要翻译： 本发明的实施例提供一种用于形成具有使用电泳沉积工艺形成的金属线的接触结构的新型设备和方法。 具有导电或半导体层的衬底被绝缘层覆盖并被图案化以暴露导电或半导体层。 将基底暴露于包含浸入介电流体中的带电粒子的处理介质。 可选地施加电场。 带电粒子沉积到衬底的暴露部分上，然后在回流过程中固化。
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公开(公告)号：US06691719B2
公开(公告)日：2004-02-17
申请号：US09759390
申请日：2001-01-12
IPC分类号： B08B302
CPC分类号： H01L21/67051 , B05B15/62 , B08B3/02
摘要： A method and an apparatus is provided that may fix a point at which an etchant or a fluid sprayed from a nozzle impacts a substrate. By fixing a first angle measured between the inventive nozzle and a substrate support and fixing a process height of a nozzle relative to a substrate support, a second angle, measured between a fluid sprayed from the nozzle and a line tangent to a substrate support, may vary without affecting the fluid impact point.
摘要翻译： 提供了一种方法和装置，其可以固定从喷嘴喷射的蚀刻剂或流体撞击基底的点。 通过固定在本发明的喷嘴和基板支撑件之间测量的第一角度并且固定喷嘴相对于基板支撑件的处理高度，在从喷嘴喷射的流体和与基板支撑件相切的直线之间测量的第二角度可以 改变而不影响流体冲击点。
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公开(公告)号：US06688155B2
公开(公告)日：2004-02-10
申请号：US10334301
申请日：2002-12-31
IPC分类号： B65G6500
CPC分类号： H01L21/67259 , B08B3/02 , H01L21/67051 , H01L21/67253
摘要： In one aspect, a spin-rinse-dry chamber comprises an adjustable nozzle. A calibration element may be positioned in the spin-rinse-dry chamber at which the adjustable nozzle may be directed. Targets (for example cross-hairs in one embodiment) may be located on the calibration element at a position corresponding to where it is desired to direct a fluid flow from the adjustable nozzle. Another aspect provides a method of calibrating a spin-rinse-dry chamber having an adjustable nozzle comprising inserting a calibration element having a similar contour as a substrate into the spin-rinse-dry chamber. Fluid is then directed through the adjustable nozzle at a selected target position located on the surface of the calibration element.
摘要翻译： 一方面，旋转漂洗干燥室包括可调喷嘴。 校准元件可以定位在可旋转冲洗干燥室中，可调节喷嘴可以在该冲洗干燥室中被引导。 目标（例如一个实施例中的交叉毛发）可以位于对应于期望从可调节喷嘴引导流体流的地方的校准元件上。 另一方面提供了一种校准具有可调节喷嘴的旋转冲洗干燥室的方法，包括将具有与基底相似的轮廓的校准元件插入旋转漂洗干燥室中。 然后将流体引导到位于校准元件表面上的选定目标位置处的可调节喷嘴。
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公开(公告)号：US08216441B2
公开(公告)日：2012-07-10
申请号：US11953357
申请日：2007-12-10
IPC分类号： C25D1/12
CPC分类号： C25D15/02 , C25D7/12 , C25D13/22 , C25D17/00 , C25D17/001 , H01L31/022425 , H01L31/18 , Y02E10/50
摘要： Embodiments of the invention provide a novel apparatus and methods for forming a contact structure having metal lines formed using an electrophoretic deposition process. A substrate having a conductive or semiconductive layer is covered with an insulating layer and patterned to expose the conductive or semiconductive layer. The substrate is exposed to a processing medium comprising charged particles immersed in a dielectric fluid. An electric field is optionally applied. The charged particles deposit onto the exposed portions of the substrate and are then solidified in a reflow process.
