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    Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
    2.
    发明授权
    Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel 有权
    具有介电真空容器的环形低场反应气体和等离子体源

    公开(公告)号：US07501600B2

    公开(公告)日：2009-03-10

    申请号：US11058620

    申请日：2005-02-15

    申请人： William M. Holber ,  Xing Chen ,  Andrew B. Cowe ,  Matthew M. Besen ,  Ronald W. Collins, Jr. ,  Susan C. Trulli ,  Shouqian Shao

    发明人： William M. Holber ,  Xing Chen ,  Andrew B. Cowe ,  Matthew M. Besen ,  Ronald W. Collins, Jr. ,  Susan C. Trulli ,  Shouqian Shao

    IPC分类号： B23K10/00

    CPC分类号： H01J37/32357 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32522

    摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

    摘要翻译： 描述了等离子体点火和冷却装置和等离子体系统的方法。 装置可以包括容器和与容器相邻的至少一个点火电极。 所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。 该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。 一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。 气体在通道中被点燃，而流量的剩余部分被引导离开通道。

    Method and apparatus for processing metal bearing gases
    4.
    发明授权
    Method and apparatus for processing metal bearing gases 失效
    处理金属轴承气体的方法和装置

    公开(公告)号：US08779322B2

    公开(公告)日：2014-07-15

    申请号：US13336616

    申请日：2011-12-23

    申请人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    发明人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    IPC分类号： B23K10/00 ,  H01H1/34

    CPC分类号： H01J37/32174 ,  H01J37/321

    摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

    摘要翻译： 用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。 将金属轴承气体引入到等离子体室中以与环形等离子体反应。 环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

    Method and Apparatus for Processing Metal Bearing Gases
    5.
    发明申请
    Method and Apparatus for Processing Metal Bearing Gases 失效
    金属轴承气体加工方法与装置

    公开(公告)号：US20120160059A1

    公开(公告)日：2012-06-28

    申请号：US13336616

    申请日：2011-12-23

    申请人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    发明人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    IPC分类号： C22B4/00 ,  B01J19/08

    CPC分类号： H01J37/32174 ,  H01J37/321

    摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

    摘要翻译： 用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。 将金属轴承气体引入到等离子体室中以与环形等离子体反应。 环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

    Method and Apparatus for Processing Metal Bearing Gases
    6.
    发明申请
    Method and Apparatus for Processing Metal Bearing Gases 有权
    金属轴承气体加工方法与装置

    公开(公告)号：US20090288772A1

    公开(公告)日：2009-11-26

    申请号：US12511785

    申请日：2009-07-29

    申请人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    发明人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    IPC分类号： C23C16/54

    CPC分类号： H01J37/32174 ,  H01J37/321 ,  H05H1/46 ,  H05H2001/4667

    摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

    摘要翻译： 用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。 将金属轴承气体引入到等离子体室中以与环形等离子体反应。 环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

    Method and apparatus for processing metal bearing gases
    7.
    发明授权
    Method and apparatus for processing metal bearing gases 有权
    处理金属轴承气体的方法和装置

    公开(公告)号：US07569790B2

    公开(公告)日：2009-08-04

    申请号：US11269917

    申请日：2005-11-08

    申请人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    发明人： William M. Holber ,  John A. Smith ,  Xing Chen ,  Donald K. Smith

    IPC分类号： B23K10/00

    CPC分类号： H01J37/32174 ,  H01J37/321 ,  H05H1/46 ,  H05H2001/4667

    摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

    摘要翻译： 用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。 将金属轴承气体引入到等离子体室中以与环形等离子体反应。 环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

    Integrated plasma chamber and inductively-coupled toroidal plasma source
    8.
    发明授权
    Integrated plasma chamber and inductively-coupled toroidal plasma source 有权
    集成等离子体室和电感耦合环形等离子体源

    公开(公告)号：US06924455B1

    公开(公告)日：2005-08-02

    申请号：US09774165

    申请日：2001-01-26

    申请人： Xing Chen ,  Donald K. Smith ,  William M. Holber

    发明人： Xing Chen ,  Donald K. Smith ,  William M. Holber

    IPC分类号： H01J27/16 ,  H01J37/32 ,  B23K10/00

    CPC分类号： H01J37/32009 ,  H01J27/16 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32862

    摘要： A material processing apparatus having an integrated toroidal plasma source is described. The material processing apparatus includes a plasma chamber that comprises a portion of an outer surface of a process chamber. A transformer having a magnetic core surrounds a portion of the plasma chamber. The transformer has a primary winding. A solid state AC switching power supply comprising one or more switching semiconductor devices is coupled to a voltage supply and has an output that is coupled to the primary winding. The solid state AC switching power supply drives an AC current in the primary winding that induces an AC potential inside the chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and dissociates the gas.

    摘要翻译： 描述了具有集成环形等离子体源的材料处理装置。 材料处理装置包括等离子体室，其包括处理室的外表面的一部分。 具有磁芯的变压器包围等离子体室的一部分。 变压器有一个初级绕组。 包括一个或多个开关半导体器件的固态AC开关电源耦合到电压源并具有耦合到初级绕组的输出。 固态交流开关电源驱动初级绕组中的交流电流，其在室内引起AC电位，其直接形成环形等离子体，其完成变压器的次级电路并解离气体。

    Toroidal low-field reactive gas source
    10.
    发明授权
    Toroidal low-field reactive gas source 有权
    环形低场反应气源

    公开(公告)号：US06388226B1

    公开(公告)日：2002-05-14

    申请号：US09502087

    申请日：2000-02-10

    申请人： Donald K. Smith ,  Xing Chen ,  William M. Holber ,  Eric Georgelis

    发明人： Donald K. Smith ,  Xing Chen ,  William M. Holber ,  Eric Georgelis

    IPC分类号： B23K1000

    CPC分类号： H01J37/32009 ,  H01J27/16 ,  H01J37/321 ,  H01J37/32357 ,  H01J37/32862

    摘要： An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.

    摘要翻译： 改进的环形低场等离子体源允许在比现有技术的等离子体源允许的更宽的气体条件范围内等离子体点火。 通过根据对电源的负载自动调节输送到等离子体的功率来提高等离子体源的功率效率。 等离子体源可以在比现有技术的等离子体源允许的更宽的压力范围内操作。 可以操作等离子体源，以便增加来自源的原子物质的输出。 可以操作等离子体源以增加有机材料的蚀刻速率。 通过将等离子体源转换成可擦洗的产品，等离子体源可以有效地从废气流中去除有害气体化合物。