MAGNETIC PATTERNING METHOD AND SYSTEM
    7.
    发明申请
    MAGNETIC PATTERNING METHOD AND SYSTEM 审中-公开
    磁性图案方法与系统

    公开(公告)号:US20140315293A1

    公开(公告)日:2014-10-23

    申请号:US14318775

    申请日:2014-06-30

    IPC分类号: C12M1/12 C12M1/02 H01F41/16

    摘要: The present invention relates to a method and apparatus for patterning a substrate. The method comprises providing at least one magnetic pattern generator configured and operable to modulate the magnetic field to induce varying magnetic properties to a magnetic field according to a desired pattern; applying the modulated magnetic field in the vicinity of the substrate creating a certain pattern of regions of interaction to be obtained on top of the substrate; and; interacting the substrate with magnetic particles, while under the application of the modulated magnetic field, the magnetic particles being attracted to selected regions of interaction defined by the certain pattern while being substantially not attracted to regions outside the regions of interaction, thus creating on top of the substrate the certain pattern of regions interacted with the magnetic particles. The desired pattern corresponds to a certain pattern for a predetermined magnetic field profile and at a predetermined distance from the magnetic pattern generator, where the sample is to be located.

    摘要翻译: 本发明涉及一种用于图案化衬底的方法和装置。 该方法包括提供至少一个磁图案发生器,其被配置和可操作以根据期望的图案调制磁场以对磁场引起变化的磁特性; 将调制的磁场施加在衬底附近,产生在衬底的顶部上获得的相互作用区域的特定图案; 和; 在将基底与磁性颗粒相互作用的同时,在调制磁场的应用下,磁性颗粒被吸引到由特定图案定义的相互作用区域之间,同时基本上不被吸引到相互作用区域之外的区域,从而在 基板的某些图案区域与磁性颗粒相互作用。 期望的图案对应于预定磁场分布的特定图案,并且距离磁图案发生器预定距离处,其中样本将被定位。