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    HIGHLY CLEAN AND HOT VALVE
    1.
    发明申请
    HIGHLY CLEAN AND HOT VALVE 审中-公开
    高清洁和高温阀

    公开(公告)号：US20120001102A1

    公开(公告)日：2012-01-05

    申请号：US12864382

    申请日：2009-01-21

    申请人： Yasuhiro Chiba ,  Kohei Yamamoto ,  Hiroshi Takada ,  Kota Koizumi ,  Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa

    发明人： Yasuhiro Chiba ,  Kohei Yamamoto ,  Hiroshi Takada ,  Kota Koizumi ,  Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa

    IPC分类号： F16K31/122

    CPC分类号： F16K41/10 ,  F16K31/126 ,  F16K31/1268

    摘要： A highly clean and high temperature valve apparatus includes a valve driving unit and a valve casing connected to a bonnet supporting a valve stem slidably. A stem portion has one end positioned in a circumferential wall closed at its two ends by upper and lower covers, and supports one end of the valve stem with its other end extending through the lower cover. The stem portion has its ends supported respectively by first and second bellows for closing an axial through hole of the lower cover tightly. A first pipe communicates with a first space isolated by the first bellows, and a second pipe communicates with a second space isolated by the first bellows. The fluid quantities in the first and second spaces are increased or decreased relative to each other, thereby to drive the stem portion supported in a floating state by the first and second bellows.

    摘要翻译： 高度清洁和高温的阀门装置包括阀驱动单元和阀壳，其可滑动地连接到支撑阀杆的阀盖。 杆部分具有位于周向壁的一端，其两端通过上盖和下盖封闭，并且支撑阀杆的一端，其另一端延伸穿过下盖。 杆部分的端部分别由第一和第二波纹管支撑，用于紧密地封闭下盖的轴向通孔。 第一管与由第一波纹管隔离的第一空间连通，第二管与由第一波纹管隔离的第二空间连通。 第一和第二空间中的流体量相对于彼此增加或减小，从而驱动由第一和第二波纹管以浮动状态支撑的杆部。

    DEPOSITION APPARATUS FOR ORGANIC EL AND EVAPORATING APPARATUS
    2.
    发明申请
    DEPOSITION APPARATUS FOR ORGANIC EL AND EVAPORATING APPARATUS 审中-公开
    有机EL和蒸发装置的沉积装置

    公开(公告)号：US20100000469A1

    公开(公告)日：2010-01-07

    申请号：US12494453

    申请日：2009-06-30

    申请人： Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa ,  Mitsuaki Komino

    发明人： Yasushi Yagi ,  Shingo Watanabe ,  Yuji Ono ,  Hiroshi Kaneko ,  Koyu Hasegawa ,  Mitsuaki Komino

    IPC分类号： C23C16/54

    CPC分类号： C23C14/26 ,  C23C14/243 ,  H01L51/001

    摘要： Provided is a deposition apparatus for organic EL capable of allowing vapor of a film forming material to be vapor deposited on a target object to be uniformly heated. A deposition apparatus, which performs a film forming process by vapor depositing a film forming material on a target object in a depressurized processing chamber, includes an evaporating head having a vapor discharge opening, disposed in the processing chamber, for discharging vapor of the film forming material. Inside the evaporating head, provided is a heater receiving member which is sealed with respect to an inside of the processing chamber, and installed is a communication path which allows the heater receiving member to communicate with an outside of the processing chamber. A power supply line for a heater received in the heater receiving member is disposed in the communication path and extended to the outside of the processing chamber.

    摘要翻译： 本发明提供一种能够使成膜材料的蒸气气相沉积在目标物体上以均匀加热的有机EL的沉积装置。 通过在减压处理室中对目标物体上的成膜材料进行气相沉积而进行成膜处理的沉积装置包括具有蒸气排出口的蒸发头，设置在处理室中，用于排出成膜用蒸气 材料。 在蒸发头内部设置有相对于处理室的内部密封的加热器接收构件，并且设置有允许加热器接收构件与处理室的外部连通的连通路径。 用于接收在加热器接收构件中的加热器的电源线设置在连通路径中并延伸到处理室的外部。

    EVAPORATING APPARATUS
    3.
    发明申请
    EVAPORATING APPARATUS 审中-公开
    蒸气装置

    公开(公告)号：US20100071623A1

    公开(公告)日：2010-03-25

    申请号：US12441934

    申请日：2007-10-01

    申请人： Shingo Watanabe ,  Yuji Ono ,  Koyu Hasegawa ,  Masahiro Ogawa ,  Kouichi Honda

    发明人： Shingo Watanabe ,  Yuji Ono ,  Koyu Hasegawa ,  Masahiro Ogawa ,  Kouichi Honda

    IPC分类号： C23C16/00

    CPC分类号： C23C14/12 ,  C23C14/243

    摘要： Disclosed is an evaporating apparatus for performing a film forming process on a target object to be processed by vapor deposition, wherein a processing chamber and a vapor generating chamber are disposed adjacent to each other, gas exhaust mechanisms for depressurizing an inside of the processing chamber and an inside of the vapor generating chamber are installed, a vapor discharge opening for discharging a vapor of the film forming material is disposed in the processing chamber, vapor generating units for vaporizing the film forming material and control valves for controlling a supply of the vapor of the film forming material are disposed in the vapor generating chamber, and flow paths, which are not exposed to an outside of the processing chamber and the vapor generating chamber, for supplying the vapor of the film forming material generated in the vapor generating units to the vapor discharge opening are installed.

