Safety guard for an RF connector
    1.
    发明授权
    Safety guard for an RF connector 失效
    射频连接器的安全防护装置

    公开(公告)号:US06539621B1

    公开(公告)日:2003-04-01

    申请号:US09575813

    申请日:2000-05-22

    IPC分类号: H01B1320

    摘要: The present invention provides a safety guard for a type-N coaxial connector that prevents casual human contact with a conductive center pin of the coaxial cable. The safety guard is preferably made of a dielectric material and is generally tubular in shape. The safety guard is adapted to be installed on existing connectors in the field, or to be part of a connector assembly that is to be installed on a coaxial cable. Among the advantages of the present invention are substantial reduction in complexity over prior art interlock connector designs. The safety guard of the present invention is provided for a male connector only, thereby alleviating the need for modification of the mating female connector.

    摘要翻译: 本发明提供了一种用于N型同轴连接器的安全保护装置,其防止与同轴电缆的导电中心销的偶然的人接触。 安全防护装置优选由电介质材料制成,并且通常为管状形状。 安全防护装置适用于现场的现有连接器上,也可安装在要安装在同轴电缆上的连接器组件的一部分。 与现有技术的互锁连接器设计相比,本发明的优点之一是显着降低了复杂度。 本发明的安全防护装置仅用于阳连接器,从而减轻对配合阴连接器的改进的需要。

    Safety guard for an RF connector
    2.
    发明授权
    Safety guard for an RF connector 失效
    射频连接器的安全防护装置

    公开(公告)号:US06273736B1

    公开(公告)日:2001-08-14

    申请号:US08898178

    申请日:1997-07-22

    IPC分类号: H01R1344

    摘要: The present invention provides a safety guard for a type-N coaxial connector that prevents casual human contact with a conductive center pin of the coaxial cable. The safety guard is preferably made of a dielectric material and is generally tubular in shape. The safety guard is adapted to be installed on existing connectors in the field, or to be part of a connector assembly that is to be installed on a coaxial cable. Among the advantages of the present invention are substantial reduction in complexity over prior art interlock connector designs. The safety guard of the present invention is provided for a male connector only, thereby alleviating the need for modification of the mating female connector.

    摘要翻译: 本发明提供了一种用于N型同轴连接器的安全保护装置,其防止与同轴电缆的导电中心销的偶然的人接触。 安全防护装置优选由电介质材料制成,并且通常为管状形状。 安全防护装置适用于现场的现有连接器上,也可安装在要安装在同轴电缆上的连接器组件的一部分。 与现有技术的互锁连接器设计相比,本发明的优点之一是显着降低了复杂度。 本发明的安全防护装置仅用于阳连接器,从而减轻对配合阴连接器的改进的需要。

    Method and apparatus for monitoring and adjusting chamber impedance
    3.
    发明授权
    Method and apparatus for monitoring and adjusting chamber impedance 失效
    监测和调节室阻抗的方法和装置

    公开(公告)号:US07004107B1

    公开(公告)日:2006-02-28

    申请号:US08988246

    申请日:1997-12-01

    摘要: A substrate processing system that includes a deposition chamber having a reaction zone, a substrate holder that positions a substrate in the reaction zone, a gas distribution system that includes a gas inlet manifold for supplying one or more process gases to said reaction zone, a plasma power source for forming a plasma from a process gas introduced into the reaction zone of the deposition chamber and an impedance monitor that is electrically coupled to the deposition chamber to measure an impedance level of the plasma. In a preferred embodiment, the substrate holder is a first electrode and the gas inlet manifold is a second electrode and RF power is supplied by the plasma power source to either the first or second electrodes to form the plasma. In another preferred embodiment, the processing system further includes a computer processor that is communicatively coupled to the impedance monitor and to other control systems of the processing system so that the computer processor can adjust the impedance of the deposition chamber during the course of an extended wafer run if the impedance drifts outside of a predetermined tolerance range.

    摘要翻译: 一种衬底处理系统,包括具有反应区的沉积室,将反应区中的衬底定位的衬底保持器,包括用于向所述反应区供应一种或多种工艺气体的进气歧管的气体分配系统,等离子体 用于从引入沉积室的反应区域的工艺气体形成等离子体的电源和电耦合到沉积室的阻抗监测器,以测量等离子体的阻抗水平。 在优选实施例中,衬底保持器是第一电极,气体入口歧管是第二电极,并且RF功率由等离子体电源提供给第一或第二电极以形成等离子体。 在另一个优选实施例中,处理系统还包括计算机处理器,其通信地耦合到阻抗监视器和处理系统的其他控制系统,使得计算机处理器可以在扩展晶片的过程中调整沉积室的阻抗 如果阻抗漂移在预定的公差范围之外,则运行。

    Stent placement and removal system
    4.
    发明授权
    Stent placement and removal system 失效
    支架放置和移除系统

    公开(公告)号:US06258098B1

    公开(公告)日:2001-07-10

    申请号:US09074991

    申请日:1998-05-08

    IPC分类号: A61F1100

    摘要: Placement and non-surgical removal of a ureteral stent is accomplished by suspending a ferromagnetic bead from an indwelling stent The bead is suspended by a flaccid tether that reduces the likelihood of patient irritation when a shortened stent is used. The bead, tether, and stent assembly are advanced into the patient as a unit via a conventional cystoscope. A magnet-tipped catheter is employed to engage the bead in the bladder and permit removal of the connected stent as the catheter is withdrawn.

