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    Developer recycling method
    3.
    发明授权
    Developer recycling method 有权
    开发人员回收方式

    公开(公告)号：US07736827B2

    公开(公告)日：2010-06-15

    申请号：US11465606

    申请日：2006-08-18

    申请人： Yoshihiro Morii ,  Hiroyuki Matsuura ,  Takeshi Sugimoto ,  Kazuma Torii

    发明人： Yoshihiro Morii ,  Hiroyuki Matsuura ,  Takeshi Sugimoto ,  Kazuma Torii

    IPC分类号： G03G9/00

    CPC分类号： C22B7/001 ,  C22B5/04 ,  Y02P10/214 ,  Y02P10/234

    摘要： In a method for recycling a double component developer that contains a carrier and a toner used for an image forming device such as office automation equipment, an economic value of recycling is increased, thereby allowing a company to carry out an active and sustainable environmental activity. Material components of a carrier are completely utilized, so that a process of removing and disposing part of components of the carrier, which is present in the conventional technology of a carrier recycling, is omitted from a recycling system, and in consequence, a cost of recycling is minimized. Furthermore, as well as a subject of the recycling, i.e. a carrier itself, a more valuable material, i.e. a platinum group metal, is utilized for the recycling.

    摘要翻译： 在用于回收包含载体的双组分显影剂和用于诸如办公自动化设备的图像形成装置的调色剂的方法中，回收的经济价值增加，从而允许公司进行积极和可持续的环境活动。 载体的材料成分被完全利用，从再循环系统中省去了存在于载体再循环的传统技术中存在的载体部分的一部分的处理过程，因此， 回收利用最小化。 此外，以及再循环的对象，即载体本身，更有价值的材料，即铂族金属被用于再循环。

    DEVELOPER RECYCLING METHOD
    4.
    发明申请
    DEVELOPER RECYCLING METHOD 有权
    开发者回收方法

    公开(公告)号：US20070089561A1

    公开(公告)日：2007-04-26

    申请号：US11465606

    申请日：2006-08-18

    申请人： Yoshihiro Morii ,  Hiroyuki Matsuura ,  Takeshi Sugimoto ,  Kazuma Torii

    发明人： Yoshihiro Morii ,  Hiroyuki Matsuura ,  Takeshi Sugimoto ,  Kazuma Torii

    IPC分类号： C22B4/00

    CPC分类号： C22B7/001 ,  C22B5/04 ,  Y02P10/214 ,  Y02P10/234

    摘要： In a method for recycling a double component developer that contains a carrier and a toner used for an image forming device such as office automation equipment, an economic value of recycling is increased, thereby allowing a company to carry out an active and sustainable environmental activity. Material components of a carrier are completely utilized, so that a process of removing and disposing part of components of the carrier, which is present in the conventional technology of a carrier recycling, is omitted from a recycling system, and in consequence, a cost of recycling is minimized. Furthermore, as well as a subject of the recycling, i.e. a carrier itself, a more valuable material, i.e. a platinum group metal, is utilized for the recycling.

    摘要翻译： 在用于回收包含载体的双组分显影剂和用于诸如办公自动化设备的图像形成装置的调色剂的方法中，回收的经济价值增加，从而允许公司进行积极和可持续的环境活动。 载体的材料成分被完全利用，从再循环系统中省去了存在于载体再循环的传统技术中存在的载体部分的一部分的处理过程，因此， 回收利用最小化。 此外，以及再循环的对象，即载体本身，更有价值的材料，即铂族金属被用于再循环。

    Heat treatment apparatus
    6.
    发明授权
    Heat treatment apparatus 有权
    热处理设备

