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    Release layer and resist material for master tool and stamper tool
    1.
    发明授权
    Release layer and resist material for master tool and stamper tool 失效
    主工具和压模工具的剥离层和抗蚀剂材料

    公开(公告)号：US07604836B2

    公开(公告)日：2009-10-20

    申请号：US11610294

    申请日：2006-12-13

    申请人： Xing-Cai Guo ,  Dan S. Kercher ,  Bruno Marchon ,  Charles M. Mate ,  Tsai-Wei Wu

    发明人： Xing-Cai Guo ,  Dan S. Kercher ,  Bruno Marchon ,  Charles M. Mate ,  Tsai-Wei Wu

    IPC分类号： B41L29/12

    CPC分类号： B29C59/022 ,  B29C37/0075 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/743 ,  G11B5/82

    摘要： Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.

    摘要翻译： 描述了进行纳米压印光刻的方法。 对于一种方法，形成主工具和压模工具以提供纳米级刻印。 在主工具和压模工具上形成由全氟聚醚二丙烯酸酯材料构成的脱模层。 主工具和压模工具用于形成抗蚀剂材料中的图案，例如孔或柱图案。 如本文所述的抗蚀剂材料具有比现有抗蚀剂材料更低的粘度和更低的表面张力，允许图案的更均匀的复制。

    RELEASE LAYER AND RESIST MATERIAL FOR MASTER TOOL AND STAMPER TOOL
    2.
    发明申请
    RELEASE LAYER AND RESIST MATERIAL FOR MASTER TOOL AND STAMPER TOOL 失效
    发布主要工具和压印工具的层和材料

    公开(公告)号：US20080145525A1

    公开(公告)日：2008-06-19

    申请号：US11610294

    申请日：2006-12-13

    申请人： Xing-Cai Guo ,  Dan S. Kercher ,  Bruno Marchon ,  Charles M. Mate ,  Tsai-Wei Wu

    发明人： Xing-Cai Guo ,  Dan S. Kercher ,  Bruno Marchon ,  Charles M. Mate ,  Tsai-Wei Wu

    IPC分类号： B28B7/36

    CPC分类号： B29C59/022 ,  B29C37/0075 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/743 ,  G11B5/82

    摘要： Methods of performing nanoimprint lithography are described. For one method, a master tool and a stamper tool are formed to provide nanometer-scale imprinting. A release layer comprised of a perfluoropolyether diacrylate material is formed on the master tool and the stamper tool. The master tool and the stamper tool are used to form patterns in resist material, such as hole or pillar patterns. The resist material as described herein has lower viscosity and lower surface tension than prior resist materials allowing for more uniform replication of the patterns.

    摘要翻译： 描述了进行纳米压印光刻的方法。 对于一种方法，形成主工具和压模工具以提供纳米级刻印。 在主工具和压模工具上形成由全氟聚醚二丙烯酸酯材料构成的脱模层。 主工具和压模工具用于形成抗蚀剂材料中的图案，例如孔或柱图案。 如本文所述的抗蚀剂材料具有比现有抗蚀剂材料更低的粘度和更低的表面张力，允许图案的更均匀的复制。

    Self-releasing resist material for nano-imprint processes
    3.
    发明授权
    Self-releasing resist material for nano-imprint processes 有权
    用于纳米压印工艺的自发光抗蚀材料

    公开(公告)号：US08262975B2

    公开(公告)日：2012-09-11

    申请号：US12268823

    申请日：2008-11-11

    申请人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

    发明人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

    IPC分类号： B27N3/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08G65/007 ,  C08G65/3322 ,  C08G2650/48 ,  C08L33/08 ,  C09D171/02 ,  C08L2666/04

    摘要： Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyalkylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

    摘要翻译： 描述了使用加入表面活性剂的抗蚀剂材料的纳米压印光刻。 模板释放层形成在模板的图案上。 将非离子表面活性剂加入到抗蚀剂材料中以形成混合的抗蚀剂材料。 抗蚀剂材料可以包括具有不饱和键的烃材料，例如丙烯酸酯材料。 表面活性剂可以包含聚亚烷基二醇或有机改性的聚硅氧烷。 然后在混合的抗蚀剂材料的基板上形成抗蚀剂层。 添加到抗蚀剂材料中的表面活性剂在抗蚀剂层的表面上形成抗蚀剂剥离层。 然后将模板压入抗蚀剂层，其中模板释放层和抗蚀剂剥离层在模板的图案和抗蚀剂层之间。

    SELF-RELEASING RESIST MATERIAL FOR NANO-IMPRINT PROCESSES
    4.
    发明申请
    SELF-RELEASING RESIST MATERIAL FOR NANO-IMPRINT PROCESSES 有权
    用于纳米印刷工艺的自发性材料