    摘要翻译: 输尿管支架的放置和非手术切除是通过将铁磁珠悬挂在留置支架中来实现的。珠子由松弛系绳悬挂,当使用缩短的支架时,可减少患者刺激的可能性。 珠,系绳和支架组件通过常规膀胱镜作为一个单元进入患者。 使用磁铁导管接合膀胱中的珠,并允许在取出导管时移除连接的支架。

    Stent placement and removal
    6.
    发明授权
    Stent placement and removal 有权
    支架放置和移除

    公开(公告)号:US06652569B1

    公开(公告)日:2003-11-25

    申请号:US09618960

    申请日:2000-07-19

    IPC分类号: A61F206

    摘要: Placement and non-surgical removal of a ureteral stent is accomplished by suspending a ferromagnetic bead from an indwelling stent. The bead is suspended by a flaccid tether that reduces the likelihood of patient irritation when a shortened stent is used. The bead, tether, and stent assembly are advanced into the patient as a unit via a conventional cystoscope. A magnet-tipped catheter is employed to engage the bead in the bladder and permit removal of the connected stent as the catheter is withdrawn.

    摘要翻译: 通过从留置支架悬挂铁磁珠来实现输尿管支架的放置和非手术切除。 珠子由松弛系绳悬挂,当使用缩短的支架时,可减少患者刺激的可能性。 珠,系绳和支架组件通过常规膀胱镜作为一个单元进入患者。 使用磁铁导管接合膀胱中的珠,并允许在取出导管时移除连接的支架。

    Mixed frequency CVD process
    7.
    发明授权
    Mixed frequency CVD process 有权
    混合频率CVD工艺

    公开(公告)号:US06358573B1

    公开(公告)日:2002-03-19

    申请号:US09585258

    申请日:2000-06-02

    IPC分类号: H05H124

    摘要: A substrate processing system that includes a ceramic substrate holder having an RF electrode embedded within the substrate holder and a gas inlet manifold spaced apart from the substrate holder. The gas inlet manifold supplies one or more process gases through multiple conical holes to a reaction zone of a substrate processing chamber within the processing system and also acts as a second RF electrode. Each conical hole has an outlet that opens into the reaction zone and an inlet spaced apart from the outlet that is smaller in diameter than said outlet. A mixed frequency RF power supply is connected to the substrate processing system with a high frequency RF power source connected to the gas inlet manifold electrode and a low frequency RF power source connected to the substrate holder electrode. An RF filter and matching network decouples the high frequency waveform from the low frequency waveform. Such a configuration allows for an enlarged process regime and provides for deposition of films, including silicon nitride films, having physical characteristics that were previously unattainable.

    摘要翻译: 一种衬底处理系统,其包括陶瓷衬底保持器,其具有嵌入衬底保持器内的RF电极和与衬底保持器间隔开的气体入口歧管。 气体入口歧管将一个或多个处理气体通过多个锥形孔提供到处理系统内的衬底处理室的反应区,并且还用作第二RF电极。 每个锥形孔具有通向反应区的出口和与出口间隔开的直径小于所述出口的入口。 混合频率RF电源与连接到气体入口歧管电极的高频RF电源和连接到衬底保持器电极的低频RF电源连接到衬底处理系统。 RF滤波器和匹配网络将高频波形与低频波形分离。 这种构造允许扩大的工艺方案并且提供具有先前无法实现的物理特性的膜(包括氮化硅膜)的沉积。

    Mixed frequency CVD apparatus
    8.
    发明授权
    Mixed frequency CVD apparatus 失效
    混合频率CVD装置

    公开(公告)号:US6098568A

    公开(公告)日:2000-08-08

    申请号:US980520

    申请日:1997-12-01

    摘要: A substrate processing system that includes a ceramic substrate holder having an RF electrode embedded within the substrate holder and a gas inlet manifold spaced apart from the substrate holder. The gas inlet manifold supplies one or more process gases through multiple conical holes to a reaction zone of a substrate processing chamber within the processing system and also acts as a second RF electrode. Each conical hole has an outlet that opens into the reaction zone and an inlet spaced apart from the outlet that is smaller in diameter than said outlet. A mixed frequency RF power supply is connected to the substrate processing system with a high frequency RF power source connected to the gas inlet manifold electrode and a low frequency RF power source connected to the substrate holder electrode. An RF filter and matching network decouples the high frequency waveform from the low frequency waveform. Such a configuration allows for an enlarged process regime and provides for deposition of films, including silicon nitride films, having physical characteristics that were previously unattainable.

    摘要翻译: 一种衬底处理系统,其包括陶瓷衬底保持器,其具有嵌入衬底保持器内的RF电极和与衬底保持器间隔开的气体入口歧管。 气体入口歧管将一个或多个处理气体通过多个锥形孔提供到处理系统内的衬底处理室的反应区,并且还用作第二RF电极。 每个锥形孔具有通向反应区的出口和与出口间隔开的直径小于所述出口的入口。 混合频率RF电源与连接到气体入口歧管电极的高频RF电源和连接到衬底保持器电极的低频RF电源连接到衬底处理系统。 RF滤波器和匹配网络将高频波形与低频波形分离。 这种构造允许扩大的工艺方案并且提供具有先前无法实现的物理特性的膜(包括氮化硅膜)的沉积。