摘要翻译： 本发明的实施例提供一种用于形成具有使用电泳沉积工艺形成的金属线的接触结构的新型设备和方法。 具有导电或半导体层的衬底被绝缘层覆盖并被图案化以暴露导电或半导体层。 将基底暴露于包含浸入介电流体中的带电粒子的处理介质。 可选地施加电场。 带电粒子沉积到衬底的暴露部分上，然后在回流过程中固化。
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公开(公告)号：US20120001967A1
公开(公告)日：2012-01-05
申请号：US13175826
申请日：2011-07-02
申请人： Conor Francis Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Robert B. Lowrance , Christopher Buchner
发明人： Conor Francis Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Robert B. Lowrance , Christopher Buchner
CPC分类号： B41J2/0057
摘要： The disclosure generally relates to a method and apparatus for printing from a rotating source. In an exemplary embodiment, the disclosure relates to a facetted drum for simultaneously printing multiple pixels. The facetted drum includes a support structure and a plurality of printheads affixed to the support structure, each printhead having at least one microporous structure for receiving a first quantity of liquid ink having dissolved or suspended film material in a carrier fluid and dispensing a second quantity of ink material substantially free of the carrier fluid. The plurality of printheads are positioned proximal to a substrate to simultaneously print a plurality of spatially-discrete and image-resolved pixels on the substrate.
摘要翻译： 本公开总体上涉及一种用于从旋转源打印的方法和装置。 在示例性实施例中，本公开涉及用于同时打印多个像素的刻面滚筒。 所述多面体滚筒包括支撑结构和固定到所述支撑结构的多个打印头，每个打印头具有至少一个微孔结构，用于接收在载体流体中具有溶解或悬浮的薄膜材料的第一量的液体油墨并且分配第二量 油墨基本上不含载体流体。 多个打印头位于基板的近侧，以在基板上同时打印多个空间离散和图像分辨的像素。
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公开(公告)号：US20110008541A1
公开(公告)日：2011-01-13
申请号：US12772184
申请日：2010-05-01
CPC分类号： C23C16/042 , C23C14/04 , C23C14/12 , C23C14/228 , C23C14/24 , H01L51/0008 , H01L51/0011 , H01L51/0013 , H01L51/56
摘要： In one embodiment, the disclosure relates to providing a first gas stream carrying vaporized material and depositing the vaporized material onto a substrate by directing a plurality of gas streams containing the vaporized material to a substrate, forming an gas curtain around the streams to prevent its dissemination beyond a target print area, and allowing the vaporized material to condense on the target print area. In another embodiment, heat is used to regulate the flow of the material and the thickness of the deposited layer.
摘要翻译： 在一个实施方案中，本公开涉及提供携带蒸发的材料的第一气流并通过将包含蒸发的材料的多个气流引导到基底上将气化的材料沉积到基底上，在流周围形成气幕以防止其散布 超出目标打印区域，并允许蒸发的材料在目标打印区域上冷凝。 在另一个实施例中，使用热来调节材料的流动和沉积层的厚度。
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公开(公告)号：US08632145B2
公开(公告)日：2014-01-21
申请号：US13175826
申请日：2011-07-02
申请人： Conor Francis Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Robert B. Lowrance , Christopher Buchner
发明人： Conor Francis Madigan , Eliyahu Vronsky , Alexander Sou-Kang Ko , Robert B. Lowrance , Christopher Buchner
IPC分类号： B41J29/38
CPC分类号： B41J2/0057
摘要： The disclosure generally relates to a method and apparatus for printing from a rotating source. In an exemplary embodiment, the disclosure relates to a facetted drum for simultaneously printing multiple pixels. The facetted drum includes a support structure and a plurality of printheads affixed to the support structure, each printhead having at least one microporous structure for receiving a first quantity of liquid ink having dissolved or suspended film material in a carrier fluid and dispensing a second quantity of ink material substantially free of the carrier fluid. The plurality of printheads are positioned proximal to a substrate to simultaneously print a plurality of spatially-discrete and image-resolved pixels on the substrate.
摘要翻译： 本公开总体上涉及一种用于从旋转源打印的方法和装置。 在示例性实施例中，本公开涉及用于同时打印多个像素的刻面滚筒。 所述多面体滚筒包括支撑结构和固定到所述支撑结构的多个打印头，每个打印头具有至少一个微孔结构，用于接收在载体流体中具有溶解或悬浮的薄膜材料的第一量的液体油墨并且分配第二量 油墨基本上不含载体流体。 多个打印头位于基板的近侧，以在基板上同时打印多个空间离散和图像分辨的像素。
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