摘要:
A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features. Individual of the photoresist blocks have an opposing pair of second pattern edges in the cross-section that self-align laterally outward of the first pattern edges to the laterally innermost sidewalls of the features during the patterning.
摘要:
A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features. Individual of the photoresist blocks have an opposing pair of second pattern edges in the cross-section that self-align laterally outward of the first pattern edges to the laterally innermost sidewalls of the features during the patterning.
摘要:
A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features. Individual of the photoresist blocks have an opposing pair of second pattern edges in the cross-section that self-align laterally outward of the first pattern edges to the laterally innermost sidewalls of the features during the patterning.
摘要:
A method of processing a semiconductor substrate in forming scribe line alignment marks includes forming pitch multiplied non-circuitry features within scribe line area of a semiconductor substrate. Individual of the features, in cross-section, have a maximum width which is less than a minimum photolithographic feature dimension used in lithographically patterning the substrate. Photoresist is deposited over the features. Such is patterned to form photoresist blocks that are individually received between a respective pair of the features in the cross-section. Individual of the features of the respective pairs have a laterally innermost sidewall in the cross-section. Individual of the photoresist blocks have an opposing pair of first pattern edges in the cross-section that are spaced laterally inward of the laterally innermost sidewalls of the respective pair of the features. Individual of the photoresist blocks have an opposing pair of second pattern edges in the cross-section that self-align laterally outward of the first pattern edges to the laterally innermost sidewalls of the features during the patterning.
摘要:
This invention provides articles made by reaction injection molding and spray coatings, and processes for forming such articles and coatings. The coatings and articles are polyureas or polyurea-urethanes. The ingredients used to form the coatings and articles comprise at least (A) an aromatic polyisocyanate and (B) a mixture formed from components comprised of (i) at least one polyol and/or at least one polyetheramine, (ii) an aromatic primary diamine, and (iii) an aliphatic secondary diamine which has about twelve to about forty carbon atoms and in which the having amino hydrocarbyl groups are secondary or tertiary hydrocarbyl groups.
摘要:
Mixtures of isomeric alkylthiated mononuclear aromatic amines comprising in the range of about 30 to about 70 mole percent of (i) at least one 3,5-di(alkyl-thio)-2,6-diamino-1-alkylbenzene and in the range of about 30 to about 70 mole percent of at least one 3,5-di(alkylthio)-2,4-diamino-1-alkylbenzene, such mixture containing at least about 90 mole percent of (i) and (ii), and optionally containing up to 10 mole percent of one or more isomers of (i) and/or (ii). An alkyl group may be present as a substituent in lieu of a hydrogen atom in the remaining ring position. These mixtures are useful as curatives or extenders in processes for making polyurethanes, polyurethane-ureas, and polyureas.
摘要:
Odor formation during storage of (hydrocarbylthio)aromatic amines due to formation and release of odoriferous sulfur-containing species such as dihydrocarbyldisulfides, is suppressed. To accomplish this, a small amount of N,N-dihydrocarbylhydroxylamine odor-inhibitor (e.g., N,N-diethylhydroxylamine) is blended with the (hydrocarbylthio)aromatic amine. This enables products such as a mixture of 3,5-di(methylthio)-2,4-diaminotoluene and 3,5-di(methylthio)-2,6-diaminotoluene) to be stored for long periods of time with significantly reduced formation and release of odoriferous sulfur-containing species.
摘要:
In a combine harvester, an array of ground engaging skid shoes or feelers spans the header platform and is divided into right- and left-hand groups, each group associated with a position sensor switch. Each switch transmits to an electrohydraulic control system, a signal representative of the relative position of the skid shoe closest to the ground in its half of the platform. The combined left- and/or right-hand signals are transduced to control platform vertical adjustment and lateral tilt automatically. In one embodiment, a pair of lift cylinders, acting in unison, control platform elevation while a third cylinder is dedicated to tilt control. In other embodiments, paired lift cylinders are controllable independently, to provide both height and tilt control. Supporting the feeder conveyor lower shaft and the header main drive shaft in the laterally pivotable lower forward portion of the feederhouse permits direct transfer of crop material from the platform auger to the feederhouse conveyor and also simplifies header drive arrangements.
摘要:
A process for the integration of a chemical absorption separation of oxygen and nitrogen from air with a combustion process is set forth wherein excess temperature availability from the combustion process is more effectively utilized to desorb oxygen product from the absorbent and then the sensible heat and absorption reaction heat is further utilized to produce a high temperature process stream. The oxygen may be utilized to enrich the combustion process wherein the high temperature heat for desorption is conducted in a heat exchange preferably performed with a pressure differential of less than 10 atmospheres which provides considerable flexibility in the heat exchange.
摘要:
A vibratory conveyor has a continuous trough that extends over one or more linear drive units. Each drive unit has an elongated base that extends longitudinally of the conveyor. The base is resiliently mounted to a fixed support. A trough support is disposed parallel to the base. A driver is arranged to move the trough support longitudinally of the conveyor and relative to the base. A plurality of leaf springs extend in an at rest position generally perpendicular to the direction of linear drive, longitudinally of the conveyor. These leaf springs interconnect the base and the trough support at longitudinally spaced locations. The base and the trough support are disposed laterally of each other in a horizontal plane. Preferably, the leaf springs are mounted for pivotal movement about axes extending laterally of the conveyor between the base and the trough support. Such movement adjusts the transverse angle of inclination between one side of the leaf spring and a vertical line. This adjustment can be made without changing the direction in which the leaf springs extend in an at rest position between the base and the trough support, and the adjustment provides a desired vibration angle for the trough. The angular difference between the transverse angles of inclination at the sides of the various leaf springs provides for rotational motion of the trough support relative to the base. This motion compensates for rotational motion of the drive unit on its fixed support due to inertia forces.