Sputter target/backing plate assembly and method of making same
    4.
    发明授权
    Sputter target/backing plate assembly and method of making same 有权
    溅射靶/背板组件及其制造方法

    公开(公告)号:US06183613B2

    公开(公告)日:2001-02-06

    申请号:US09226792

    申请日:1999-01-07

    IPC分类号: C23C1434

    CPC分类号: C23C14/3407

    摘要: A method of forming a sputter target/backing plate assembly comprises the steps of: providing a target fabricated from a first material having a coefficient of thermal expansion; providing a backing plate fabricated from a second material having a coefficient of thermal expansion; providing a block fabricated from a third material having a coefficient of thermal expansion; positioning the block on one side of the backing plate; positioning the target on the other side of the backing plate; and subjecting the target, backing plate and block to elevated temperature and pressure to bond the target, backing plate and block together. The third material is selected so as to have a coefficient of thermal expansion which counteracts the effects of the coefficients of thermal expansion of the first and second materials. The third material may be selected so as to have a coefficient of thermal expansion which is approximately the same as the coefficient of thermal expansion of the first material.

    摘要翻译: 形成溅射靶/背板组件的方法包括以下步骤:提供由具有热膨胀系数的第一材料制成的靶; 提供由具有热膨胀系数的第二材料制成的背板; 提供由具有热膨胀系数的第三材料制成的块; 将块定位在背板的一侧; 将目标定位在背板的另一侧; 并对目标,背板和块进行升高的温度和压力以将目标,背板和块结合在一起。 选择第三材料以具有抵消第一和第二材料的热膨胀系数的影响的热膨胀系数。 可以选择第三材料以具有与第一材料的热膨胀系数近似相同的热膨胀系数。

    Method of making unreacted metal/aluminum sputter target
    5.
    发明授权
    Method of making unreacted metal/aluminum sputter target 失效
    制备未反应的金属/铝溅射靶的方法

    公开(公告)号:US6010583A

    公开(公告)日:2000-01-04

    申请号:US926375

    申请日:1997-09-09

    摘要: A high performance, high density sputtering target and a method of making. An aluminum and non-aluminum reactive metal powder blend is subjected to cold pressing under pressure, machining, evacuating, and hot pressing under pressure. The aluminum and non-aluminum metal react directly to yield a high performance, high density sputter target containing greater than about 2% aluminum with substantially uniform composition across the body.

    摘要翻译: 高性能,高密度溅射靶和制造方法。 铝和非铝反应性金属粉末混合物在压力下进行冷压,机械加工,抽真空,并在压力下热压。 铝和非铝金属直接反应以产生包含大于约2%铝的高性能,高密度溅射靶,其在整个身体上具有基本均匀的组成。

    Ceramic heating elements
    8.
    发明申请
    Ceramic heating elements 审中-公开
    陶瓷加热元件

    公开(公告)号:US20070295708A1

    公开(公告)日:2007-12-27

    申请号:US11800168

    申请日:2007-05-04

    IPC分类号: F23Q7/00

    摘要: New methods are provided or manufacture ceramic resistive igniter elements that include sintering of the elements in the absence of substantially elevated pressures. Ceramic igniters also are provided that are obtainable from fabrication methods of the invention.

    摘要翻译: 提供新的方法或制造陶瓷电阻式点火器元件,其包括在没有显着升高的压力的情况下烧结元件。 还提供了可从本发明的制造方法获得的陶瓷点火器。

    Ceramic igniter
    10.
    发明授权
    Ceramic igniter 有权
    陶瓷点火器

    公开(公告)号:US07675005B2

    公开(公告)日:2010-03-09

    申请号:US11261421

    申请日:2005-10-28

    IPC分类号: F23Q7/22 F23Q7/00

    摘要: New ceramic resistive igniter elements are provided that comprise a first conductive zone, a resistive hot zone, and a second conductive zone, all in electrical sequence. In preferred igniters, at least a substantial portion of the first conductive zone does not contact a ceramic insulator. Preferred igniters of the invention have a rounded cross-sectional shape for at least a portion of the igniter length.

    摘要翻译: 提供新的陶瓷电阻点火器元件,其包括电连续的第一导电区域,电阻热区域和第二导电区域。 在优选的点火器中,第一导电区的至少大部分不接触陶瓷绝缘体。 本发明的优选点火器对于点火器长度的至少一部分具有圆形横截面形状。