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    Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
    1.
    发明授权
    Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel 有权
    具有介电真空容器的环形低场反应气体和等离子体源

    公开(公告)号：US07501600B2

    公开(公告)日：2009-03-10

    申请号：US11058620

    申请日：2005-02-15

    申请人： William M. Holber ,  Xing Chen ,  Andrew B. Cowe ,  Matthew M. Besen ,  Ronald W. Collins, Jr. ,  Susan C. Trulli ,  Shouqian Shao

    发明人： William M. Holber ,  Xing Chen ,  Andrew B. Cowe ,  Matthew M. Besen ,  Ronald W. Collins, Jr. ,  Susan C. Trulli ,  Shouqian Shao

    IPC分类号： B23K10/00

    CPC分类号： H01J37/32357 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32522

    摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

    摘要翻译： 描述了等离子体点火和冷却装置和等离子体系统的方法。 装置可以包括容器和与容器相邻的至少一个点火电极。 所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。 该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。 一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。 气体在通道中被点燃，而流量的剩余部分被引导离开通道。

    Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel
    3.
    发明申请
    Toroidal Low-Field Reactive Gas and Plasma Source Having a Dielectric Vacuum Vessel 有权
    具有介质真空容器的环形低场反应气体和等离子体源

    公开(公告)号：US20070145023A1

    公开(公告)日：2007-06-28

    申请号：US11684916

    申请日：2007-03-12

    申请人： William Holber ,  Xing Chen ,  Andrew Cowe ,  Matthew Besen ,  Ronald Collins ,  Susan Trullin ,  Shouqian Shao

    发明人： William Holber ,  Xing Chen ,  Andrew Cowe ,  Matthew Besen ,  Ronald Collins ,  Susan Trullin ,  Shouqian Shao

    IPC分类号： B23K9/00

    CPC分类号： H01J37/32357 ,  H01J37/32009 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32449 ,  H01J37/32467 ,  H01J37/32522

    摘要： Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.

    摘要翻译： 描述了等离子体点火和冷却装置和等离子体系统的方法。 装置可以包括容器和与容器相邻的至少一个点火电极。 所述至少一个点火电极的尺寸的总长度大于所述容器通道的长度的10％。 该装置可以包括介质环形容器，具有通过弹簧加载机构朝向容器推动的多个部分的散热器以及容器和散热器之间的热界面。 一种方法可以包括提供具有流速和压力的气体并将气体的一部分流量引导到容器通道中。 气体在通道中被点燃，而流量的剩余部分被引导离开通道。

    Showerhead for processing chamber
    5.
    发明授权
    Showerhead for processing chamber 有权
    处理室用喷头

    公开(公告)号：US08733280B2

    公开(公告)日：2014-05-27

    申请号：US12973845

    申请日：2010-12-20

    申请人： Lipyeow Yap ,  Jay DeDontney ,  Shouqian Shao ,  Jason Wright

    发明人： Lipyeow Yap ,  Jay DeDontney ,  Shouqian Shao ,  Jason Wright

    IPC分类号： C23C16/455 ,  C23C16/505 ,  H01L21/3065

    CPC分类号： C23C16/45565 ,  C23C16/4557 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/5096

    摘要： A top assembly for a processing chamber having a back plate and a hub is provided. The back plate has a first portion and a second portion. The first portion is connected to the second portion through a central region of the back plate, wherein a gap is defined between opposing surfaces of the first and second portions outside the central region. The first portion includes an embedded heating element. The hub is affixed to a top surface of the second portion of the back plate over the central region. The hub has a top surface with a plurality of channel openings defined within a central region of the hub and a bottom surface having a central extension with a plurality of channels defined therethrough. The bottom surface includes an annular extension spaced apart from the central extension.

    摘要翻译： 提供了具有背板和毂的用于处理室的顶部组件。 背板具有第一部分和第二部分。 第一部分通过背板的中心区域连接到第二部分，其中在中心区域外部的第一和第二部分的相对表面之间限定间隙。 第一部分包括嵌入式加热元件。 轮毂在中心区域上固定在背板的第二部分的顶表面上。 毂具有顶表面，其具有限定在毂的中心区域内的多个通道开口，底面具有中心延伸部，多个通道限定在其中。 底表面包括与中心延伸部间隔开的环形延伸部。

    Heat treatment apparatus having a thin light-transmitting window
    6.
    发明授权
    Heat treatment apparatus having a thin light-transmitting window 失效

    公开(公告)号：US06437290B1

    公开(公告)日：2002-08-20

    申请号：US09930495

    申请日：2001-08-16

    申请人： Shouqian Shao ,  Yicheng Li ,  Takashi Shigeoka ,  Takeshi Sakuma

    发明人： Shouqian Shao ,  Yicheng Li ,  Takashi Shigeoka ,  Takeshi Sakuma

    IPC分类号： H05B514

    CPC分类号： C30B31/12 ,  C23C16/481 ,  C30B25/105

    摘要： A quartz window decreases an amount of absorption of heat from a heat source while maintaining a pressure difference between the pressure inside a process chamber and an atmospheric pressure. The process chamber defines a process space for processing an object to be processes. A placement stage is provided in the process chamber so as to place the object to be processed thereon. A gas supply part which supplies to the process chamber a process gas for processing the object to be processed. The quartz window is provided as a part of the process chamber so that the quartz window is opposite to the object to be processed placed on the placement stage. A heating unit has a heat radiation lamp provided on an opposite side of the process chamber with respect to the light-transmitting window. The quartz window constitutes a convex lens part which is formed on a periphery of the quartz window and protrudes into the process space.

    Showerhead for Processing Chamber
    7.
    发明申请
    Showerhead for Processing Chamber 有权
    加工室喷头

    公开(公告)号：US20120156877A1

    公开(公告)日：2012-06-21

    申请号：US12973845

    申请日：2010-12-20

    申请人： Lipyeow Yap ,  Jay DeDontney ,  Shouqian Shao ,  Jason Wright

    发明人： Lipyeow Yap ,  Jay DeDontney ,  Shouqian Shao ,  Jason Wright

    IPC分类号： H01L21/302 ,  B08B7/00 ,  B05C5/00 ,  H01L21/31 ,  B05B7/16 ,  H01L21/306

    CPC分类号： C23C16/45565 ,  C23C16/4557 ,  C23C16/45572 ,  C23C16/45574 ,  C23C16/5096

    摘要： A top assembly for a processing chamber having a back plate and a hub is provided. The back plate has a first portion and a second portion. The first portion is connected to the second portion through a central region of the back plate, wherein a gap is defined between opposing surfaces of the first and second portions outside the central region. The first portion includes an embedded heating element. The hub is affixed to a top surface of the second portion of the back plate over the central region. The hub has a top surface with a plurality of channel openings defined within a central region of the hub and a bottom surface having a central extension with a plurality of channels defined therethrough. The bottom surface includes an annular extension spaced apart from the central extension.

    摘要翻译： 提供了具有背板和毂的用于处理室的顶部组件。 背板具有第一部分和第二部分。 第一部分通过背板的中心区域连接到第二部分，其中在中心区域外部的第一和第二部分的相对表面之间限定间隙。 第一部分包括嵌入式加热元件。 轮毂在中心区域上固定在背板的第二部分的顶表面上。 毂具有顶表面，其具有限定在毂的中心区域内的多个通道开口，底面具有中心延伸部，多个通道限定在其中。 底表面包括与中心延伸部间隔开的环形延伸部。