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1.发明申请公开(公告)号：US20140263175A1
公开(公告)日：2014-09-18
申请号：US13828803
申请日：2013-03-14
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han , Myungwoong Kim
CPC classification number: C08J7/04 , B41N1/14 , C08J2325/08 , C08J2453/00 , G03F7/0002
Abstract: Surface-modifying layers, including neutral layers for vertical domain-forming block copolymers of styrene and methyl methacrylate are provided. Also provided are self-assembled block copolymer structures incorporating the surface modifying layers, methods of fabricating such structures and methods of using the structures in BCP lithography applications. The surface-modifying layers comprise a crosslinked copolymer film, wherein the crosslinked copolymers are random copolymers polymerized from styrene monomers and/or (meth)acrylate monomers and crosslinkable epoxy group-functionalized monomers. The crosslinked copolymer films are characterized by a high content of the crosslinkable epoxy group-functionalized monomer.
Abstract translation: 提供表面改性层，包括苯乙烯和甲基丙烯酸甲酯的垂直结构形成嵌段共聚物的中性层。 还提供了包含表面改性层的自组装嵌段共聚物结构，制造这种结构的方法以及在BCP光刻应用中使用该结构的方法。 表面改性层包括交联共聚物膜，其中交联共聚物是由苯乙烯单体和/或（甲基）丙烯酸酯单体和可交联的环氧基官能化单体聚合的无规共聚物。 交联共聚物膜的特征在于交联性环氧基官能化单体的含量高。
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2.发明申请PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION 有权用于控制块状共聚物MICRODOMAIN方位的光电成像层公开(公告)号：US20140178807A1
公开(公告)日：2014-06-26
申请号：US14194009
申请日：2014-02-28
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han
IPC: G03F7/09
CPC classification number: G03F7/09 , C08F293/005 , C08F2438/02 , C08J3/24 , C08J7/04 , C08J7/12 , C08L33/068 , C08L2312/00 , C09D125/14 , C09D133/068 , C09D153/00 , G03F7/038 , G03F7/0388 , G03F7/165 , G03F7/26 , Y10T428/24174 , Y10T428/24802 , C08L33/062
Abstract: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
Abstract translation: 本发明提供了包括基材，设置在基材上的交联聚合物膜以及设置在交联聚合物膜上的图案化二嵌段共聚物膜的结构。 交联聚合物包含由第一单体，第二单体和可光交联和/或可热交联的第三单体（包括环氧官能或丙烯酰基官能单体）聚合的无规共聚物。 还公开了用于形成结构的方法。
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Patent Agency Ranking
3.发明申请BLOCK COPOLYMER-BASED MASK STRUCTURES FOR THE GROWTH OF NANOPATTERNED POLYMER BRUSHES 有权用于纳米聚合物刷的生长的基于嵌段共聚物的掩模结构公开(公告)号：US20140272673A1
公开(公告)日：2014-09-18
申请号：US13800178
申请日：2013-03-13
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Daniel Patrick Sweat , Myungwoong Kim , Eungnak Han
CPC classification number: G03F1/50 , B05D5/00 , B05D2506/00 , G03F7/0002 , G03F7/20
Abstract: Block copolymer-based mask structures for the growth of patterned polymer brushes via surface-initiated atom transfer radical polymerization (SI-ATRP) are provided. Also provided are methods of making the mask structures and methods of using the mask structures to grow patterned polymer brushes. The mask structures comprise a substrate having a surface, a neutral layer comprising a crosslinked copolymer film disposed on the surface of the substrate and a domain-forming block copolymer film disposed on the crosslinked copolymer film. The crosslinked copolymer film comprises crosslinked random copolymer chains having pendant alkyl halide functional groups that are capable of acting as ATRP initiating sites.