    公开(公告)号：US09105672B2

    公开(公告)日：2015-08-11

    申请号：US13561373

    申请日：2012-07-30

    申请人： Hiroyuki Matsuura

    发明人： Hiroyuki Matsuura

    IPC分类号： F27D3/12 ,  H01L21/67 ,  F27B17/00 ,  H01L21/677

    CPC分类号： H01L21/67109 ,  F27B17/0025 ,  H01L21/6719 ,  H01L21/67757

    摘要： A heat treatment apparatus for performing heat treatment of processing objects at a time without changing the interior configuration of a conventional clean room even when the processing objects are large-sized. The heat treatment apparatus is installed in a clean room. The heat treatment apparatus includes: a heat treatment furnace including a vertical processing chamber having a furnace opening at the top and adapted to house and heat-treat processing objects, a heat insulator that surrounds the circumference of the processing chamber, and a heater provided on the inner peripheral surface of the heat insulator; a lid for closing the furnace opening of the processing chamber; and a holding tool, hung via a heat-retaining cylinder from the lid, for holding the processing objects in multiple stages. The heat treatment furnace of the heat treatment apparatus, for the most part in the height direction, lies beneath the floor of the clean room.

    摘要翻译： 即使在处理对象大的情况下，也能一次进行处理对象的热处理而不改变现有的洁净室的内部结构的热处理装置。 热处理装置安装在洁净室内。 该热处理设备包括：热处理炉，其包括垂直处理室，其具有在顶部具有炉开口并适于容纳和热处理物体的垂直处理室，围绕处理室周围的隔热件和设置在该处理室周围的加热器 绝热体的内周面; 用于关闭处理室的炉开口的盖子; 以及通过来自盖的保温筒悬挂的用于将处理对象保持多级的保持工具。 热处理设备的热处理炉大部分位于高度方向，位于洁净室的地板下面。

    Suction apparatus, semiconductor device observation device, and semiconductor device observation method
    7.
    发明授权
    Suction apparatus, semiconductor device observation device, and semiconductor device observation method 有权
    抽吸装置，半导体装置观察装置和半导体装置观察方法

    公开(公告)号：US08947776B2

    公开(公告)日：2015-02-03

    申请号：US13701035

    申请日：2011-06-21

    申请人： Hirotoshi Terada ,  Hiroyuki Matsuura

    发明人： Hirotoshi Terada ,  Hiroyuki Matsuura

    IPC分类号： G02B21/26 ,  G01N21/95 ,  H01L21/683 ,  H01L21/687 ,  G01N21/01 ,  H01L21/66

    CPC分类号： G01N21/9501 ,  G01N21/01 ,  H01L21/6838 ,  H01L21/68757 ,  H01L21/68785 ,  H01L22/12

    摘要： A suction unit 10 includes a main body portion having a first surface 13 on which a semiconductor wafer W is arranged and a second surface 14 opposite to the first surface 13, and in which a through-hole 15 that penetrates through the first surface 13 and the second surface 14 is formed and a light transmitting portion having a light incident surface 16 and a light emitting surface 17, and which is fitted to the through-hole 15. Further, in the first surface 13, a first suction groove 13a for vacuum sucking the semiconductor wafer W to fix the semiconductor device D to the light incident surface 16 is formed, and in the second surface 14, a second suction groove 14a for vacuum sucking the solid immersion lens S to fix the solid immersion lens S to the light emitting surface 17 is formed.

    摘要翻译： 抽吸单元10包括主体部分，其具有布置半导体晶片W的第一表面13和与第一表面13相对的第二表面14，并且其中穿过第一表面13的通孔15和 形成第二表面14和具有光入射表面16和发光表面17并且安装到通孔15的透光部分。此外，在第一表面13中，具有用于真空的第一吸入槽13a 吸收半导体晶片W以将半导体器件D固定到光入射表面16，并且在第二表面14中，用于真空吸附固体浸没透镜S以将固体浸没透镜S固定到光的第二吸入槽14a 形成发光面17。

    ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME
    8.
    发明申请
    ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME 有权
    电解电容器及其制造方法

