公开(公告)号：US20140091441A1

公开(公告)日：2014-04-03

申请号：US14092795

申请日：2013-11-27

Applicant: XINTEC INC.

Inventor： Yao-Hsiang CHEN ,  Tsang-Yu LIU ,  Yen-Shih HO ,  Shu-Ming CHANG

IPC: H01L23/552 ,  H01L23/00 ,  H01L21/71

CPC classification number: H01L23/552 ,  H01L21/71 ,  H01L23/3114 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L2224/0346 ,  H01L2224/0361 ,  H01L2224/0401 ,  H01L2224/05572 ,  H01L2224/06155 ,  H01L2224/1147 ,  H01L2224/11912 ,  H01L2224/13022 ,  H01L2224/13144 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2224/13099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/05099 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2224/05552

Abstract: An IC wafer and the method of making the IC wafer, the IC wafer includes an integrated circuit layer having a plurality of solder pads and an insulated layer arranged thereon, a plurality of through holes cut through the insulated layer corresponding to the solder pads respectively for the implantation of a package layer, and an electromagnetic shielding layer formed on the top surface of the insulated layer and electrically isolated from the solder pads of the integrated circuit layer for electromagnetic shielding. Thus, the integrated circuit does not require any further shielding mask, simplifying the fabrication. Further, the design of the through holes facilitates further packaging process.

Abstract translation: IC晶片和IC晶片的制造方法，IC晶片包括具有多个焊盘和设置在其上的绝缘层的集成电路层，多个贯穿相应于焊盘的绝缘层的通孔，分别用于 封装层的注入，以及形成在绝缘层的顶表面上并与用于电磁屏蔽的集成电路层的焊盘电隔离的电磁屏蔽层。 因此，集成电路不需要任何进一步的屏蔽掩模，从而简化制造。 此外，通孔的设计有助于进一步的包装过程。