    公开(公告)号：US20100117256A1

    公开(公告)日：2010-05-13

    申请号：US12268823

    申请日：2008-11-11

    申请人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

    发明人： Margaret E. Best ,  Xing-Cai Guo ,  Thomas E. Karis ,  Dan S. Kercher ,  Charles M. Mate ,  Tsai-Wei Wu

    IPC分类号： B32B37/02 ,  C08L71/08 ,  C08L83/04

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08G65/007 ,  C08G65/3322 ,  C08G2650/48 ,  C08L33/08 ,  C09D171/02 ,  C08L2666/04

    摘要： Nanoimprint lithography using resist material with the addition of a surfactant is described. A template release layer is formed on a pattern of a template. A non-ionic surfactant is added to a resist material to form a mixed resist material. The resist material may comprise a hydrocarbon material having an unsaturated bond, such as an acrylate material. The surfactant may comprise polyakylene glycol or an organically modified polysiloxane. A resist layer is then formed on a substrate from the mixed resist material. The surfactant added to the resist material forms a resist release layer on the surface of the resist layer. The template is then pressed into the resist layer, where the template release layer and the resist release layer are between the pattern of the template and the resist layer.

    摘要翻译： 描述了使用加入表面活性剂的抗蚀剂材料的纳米压印光刻。 模板释放层形成在模板的图案上。 将非离子表面活性剂加入到抗蚀剂材料中以形成混合的抗蚀剂材料。 抗蚀剂材料可以包括具有不饱和键的烃材料，例如丙烯酸酯材料。 表面活性剂可以包括聚亚烷基二醇或有机改性的聚硅氧烷。 然后在混合的抗蚀剂材料的基板上形成抗蚀剂层。 添加到抗蚀剂材料中的表面活性剂在抗蚀剂层的表面上形成抗蚀剂剥离层。 然后将模板压入抗蚀剂层，其中模板释放层和抗蚀剂剥离层在模板的图案和抗蚀剂层之间。

    System, method and apparatus for batch vapor deposition of adhesion promoter for manufacturing discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media
    7.
    发明授权
    System, method and apparatus for batch vapor deposition of adhesion promoter for manufacturing discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media 失效
    用于分散气相沉积用于制造离散轨道介质和位图形介质的粘合促进剂的系统，方法和装置，以及磁记录介质上的单分子层润滑剂

    公开(公告)号：US08585912B2

    公开(公告)日：2013-11-19

    申请号：US12177950

    申请日：2008-07-23

    申请人： Xing-Cai Guo ,  Robert Waltman ,  Tsai-Wei Wu

    发明人： Xing-Cai Guo ,  Robert Waltman ,  Tsai-Wei Wu

    IPC分类号： B44C1/22

    CPC分类号： G11B5/8404 ,  G11B5/8408 ,  G11B5/855

    摘要： A batch vapor deposition process for applying adhesion promoter during manufacturing of nanoimprinted discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media are disclosed. The adhesion promoter is simultaneously coated on both sides of numerous disk substrates, and minimal solution is wasted. In another step, the lubricant is applied at a uniform thickness that is on the order of a single molecular layer. The lubricant is also applied on the entire disk surfaces while processing multiple disks at a time. Batch processing increases throughput, and vapor lubricant reduces costs compared to conventional techniques. Limited air exposure controls bonding and monolayer adsorption guarantees uniformity.

    摘要翻译： 公开了一种用于在制造纳米压印的离散轨道介质和位图形介质以及在磁记录介质上的单分子层润滑剂的制造过程中施加粘合促进剂的分批气相沉积方法。 粘合促进剂同时涂覆在许多圆盘基材的两面，浪费最少的溶液。 在另一个步骤中，以均匀的厚度施加润滑剂，该均匀的厚度为单分子层的数量级。 一次处理多个磁盘时，也会在整个磁盘表面上施加润滑剂。 与常规技术相比，批处理增加了生产量，并且蒸汽润滑剂降低了成本。 有限的空气暴露控制粘合和单层吸附保证了均匀性。

    SYSTEM, METHOD AND APPARATUS FOR BATCH VAPOR DEPOSITION OF ADHESION PROMOTER FOR MANUFACTURING DISCRETE TRACK MEDIA AND BIT-PATTERNED MEDIA, AND MONO-MOLECULAR LAYER LUBRICANT ON MAGNETIC RECORDING MEDIA
    8.
    发明申请
    SYSTEM, METHOD AND APPARATUS FOR BATCH VAPOR DEPOSITION OF ADHESION PROMOTER FOR MANUFACTURING DISCRETE TRACK MEDIA AND BIT-PATTERNED MEDIA, AND MONO-MOLECULAR LAYER LUBRICANT ON MAGNETIC RECORDING MEDIA 失效
    用于制造离散跟踪介质和位图介质的粘合剂促进剂的沉积物的系统，方法和装置以及磁记录介质上的单分子层润滑剂