    摘要翻译： 本发明公开了一种用于对通过气相沉积处理的目标物体进行成膜处理的蒸发装置，其中处理室和蒸汽发生室彼此相邻设置，用于对处理室内部进行减压的排气机构， 蒸汽发生室内部安装有用于排出成膜材料的蒸汽的蒸汽排放口，用于蒸发成膜材料的蒸汽发生单元和用于控制成膜材料供应的控制阀 成膜材料设置在蒸汽发生室中，并且没有暴露于处理室和蒸气发生室的外部的流路用于将在蒸汽发生单元中产生的成膜材料的蒸汽供应到 安装蒸汽排放口。

    Heat treatment system and method therefore
    5.
    发明申请
    Heat treatment system and method therefore 有权
    热处理系统和方法因此

    公开(公告)号：US20070166657A1

    公开(公告)日：2007-07-19

    申请号：US11705443

    申请日：2007-02-13

    申请人： Kazunari Sakata ,  Koyu Hasegawa ,  Keiichi Katabuchi ,  Shingo Watanabe ,  Shinya Mochizuki ,  Motoki Akimoto ,  Hiroshi Motono

    发明人： Kazunari Sakata ,  Koyu Hasegawa ,  Keiichi Katabuchi ,  Shingo Watanabe ,  Shinya Mochizuki ,  Motoki Akimoto ,  Hiroshi Motono

    IPC分类号： F27D1/18

    CPC分类号： H01L21/67373 ,  F27B5/04 ,  F27B17/0025 ,  F27D3/0084 ,  F27D5/0037 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/67379 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67739 ,  H01L21/67769 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/68707 ,  Y10S269/903 ,  Y10S414/135 ,  Y10S414/137

    摘要： There is provided a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment. In a vertical heat treatment system for carrying an object W to be treated, which is housed in a treating-object housing box 2 closed by an opening/closing lid 10, in a treating-object transfer area 46 via an opening 28, which is formed in a partition wall 26 separating a housing-box transfer area 44 for transferring the treating-object housing box from the treating-object transfer area 46 in an atmosphere of an inert gas, to carry out a predetermined treatment, a standby box transfer means 60 is provided in the housing-box transfer area for holding a treating-object housing box, which houses therein the next object to be carried in the treating-object transfer area, in the vicinity of the opening to cause the treating-object housing box to stand by. Thus, when the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.

    摘要翻译： 提供了一种垂直式热处理系统，其能够简化形成在将箱体搬送区域从处理对象搬送区域（晶片转移区域）分离的分隔壁的开口附近的各种机构的结构， 并且当通过开口在垂直热处理系统中承载待处理物体时，有助于节省空间，以进行预定处理。 在用于承载被打开/关闭盖10封闭的处理对象收纳箱2中的待处理对象物W的立式热处理系统经由开口28在处理对象转移区域46中 形成在隔离壁26中，隔离箱26分离用于在惰性气体气氛中将处理对象收纳箱从处理对象转移区域46传送的收纳箱传送区域44，以执行预定处理;待机箱传送装置 60设置在用于保持处理对象收纳箱的收纳箱传送区域中，处理对象收纳箱在其内容纳有待处理对象转移区域中的下一个物体的开口附近，从而使处理对象收纳箱 待命 因此，当待处理物体经由将箱体转移区域从处理对象转移区域（晶片转移区域）分离的分隔壁的开口进行预定处理时，结构 简化了开口附近的各种机构，节省了空间。

    Storage medium, information processing apparatus, information processing method and information processing system
    9.
    发明授权
    Storage medium, information processing apparatus, information processing method and information processing system 有权
    存储介质，信息处理装置，信息处理方法和信息处理系统

    公开(公告)号：US08872891B2

    公开(公告)日：2014-10-28

    申请号：US13213651

    申请日：2011-08-19

    申请人： Satoru Takizawa ,  Shingo Watanabe ,  Nagako Ikuta ,  Tomohiro Yamamura ,  Tomomi Sano

    发明人： Satoru Takizawa ,  Shingo Watanabe ,  Nagako Ikuta ,  Tomohiro Yamamura ,  Tomomi Sano

    IPC分类号： H04N13/00 ,  G06T19/00 ,  G06T15/50

    CPC分类号： G06T15/503 ,  G06T19/00 ,  G06T2210/62

    摘要： A computer-readable storage medium having stored therein an information processing program to be executed by a computer is provided. The information processing program causes the computer to function as: preferential display object placing means for placing a preferential display object in an imaging range of a virtual stereo camera in a virtual three-dimensional space; stereoscopically visible image rendering means for taking the virtual three-dimensional space using the virtual stereo camera, and rendering a stereoscopically visible image of the virtual three-dimensional space; and display control means for causing the display apparatus to display the stereoscopically visible image rendered by the stereoscopically visible image rendering means. The stereoscopically visible image rendering means renders the preferential display object in preference to a predetermined object in front of the preferential display object, such that a portion of the preferential display object being overlapped by the predetermined object is translucent.

    摘要翻译： 其中存储有要由计算机执行的信息处理程序的计算机可读存储介质。 所述信息处理程序使所述计算机用作：优先显示对象放置装置，用于将虚拟立体相机的优选显示对象放置在虚拟三维空间中; 立体视觉图像渲染装置，用于使用虚拟立体相机拍摄虚拟三维空间，并渲染虚拟三维空间的立体视觉图像; 以及显示控制装置，用于使显示装置显示由立体视觉图像渲染装置呈现的立体视觉图像。 立体视觉图像呈现装置优先于优先显示对象之前的预定对象优先显示对象，使得优先显示对象与预定对象重叠的部分是半透明的。