    公开(公告)号：US20130279080A1

    公开(公告)日：2013-10-24

    申请号：US13976392

    申请日：2012-02-15

    申请人： Tatsuji Aoyama ,  Yuuki Murata ,  Hiroyuki Matsuura ,  Hidehiro Sasaki ,  Kazuyo Saito ,  Yukiya Shimoyama ,  Jyunya Kushizaki

    发明人： Tatsuji Aoyama ,  Yuuki Murata ,  Hiroyuki Matsuura ,  Hidehiro Sasaki ,  Kazuyo Saito ,  Yukiya Shimoyama ,  Jyunya Kushizaki

    IPC分类号： H01G9/00 ,  H01G9/15

    CPC分类号： H01G9/0003 ,  H01G9/0029 ,  H01G9/008 ,  H01G9/04 ,  H01G9/15 ,  Y10T29/417

    摘要： A capacitor element includes an anode foil, the first oxide film on a surface of the anode foil, a solid electrolyte layer formed using π-conjugated conductive polymer dispersing material on the first oxide film, and a cathode foil on the solid electrolyte layer. The cathode foil faces the first oxide film across the solid electrolyte layer. An electrolytic capacitor includes the capacitor element, an anode terminal connected to the anode foil, and a second oxide film on a surface of the anode terminal. The second oxide film provided on the anode terminal has higher water repellency than the first oxide film provided on the anode foil. This electrolytic capacitor can reduce a leakage current.

    摘要翻译： 电容器元件包括阳极箔，阳极箔的表面上的第一氧化膜，在第一氧化物膜上使用π共轭导电性聚合物分散材料形成的固体电解质层，以及固体电解质层上的阴极箔。 阴极箔面对固体电解质层上的第一氧化膜。 电解电容器包括电容器元件，连接到阳极箔的阳极端子和阳极端子的表面上的第二氧化物膜。 设置在阳极端子上的第二氧化膜具有比设置在阳极箔上的第一氧化膜更高的拒水性。 这种电解电容可以减少漏电流。

    Treatment apparatus, treatment method, and storage medium
    9.
    发明授权
    Treatment apparatus, treatment method, and storage medium 有权

    公开(公告)号：US08354623B2

    公开(公告)日：2013-01-15

    申请号：US12314082

    申请日：2008-12-03

    申请人： Hiroyuki Matsuura

    发明人： Hiroyuki Matsuura

    IPC分类号： H05B6/10 ,  F27B5/14 ,  F27D5/00 ,  H01L21/205 ,  C23C16/46

    CPC分类号： H01L21/67109 ,  C23C16/4581 ,  C23C16/46

    摘要： A treatment apparatus uses an inductive heating method to allow an object to be heated while preventing a treatment chamber from being heated. The treatment apparatus for performing a heat treatment on the object has a treatment chamber and an induction heating coil section. The treatment chamber is capable of accommodating a plurality of objects. The induction heating coil section is wound around an outer circumference of the treatment chamber. The treatment apparatus also has a high frequency power supply and a gas supply unit. The high frequency power supply applies high frequency power to the induction heating coil section. The gas supply unit introduces a necessary gas to the treatment chamber. A holding unit is inserted in and removed from the treatment chamber under the condition that the holding unit holds the object and an induction heating generator adapted to be inductively heated by means of a high frequency wave emitted by the induction heating coil section.

    Plasma processing apparatus
    10.
    发明授权
    Plasma processing apparatus 有权
    等离子体处理装置

    公开(公告)号：US08336490B2

    公开(公告)日：2012-12-25

    申请号：US13339149

    申请日：2011-12-28

    申请人： Hiroyuki Matsuura ,  Toshiki Takahashi ,  Kohei Fukushima

    发明人： Hiroyuki Matsuura ,  Toshiki Takahashi ,  Kohei Fukushima

    IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H05B31/26

    CPC分类号： H01J37/32532 ,  C23C16/345 ,  C23C16/452 ,  H01J37/321

    摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.

    摘要翻译： 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，以形成与过程场气密地连通的等离子体产生区域，提供给等离子体生成箱的ICP电极和RF功率 电源连接到电极。