    公开(公告)号：US20100018945A1

    公开(公告)日：2010-01-28

    申请号：US12177950

    申请日：2008-07-23

    申请人： Xing-Cai Guo ,  Robert Waltman ,  Tsai-Wei Wu

    发明人： Xing-Cai Guo ,  Robert Waltman ,  Tsai-Wei Wu

    IPC分类号： B05D5/12 ,  B44C1/22

    CPC分类号： G11B5/8404 ,  G11B5/8408 ,  G11B5/855

    摘要： A batch vapor deposition process for applying adhesion promoter during manufacturing of nanoimprinted discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media are disclosed. The adhesion promoter is simultaneously coated on both sides of numerous disk substrates, and minimal solution is wasted. In another step, the lubricant is applied at a uniform thickness that is on the order of a single molecular layer. The lubricant is also applied on the entire disk surfaces while processing multiple disks at a time. Batch processing increases throughput, and vapor lubricant reduces costs compared to conventional techniques. Limited air exposure controls bonding and monolayer adsorption guarantees uniformity.

    摘要翻译： 公开了一种用于在制造纳米压印的离散轨道介质和位图形介质以及在磁记录介质上的单分子层润滑剂的制造过程中施加粘合促进剂的分批气相沉积方法。 粘合促进剂同时涂覆在许多圆盘基材的两面，浪费最少的溶液。 在另一个步骤中，以均匀的厚度施加润滑剂，该均匀的厚度为单分子层的数量级。 一次处理多个磁盘时，也会在整个磁盘表面上施加润滑剂。 与常规技术相比，批处理增加了生产量，并且蒸汽润滑剂降低了成本。 有限的空气暴露控制粘合和单层吸附保证了均匀性。

    System, method and apparatus for obtaining true roughness of granular media
    9.
    发明授权
    System, method and apparatus for obtaining true roughness of granular media 有权
    用于获得粒状介质真实粗糙度的系统，方法和装置

    公开(公告)号：US07900497B2

    公开(公告)日：2011-03-08

    申请号：US11950021

    申请日：2007-12-04

    申请人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

    发明人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

    IPC分类号： G01B21/30

    CPC分类号： G01B11/303 ,  B82Y10/00 ,  G01Q60/24

    摘要： The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface.

    摘要翻译： 通过形成介质表面的反向复制品来测量高度颗粒状垂直介质的真实粗糙度。 本发明使粒状介质谷深度的AFM测量能够更一致地预测介质的腐蚀性能。 使用液体抗蚀剂首先复制介质形貌并形成反向复制品。 原始介质中的窄谷精确地建模为复制品上的尖峰。 用AFM尖端容易地测量峰的高度。 所得到的图像是原始曲面的负值。

    SYSTEM, METHOD AND APPARATUS FOR OBTAINING TRUE ROUGHNESS OF GRANULAR MEDIA
    10.
    发明申请
    SYSTEM, METHOD AND APPARATUS FOR OBTAINING TRUE ROUGHNESS OF GRANULAR MEDIA 有权
    用于获得颗粒介质真实粗糙度的系统，方法和装置

    公开(公告)号：US20090139314A1

    公开(公告)日：2009-06-04

    申请号：US11950021

    申请日：2007-12-04

    申请人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

    发明人： Qing Dai ,  Bruno Marchon ,  Tsai-Wei Wu

    IPC分类号： G01B5/28 ,  G11B5/64

    CPC分类号： G01B11/303 ,  B82Y10/00 ,  G01Q60/24

    摘要： The true roughness of highly granular perpendicular media is measured by forming an inverse replica of the surface of the media. The invention enables AFM measurements of granular media valley depth to more consistently predict the corrosion performance of the media. A liquid resist is used to first replicate the media topography and form the inverse replica. The narrow valleys in the original media are precisely modeled as sharp peaks on the replica. The height of the peaks are readily measured with an AFM tip. The resulting image is a negative of the original surface.

    摘要翻译： 通过形成介质表面的反向复制品来测量高度颗粒状垂直介质的真实粗糙度。 本发明使粒状介质谷深度的AFM测量能够更一致地预测介质的腐蚀性能。 使用液体抗蚀剂首先复制介质形貌并形成反向复制品。 原始介质中的窄谷精确地建模为复制品上的尖峰。 用AFM尖端容易地测量峰的高度。 所得到的图像是原始曲面的负值。