Abstract translation: 提供了通过表面起始原子转移自由基聚合（SI-ATRP）生长图案化聚合物刷的基于嵌段共聚物的掩模结构。 还提供了制造掩模结构的方法和使用掩模结构来生长图案化聚合物刷的方法。 掩模结构包括具有表面的基材，包含设置在基材表面上的交联共聚物膜的中性层和设置在交联共聚物膜上的区域形成嵌段共聚物膜。 交联共聚物膜包括具有能够作为ATRP起始位点的烷基卤官能团侧基的交联无规共聚物链。
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4.发明授权Photopatternable imaging layers for controlling block copolymer microdomain orientation 有权用于控制嵌段共聚物微区取向的光致图像成像层公开(公告)号：US08663784B2
公开(公告)日：2014-03-04
申请号：US13659824
申请日：2012-10-24
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han
CPC classification number: G03F7/09 , C08F293/005 , C08F2438/02 , C08J3/24 , C08J7/04 , C08J7/12 , C08L33/068 , C08L2312/00 , C09D125/14 , C09D133/068 , C09D153/00 , G03F7/038 , G03F7/0388 , G03F7/165 , G03F7/26 , Y10T428/24174 , Y10T428/24802 , C08L33/062
Abstract: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
Abstract translation: 本发明提供了包括基材，设置在基材上的交联聚合物膜以及设置在交联聚合物膜上的图案化二嵌段共聚物膜的结构。 交联聚合物包含由第一单体，第二单体和可光交联和/或可热交联的第三单体（包括环氧官能或丙烯酰基官能单体）聚合的无规共聚物。 还公开了用于形成结构的方法。
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5.发明授权Photopatternable imaging layers for controlling block copolymer microdomain orientation 有权用于控制嵌段共聚物微区取向的光致图像成像层公开(公告)号：US09207536B2
公开(公告)日：2015-12-08
申请号：US14194009
申请日：2014-02-28
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han
IPC: B32B3/10 , B32B33/00 , B32B27/08 , G03F7/09 , C08F293/00 , C09D125/14 , C09D133/06 , C09D153/00 , C08L33/06 , G03F7/038 , G03F7/16 , G03F7/26 , C08J7/04 , C08J3/24 , C08J7/12
CPC classification number: G03F7/09 , C08F293/005 , C08F2438/02 , C08J3/24 , C08J7/04 , C08J7/12 , C08L33/068 , C08L2312/00 , C09D125/14 , C09D133/068 , C09D153/00 , G03F7/038 , G03F7/0388 , G03F7/165 , G03F7/26 , Y10T428/24174 , Y10T428/24802 , C08L33/062
Abstract: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
Abstract translation: 本发明提供了包括基材，设置在基材上的交联聚合物膜以及设置在交联聚合物膜上的图案化二嵌段共聚物膜的结构。 交联聚合物包含由第一单体，第二单体和可光交联和/或可热交联的第三单体（包括环氧官能或丙烯酰基官能单体）聚合的无规共聚物。 还公开了用于形成结构的方法。
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6.发明授权公开(公告)号：US09115255B2
公开(公告)日：2015-08-25
申请号：US13828803
申请日：2013-03-14
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han , Myungwoong Kim
CPC classification number: C08J7/04 , B41N1/14 , C08J2325/08 , C08J2453/00 , G03F7/0002
Abstract: Surface-modifying layers, including neutral layers for vertical domain-forming block copolymers of styrene and methyl methacrylate are provided. Also provided are self-assembled block copolymer structures incorporating the surface modifying layers, methods of fabricating such structures and methods of using the structures in BCP lithography applications. The surface-modifying layers comprise a crosslinked copolymer film, wherein the crosslinked copolymers are random copolymers polymerized from styrene monomers and/or (meth)acrylate monomers and crosslinkable epoxy group-functionalized monomers. The crosslinked copolymer films are characterized by a high content of the crosslinkable epoxy group-functionalized monomer.
Abstract translation: 提供表面改性层，包括苯乙烯和甲基丙烯酸甲酯的垂直结构形成嵌段共聚物的中性层。 还提供了包含表面改性层的自组装嵌段共聚物结构，制造这种结构的方法以及在BCP光刻应用中使用该结构的方法。 表面改性层包括交联共聚物膜，其中交联共聚物是由苯乙烯单体和/或（甲基）丙烯酸酯单体和可交联的环氧基官能化单体聚合的无规共聚物。 交联共聚物膜的特征在于交联性环氧基官能化单体的含量高。
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7.发明申请PHOTOPATTERNABLE IMAGING LAYERS FOR CONTROLLING BLOCK COPOLYMER MICRODOMAIN ORIENTATION 有权用于控制块状共聚物MICRODOMAIN方位的光电成像层公开(公告)号：US20130059130A1
公开(公告)日：2013-03-07
申请号：US13659824
申请日：2012-10-24
Applicant: Wisconsin Alumni Research Foundation
Inventor： Padma Gopalan , Eungnak Han
CPC classification number: G03F7/09 , C08F293/005 , C08F2438/02 , C08J3/24 , C08J7/04 , C08J7/12 , C08L33/068 , C08L2312/00 , C09D125/14 , C09D133/068 , C09D153/00 , G03F7/038 , G03F7/0388 , G03F7/165 , G03F7/26 , Y10T428/24174 , Y10T428/24802 , C08L33/062
Abstract: The present invention provides structures including a substrate, a crosslinked polymer film disposed over the substrate, and a patterned diblock copolymer film disposed over the crosslinked polymer film. The crosslinked polymer comprises a random copolymer polymerized from a first monomer, a second monomer, and a photo-crosslinkable and/or thermally crosslinkable third monomer, including epoxy-functional or acrylyol-functional monomers. Also disclosed are methods for forming the structures.
Abstract translation: 本发明提供了包括基材，设置在基材上的交联聚合物膜以及设置在交联聚合物膜上的图案化二嵌段共聚物膜的结构。 交联聚合物包含由第一单体，第二单体和可光交联和/或可热交联的第三单体（包括环氧官能或丙烯酰基官能单体）聚合的无规共聚物。 还公开了用于形成结构的方法。
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