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公开(公告)号：US08450701B2
公开(公告)日：2013-05-28
申请号：US13089830
申请日：2011-04-19
CPC分类号： B01D8/00 , H01J37/18 , H01J37/3171 , H01J2237/1825
摘要： A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps.
摘要翻译： 提供了一种冷阱过滤器和方法，用于从离子注入系统的真空系统中过滤化学物质。 罐与高真空泵的废气和用于抽空离子源室的粗抽泵的进气口流体连通。 一个或多个桨叶位于罐内，其中每个桨叶具有与冷却剂源流体连通的冷却管线。 冷却剂源将冷却剂通过冷却管线，从而将一个或多个桨叶冷却到与化学物质的冷凝或沉积点相关联的预定温度，其中将化学物质冷凝或沉积在桨上，同时不干扰真空 高真空和粗抽泵的容量。 桨也可以被电偏置以在一个或多个偏压步骤中静电地将化学物质吸引到桨叶。
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公开(公告)号：US20120267546A1
公开(公告)日：2012-10-25
申请号：US13089830
申请日：2011-04-19
CPC分类号： B01D8/00 , H01J37/18 , H01J37/3171 , H01J2237/1825
摘要： A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps.
摘要翻译： 提供了一种冷阱过滤器和方法，用于从离子注入系统的真空系统中过滤化学物质。 罐与高真空泵的废气和用于抽空离子源室的粗抽泵的进气口流体连通。 一个或多个桨叶位于罐内，其中每个桨叶具有与冷却剂源流体连通的冷却管线。 冷却剂源将冷却剂通过冷却管线，从而将一个或多个桨叶冷却到与化学物质的冷凝或沉积点相关联的预定温度，其中将化学物质冷凝或沉积在桨上，同时不干扰真空 高真空和粗抽泵的容量。 桨也可以被电偏置以在一个或多个偏压步骤中静电地将化学物质吸引到桨叶。
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公开(公告)号：US09236216B2
公开(公告)日：2016-01-12
申请号：US13566013
申请日：2012-08-03
IPC分类号： H01J37/18 , H01L21/677 , H01J37/20 , H01J37/317 , H01L21/67 , H01L21/02
CPC分类号： H01J37/18 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2002 , H01J2237/2007 , H01J2237/201 , H01J2237/204 , H01J2237/31705 , H01L21/02002 , H01L21/67109 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/67766
摘要： An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.
摘要翻译： 离子注入系统向位于冷却卡盘上的处理室的真空环境中的工件提供离子。 处理室内的预冷站具有构造成将工件冷却到第一温度的冷冻工件支撑件，并且处理室内的后加热站具有被配置为将工件加热到第二温度的加热工件支撑件。 第一温度低于处理温度，第二温度大于外部温度。 工件传送臂还被构造成在卡盘，加载锁定室，预冷站和后加热站之间的两个或更多个之间同时传送两个或更多个工件。
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公开(公告)号：US20140034846A1
公开(公告)日：2014-02-06
申请号：US13566013
申请日：2012-08-03
IPC分类号： G21K5/08
CPC分类号： H01J37/18 , H01J37/20 , H01J37/3171 , H01J2237/2001 , H01J2237/2002 , H01J2237/2007 , H01J2237/201 , H01J2237/204 , H01J2237/31705 , H01L21/02002 , H01L21/67109 , H01L21/67201 , H01L21/67213 , H01L21/67742 , H01L21/67766
摘要： An ion implantation system provides ions to a workpiece positioned in a vacuum environment of a process chamber on a cooled chuck. A pre-chill station within the process chamber has a chilled workpiece support configured to cool the workpiece to a first temperature, and a post-heat station within the process chamber, has a heated workpiece support configured to heat the workpiece to a second temperature. The first temperature is lower than a process temperature, and the second temperature is greater than an external temperature. A workpiece transfer arm is further configured to concurrently transfer two or more workpieces between two or more of the chuck, a load lock chamber, the pre-chill station, and the post-heat station.
摘要翻译： 离子注入系统向位于冷却卡盘上的处理室的真空环境中的工件提供离子。 处理室内的预冷站具有构造成将工件冷却到第一温度的冷冻工件支撑件，并且处理室内的后加热站具有被配置为将工件加热到第二温度的加热工件支撑件。 第一温度低于处理温度，第二温度大于外部温度。 工件传送臂还被构造成在卡盘，加载锁定室，预冷站和后加热站之间的两个或更多个之间同时传送两个或更多个工件。
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公开(公告)号：US07531819B2
公开(公告)日：2009-05-12
申请号：US11540469
申请日：2006-09-29
申请人： William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
发明人： William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
IPC分类号： H01J37/08 , H01J37/317
CPC分类号： H01J37/3171 , B08B7/0035 , H01J27/022 , H01J37/08 , H01J2237/022 , H01J2237/31705
摘要： A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of the ion source by at least partially covering the source aperture. The controller controls the supply and flow rate from the fluorine source to the ion source and also controls the positioning of the throttle mechanism.
摘要翻译： 用于从离子源和/或电极的内表面去除沉积物的沉积物清洁系统包括氟源，节流机构和控制器。 氟源作为清洁材料向离子源供给氟。 节流机构通过至少部分地覆盖源孔径来减轻通过离子源的源孔径的氟的损失。 控制器控制从氟源到离子源的供应和流量，还控制节流机构的定位。
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公开(公告)号：US20070137671A1
公开(公告)日：2007-06-21
申请号：US11540469
申请日：2006-09-29
申请人： William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
发明人： William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
CPC分类号： H01J37/3171 , B08B7/0035 , H01J27/022 , H01J37/08 , H01J2237/022 , H01J2237/31705
摘要： A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of the ion source by at least partially covering the source aperture. The controller controls the supply and flow rate from the fluorine source to the ion source and also controls the positioning of the throttle mechanism.
摘要翻译： 用于从离子源和/或电极的内表面去除沉积物的沉积物清洁系统包括氟源，节流机构和控制器。 氟源作为清洁材料向离子源供给氟。 节流机构通过至少部分地覆盖源孔径来减轻通过离子源的源孔径的氟的损失。 控制器控制从氟源到离子源的供应和流量，还控制节流机构的定位。
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